Skip to main content
SpringerLink
Log in

A study on total thickness dependency: microstructural, magnetoresistance and magnetic properties of electrochemically deposited permalloy based multilayers

  • Published:
Journal of Materials Science: Materials in Electronics Aims and scope Submit manuscript

Abstract

Electrochemically deposited permalloy based NiFe/Cu multilayers, relating their magnetic and magnetoresistance properties with crystal structure and the corresponding film composition were studied as a function of the total film thickness. The permalloy based multilayers were grown on strong (110) textured copper sheets with electrodeposition under potentiostatic control. The total multilayer film thickness was changed from 0.3 to 5 µm while ferromagnetic nickel–iron and nonmagnetic copper layer thickness was kept constant at 3 and 1 nm, respectively. Energy dispersive X-ray analysis revealed that the nickel and iron content of the multilayers decreased and copper content increased as the total film thickness increased. All multilayers exhibited face-centred cubic structure with (110) preferred orientation. The highest peak intensity changed from (220) to (111) when the total thickness was higher than 2 µm. The multilayers exhibited giant magnetoresistance (GMR). The maximum GMR magnitude of ~4 % was obtained for the films with total thickness less than 1 µm and the GMR decreased down to ~1 % with increasing film thickness to 5 µm. The saturation magnetisation and coercivity decreased from 78 to 11 emu/cm3 and from 24 to 12 Oe as the total thickness of the multilayers increased from 0.3 to 5 µm, respectively. The variations in magnetic and magnetoresistive properties related to the microstructure were attributed to the variation of the film contents caused by total film thickness.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5

Similar content being viewed by others

References

  1. S.M.S.I. Dulal, E.A. Charles, S. Roy, Electrochim. Acta 49, 2041–2049 (2004)

    Article  Google Scholar 

  2. C.B. Ene, G. Schmitz, R. Kirchheim, A. Hütten, Acta Mater. 53(12), 3383–3393 (2005)

    Article  Google Scholar 

  3. M. Djamal, A. Ramli, Procedia Eng 32, 60–68 (2012)

    Article  Google Scholar 

  4. G. Nabiyouni, W. Schwarzacher, J. Cryst. Growth 275, 1259–1262 (2005)

    Article  Google Scholar 

  5. J. Gong, W.H. Butler, G. Zangari, IEEE Trans. Magn. 41(10), 3634–3636 (2005)

    Article  Google Scholar 

  6. I. Bakonyi, L. Peter, Prog. Mater Sci. 55, 107–245 (2010)

    Article  Google Scholar 

  7. J. Kanak, T. Stobiecki, P. Wiśniowski, G. Gladyszewski, W. Maass, B. Szymański, J. Magn. Magn. Mater. 239, 329–331 (2002)

    Article  Google Scholar 

  8. K. Attenborough, R. Hart, S.J. Lane, M. Alper, W. Schwarzacher, J. Magn. Magn. Mater. 148, 335–336 (1995)

    Article  Google Scholar 

  9. E. Chassaing, P. Nallet, M.F. Trichet, J. Electrochem. Soc. 143, 98–100 (1996)

    Article  Google Scholar 

  10. S. Esmaili, M.E. Bahrololoom, K.L. Kavanagh, Mater. Charact. 62, 204–210 (2011)

    Article  Google Scholar 

  11. S. Esmaili, M.E. Bahrololoom, Surf. Eng. Appl. Electrochem. 48, 35–41 (2012)

    Article  Google Scholar 

  12. S. Esmaili, M.E. Bahrololoom, L. Peter, Thin Solid Films 520, 2190–2194 (2012)

    Article  Google Scholar 

  13. M.S. Haciismailoglu, M. Alper, H. Kockar, J. Electrochem. Soc. 157(10), 538–545 (2010)

    Article  Google Scholar 

  14. N.V. Myung, K. Nobe, J. Electrochem. Soc. 148(3), 136–144 (2001)

    Article  Google Scholar 

  15. M. Saitou, W. Oshikawa, M. Mori, A. Makabe, J. Electrochem. Soc. 148, 780–783 (2001)

    Article  Google Scholar 

  16. X. Liu, P. Evans, G. Zangari, J. Magn. Magn. Mater. 226, 2073–2075 (2001)

    Article  Google Scholar 

  17. B.D. Cullity, Elements of X-Ray diffraction (Addison-Wesley Publishing, Reading, 1978)

    Google Scholar 

  18. A. Vicenzo, P.L. Cavallotti, Electrochim. Acta 49, 4079–4089 (2004)

    Article  Google Scholar 

  19. E.Y. Tsymbal, D.G. Pettifor, Solid State Physics, vol. 56 (Academic Press, Waltham, 2001), pp. 113–237

    Google Scholar 

  20. Q. Huang, D.P. Young, E.J. Podlaha, J. Appl. Phys. 94, 1864–1867 (2003)

    Article  Google Scholar 

  21. D. Jiles, Introduction to magnetism and magnetic materials (Chapman and Hall, London, 1996)

    Google Scholar 

Download references

Acknowledgments

This work was supported by Balikesir University Research Grant No. BAP 2001/02, 2005/38 for MR system and The State Planning Organization (DPT) under Grant No. 2005K120170 for VSM system, Scientific and Technical Research Council of Turkey (TUBITAK) under Grant No. TBAG-1771 for electrodeposition system. The authors would like to thank Material Science and Engineering Department, Anadolu University, Turkey for the use of XRD and EDX measurements.

Author information

Authors and Affiliations

  1. Physics Department, Science and Literature Faculty, Balikesir University, 10145, Cagıs, Balikesir, Turkey

    Hilal Kuru & Hakan Kockar

  2. Physics Department, Science and Literature Faculty, Uludag University, 16059, Gorukle, Bursa, Turkey

    Mursel Alper

Authors
  1. Hilal Kuru
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Hakan Kockar
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Mursel Alper
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Hilal Kuru.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Kuru, H., Kockar, H. & Alper, M. A study on total thickness dependency: microstructural, magnetoresistance and magnetic properties of electrochemically deposited permalloy based multilayers. J Mater Sci: Mater Electron 26, 5009–5013 (2015). https://doi.org/10.1007/s10854-015-3014-3

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10854-015-3014-3

Keywords

Search

Navigation