Abstract
It has been determined experimentally that doping silicon with large isovalent dopants such as tin can limit the concentration of vacancy-oxygen defects, this in turn, can be deleterious for the materials properties and its application. These results have been supported by recent calculations based on density functional theory employing hybrid functional. In the present study, we employ mass action analysis to calculate the impact of germanium, tin and lead doping on the relative concentrations of vacancy-oxygen defects and defect clusters in silicon under equilibrium conditions. In particular, we calculate how much isovalent doping is required to constrain vacancy-oxygen concentration in silicon and conclude that Sn and Pb doping are the most effective isovalent dopants. The results are discussed in view of recent experimental and computational results.
Similar content being viewed by others
References
V.V. Emtsev, N.V. Abrosimov, V.V. Kozlovskii, G. Oganesyan, Semiconductors 48, 1438 (2014)
L.I. Murin, J.L. Lindstrom, B.G. Svensson, V.P. Markevich, A.R. Peaker, C.A. Londos, Solid State Phenom. 108–109, 267 (2005)
H. Bracht, A. Chroneos, J. Appl. Phys. 104, 076108 (2008)
C. Gao, X. Ma, J. Zhao, D. Yang, J. Appl. Phys. 113, 093511 (2013)
R.C. Newman, R. Jones, “Oxygen in silicon” in Semiconductors and Semimetals, ed. by F. Shimura (Academic Press, Orlando, 1994), vol 42, p. 289
J.W. Corbett, G.D. Watkins, R.S. McDonald, Phys. Rev. A 135, 1381 (1964)
C.A. Londos, Phys. Stat. Sol. A 102, 639 (1987)
C.A. Londos, E.N. Sgourou, D. Hall, A. Chroneos, J. Mater. Sci.: Mater. Electron. 25, 2395 (2014)
D.J. Hall, N.J. Murray, J.P.D. Gow, D. Wood, A. Holland, J. Instrum. 9, C12004 (2014)
B.O. Kolbersen, A. Muhlbauer, Solid State Electron. 25, 759 (1982)
R.C. Newman, Mater. Res. Soc. Symp. Proc. 59, 403 (1986)
W. Scorupa, R.A. Yankov, Mater. Chem. Phys. 44, 101 (1996)
G. Davies, E.C. Lightowlers, R.C. Newman, A.S. Oates, Semicond. Sci. Technol. 2, 524 (1987)
R.C. Newman, A.R. Bean, Radiat. Eff. 8, 189 (1970)
G.D. Watkins, K.L. Brower, Phys. Rev. Lett. 36, 1329 (1976)
C.A. Londos, Phys. Rev. B 35, 6295 (1987)
E.V. Lavrov, L. Hoffmann, B.B. Nielsen, Phys. Rev. B 60, 8081 (1999)
C.A. Londos, M.S. Potsidi, E. Stakakis, Phys. B 340–342, 551 (2003)
C.-L. Liu, W. Windl, L. Borucki, S. Lu, X.-Y. Liu, Appl. Phys. Lett. 80, 52 (2002)
G. Davies, R.C. Newman, in Handbook of Semiconductors, ed. by S. Mahajan (Elsevier, Amsterdam, 1994), vol 3, p. 1557
M. Yamaguchi, A. Khan, S.J. Taylor, K. Ando, T. Yamaguchi, S. Matsuda, T. Aburaya, J. Appl. Phys. 86, 217 (1999)
K. Murata, Y. Yasutake, K. Nittoh, S. Fukatsu, K. Miki, AIP Adv. 1, 032125 (2011)
J.M. Trombetta, G.D. Watkins, Appl. Phys. Lett. 51, 1103 (1987)
R. Jones, S. Oberg, Phys. Rev. Lett. 68, 86 (1991)
J. Coutinho, R. Jones, P.R. Briddon, S. Oberg, L.I. Murin, V.P. Markevich, J.L. Lindstrom, Phys. Rev. B 65, 014109 (2001)
P. Leery, R. Jones, S. Oberg, V.J.B. Torres, Phys. Rev. B 55, 2188 (1997)
R.B. Capaz, A. Dal Pino Jr, J.D. Joannopoulos, Phys. Rev. B 58, 9845 (1998)
A. Mattoni, F. Bernantini, L. Colombo, Phys. Rev. B 66, 195214 (2002)
C.A. Londos, M.S. Potsidi, G.D. Antonaras, A. Andrianakis, Phys. B 376–377, 165 (2006)
D.J. Backlund, S.K. Estreicher, Phys. Rev. B 77, 205205 (2008)
G.D. Watkins, I.E.E.E. Trans, Nucl. Sci. 16, 13 (1969)
G.D. Watkins, Phys. Rev. B 12, 4383 (1975)
L.C. Kimerling, M.T. Asom, J.L. Benton, P.J. Drevinsky, C.E. Caefer, Mater. Sci. Forum 38–41, 141 (1989)
A. Chroneos, C. Jiang, R.W. Grimes, U. Schwingenschlogl, H. Bracht, Appl. Phys. Lett. 95, 112101 (2009)
S. Takeuchi, Y. Shimura, O. Nakatsuka, S. Zaima, M. Ogawa, A. Sakai, Appl. Phys. Lett. 92, 231916 (2008)
A. Chroneos, C. Jiang, R.W. Grimes, U. Schwingenschlögl, H. Bracht, Appl. Phys. Lett. 94, 252104 (2009)
C. Claeys, E. Simoen, V.B. Neimash, A. Kraitchinskii, M. Kras’ko, O. Puzenko, A. Blondeel, P. Clauws, J. Electrochem. Soc. 146, G738 (2001)
M.L. David, E. Simoen, C. Claeys, V. Neimash, M. Kras’ko, A. Kraitchinskii, V. Voytovych, A. Kabaldin, J.F. Barbot, Solid State Phenom. 108–109, 373 (2005)
C.A. Londos, D. Aliprantis, E.N. Sgourou, A. Chroneos, P. Pochet, J. Appl. Phys. 111, 123508 (2012)
A. Chroneos, C.A. Londos, E.N. Sgourou, P. Pochet, Appl. Phys. Lett. 99, 241901 (2011)
E.N. Sgourou, D. Timerkaeva, C.A. Londos, D. Aliprantis, A. Chroneos, D. Caliste, P. Pochet, J. Appl. Phys. 113, 113506 (2013)
A. Chroneos, H. Bracht, R.W. Grimes, B.P. Uberuaga, Mater. Sci. Eng. B 154–155, 72 (2008)
F.A. Kröger, V.J. Vink, in Solid State Physics, ed. by F. Seitz and D. Turnbull (Academic, New York, 1956), vol 3, p. 307
H. Wang, A. Chroneos, C.A. Londos, E.N. Sgourou, U. Schwingenschlögl, Appl. Phys. Lett. 103, 052101 (2013)
H. Wang, A. Chroneos, C.A. Londos, E.N. Sgourou, U. Schwingenschlögl, Sci. Rep. 4, 4909 (2014)
H. Wang, A. Chroneos, C.A. Londos, E.N. Sgourou, U. Schwingenschlögl, Phys. Chem. Chem. Phys. 16, 8487 (2014)
A. Chroneos, R.W. Grimes, B.P. Uberuaga, S. Brotzmann, H. Bracht, Appl. Phys. Lett. 91, 192106 (2007)
G. Impellizzeri, S. Boninelli, F. Priolo, E. Napolitani, C. Spinella, A. Chroneos, H. Bracht, J. Appl. Phys. 109, 113527 (2011)
M.J. Powell, S.C. Deane, Phys. Rev. B 53, 10121 (1995)
A. Chroneos, E.N. Sgourou, C.A. Londos, U. Schwingenschlögl, Appl. Phys. Rev. 2, 021306 (2015)
A. Chroneos, C.A. Londos, E.N. Sgourou, J. Appl. Phys. 110, 093507 (2011)
V.V. Voronkov, R. Falster, J. Electrochem. Soc. 149, G167 (2002)
V.B. Neimash, V.V. Voitovych, A.M. Kraitchinskii, L.I. Shpinar, M.M. Krasko, V.M. Popov, A.P. Pokanevych, M.I. Gorodyskyi, Y.V. Pavlovskyi, V.M. Tsmots, O.M. Kabaldin, Ukr. J. Phys. 50, 492 (2005)
K. Milants, J. Verheyden, T. Balancira, W. Deweerd, H. Pattyn, S. Bukshpan, D.L. Williamson, F. Vermeiren, G. Van Tendeloo, C. Viekken, S. Libbrecht, C. Van Haesendonck, J. Appl. Phys. 81, 2148 (1997)
A. Chroneos, C.A. Londos, J. Appl. Phys. 107, 093518 (2010)
A. Chroneos, R.W. Grimes, H. Bracht, J. Appl. Phys. 105, 016102 (2009)
A. Chroneos, H. Bracht, Appl. Phys. Rev. 1, 011301 (2010)
A. Chroneos, J. Appl. Phys. 107, 076102 (2010)
Acknowledgments
SRGC and AC are grateful for funding from the Lloyd’s Register Foundation, a charitable foundation helping to protect life and property by supporting engineering-related education, public engagement and the application of research.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Christopoulos, SR.G., Parfitt, D.C., Sgourou, E.N. et al. Controlling A-center concentration in silicon through isovalent doping: mass action analysis. J Mater Sci: Mater Electron 27, 4385–4391 (2016). https://doi.org/10.1007/s10854-016-4308-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-016-4308-9