Abstract
It is shown that MOCVD growth allows to obtain BGaN epitaxial layers at growth temperature (Tgr) between 840 and 1090 °C. It is found that morphology of the epitaxial layers and amount of B replacing Ga strongly dependent on growth temperature. The SIMS determined that the total amount of B was constant for all growth temperatures. On the other hand, the X-ray measurements shown that amount of boron incorporated into gallium sites decreased from 2.5 to 0.73%, for Tgr changed from 840 to 1090 °C, respectively. That indicated that increase of growth temperature leads to transfer of B atoms from Ga substitutional sites to the interstitial positions. It was also shown that the c(x) lattice parameter for ternary BGaN alloys is well described by the standard interpolation formula. On the other hand, energy shifts observed in photoluminescence suggest that the layers are under dilatation strain.
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03 April 2022
This article was revised to correct a spelling error in the first author affiliation.
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Acknowledgements
This work was financially supported from the Grant No. 4/Ł-IMIF/CŁ/2021 funded by The Łukasiewicz Centre. Authors of the paper would like to thank professor Krzysztof P. Korona for photoluminescence measurements and for helpful discussions. Also, authors would like to thank Jacek Nizel for performing an epitaxial growth. Karolina Pietak acknowledges financial support from the IDUB project (Scholarship Plus programme).
Funding
This study was funded by The Łukasiewicz Centre (Grant Number 4/Ł-IMIF/CŁ/2021).
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Możdżyńska, E.B., Złotnik, S., Ciepielewski, P. et al. Insights on boron impact on structural characteristics in epitaxially grown BGaN. J Mater Sci 57, 7265–7275 (2022). https://doi.org/10.1007/s10853-022-07085-z
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DOI: https://doi.org/10.1007/s10853-022-07085-z