Abstract
The use of functional additives in the electroplating process results in an impurity incorporation in the Cu plated layer. A high level of impurity residual has been recognized as a severe reliability problem to the Sn/Cu joints because voids are prone to form at the Sn/Cu interface in the thermal aging process. This study focuses on the effect of aging temperature on the formation and distribution of voids. Two electroplated Cu substrates and one rolled Cu foil were joined Sn balls to prepare the Sn/Cu joints for thermal aging in the range of 100–200 °C. The microstructural examination results indicated that the additive formula of polyethylene glycol (PEG) and Cl− resulted in massive void formation at the Sn/Cu interface, and the distribution of voids showed a strong dependence on the aging temperature. The strong temperature dependence of void distribution led to an unusual evolution of microstructure and shear strength in the Sn/Cu joints.
Similar content being viewed by others
References
J.R. Davis, Copper and Copper Alloys, 1st edn. (ASM International, Materials Park, OH, 2001), pp. 127–152
K.K. Chakravorty, C.P. Chien, J.M. Cech, M.H. Tanielian, P.L. Young, IEEE Trans. Comp., Hybrids, Manuf. Technol. 13, 200 (1990)
X. Ye, M. De Bonte, J.P. Celis, J.R. Roos, J. Electrochem. Soc. 139, 1592 (1992)
T. Kobayashi, J. Kawasaki, K. Mihara, H. Honma, Electrochim. Acta 47, 85 (2001)
D. Josell, T.P. Moffat, J. Electrochem. Soc. 165, D23 (2018)
Z.V. Feng, X. Li, A.A. Gewirth, J. Phys. Chem. B 107, 9415 (2003)
Y.D. Chiu, W.P. Dow, J. Electrochem. Soc. 160, D3021 (2013)
M. Tan, C. Guymon, D.R. Wheeler, J.N. Harb, J. Electrochem. Soc. 154, D78 (2007)
Y. Jin, Y. Sui, L. Wen, F. Ye, M. Sun, Q. Wang, J. Electrochem. Soc. 160, D20 (2013)
S.W. Chen, C.M. Chen, W.C. Liu, J. Electron. Mater. 27, 1193 (1998)
C.P. Lin, C.M. Chen, Y.W. Yen, J. Alloys Compd. 591, 297 (2014)
J.Y. Wu, H. Lee, C.H. Wu, C.F. Lin, W.P. Dow, C.M. Chen, J. Electrochem. Soc. 161, D522 (2014)
H.K. Cheng, C.W. Huang, H. Lee, Y.L. Wang, T.F. Liu, C.M. Chen, J. Alloys Compd. 622, 529 (2015)
S. Kumar, C.A. Handwerker, M.A. Dayananda, J. Phase Equilib. Diff. 32, 309 (2011)
J.Y. Kim, J. Yu, S.H. Kim, Acta Mater. 57, 5001 (2009)
S.H. Kim, J. Yu, J. Mater. Res. 25, 1854 (2010)
P. Borgesen, L. Yin, P. Kondos, Microelectron. Reliab. 52, 1121 (2012)
J. Yu, J.Y. Kim, Acta Mater. 56, 5514 (2008)
Y. Liu, J. Wang, L. Yin, P. Kondos, C. Parks, P. Borgesen, D.W. Henderson, E.J. Cotts, N. Dimitrov, J. Appl. Electrochem. 38, 1695 (2008)
T.Y. Yu, H. Lee, H.L. Hsu, W.P. Dow, H.K. Cheng, K.C. Liu, C.M. Chen, J. Electrochem. Soc. 163, D734 (2016)
H. Lee, T.Y. Yu, H.K. Cheng, K.C. Liu, P.F. Chan, W.P. Dow, C.M. Chen, J. Electrochem. Soc. 164, D457 (2017)
C.C. Chen, C.H. Yang, Y.S. Wu, C.E. Ho, Surf. Coat. Technol. 320, 489 (2017)
P.T. Lee, Y.S. Wu, P.C. Lin, C.C. Chen, W.Z. Hsieh, C.E. Ho, Surf. Coat. Technol. 320, 559 (2017)
Y. Liu, L. Yin, S. Bliznakov, P. Kondos, P. Borgesen, D.W. Henderson, C. Parks, J. Wang, E.J. Cotts, N. Dimitrov, IEEE Trans. Compon. Pack. Technol. 33, 127 (2010)
L. Yin, P. Borgesen, J. Mater. Res. 26, 455 (2011)
K. Zeng, R. Stierman, T.C. Chiu, D. Edwards, K. Ano, K.N. Tu, J. Appl. Phys. 97, 024508 (2005)
Y.J. Chen, C.K. Chung, C.R. Yang, C.R. Kao, Microelectron. Reliab. 53, 47 (2013)
Acknowledgements
This work is supported by the Ministry of Science and Technology of Taiwan through Grant No. MOST-105-2221-E-005-087.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Hsu, HL., Lee, H., Wu, PH. et al. Impurity-induced unusual microstructural evolution and mechanical property in Sn/Cu solder joints. J Mater Sci: Mater Electron 29, 12842–12849 (2018). https://doi.org/10.1007/s10854-018-9403-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-018-9403-7