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Photoacoustic Elastic Bending Method: Characterization of Thin Films on Silicon Membranes

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Abstract

Photoacoustic (PA) elastic bending effects have been studied and used to develop the experimental non-contact and non-destructive method that make it possible to investigate the optical, thermal, and elastic properties of thin films. A theoretical model for optically excited thin films on a Si membrane, which includes plasmaelastic, thermoelastic, and thermodiffusion mechanisms, is given. Relations for the PA elastic bending signal in the optically excited two-layer Si membrane are derived. The method was verified by measuring the experimental amplitude and phase of the PA elastic bending of the thin \(\hbox {TiO}_{2}\) film on Si square membranes and compared with the theoretically calculated spectra. The analysis shows that it is possible to obtain the optical, thermal, and elastic parameters of a film thinner than \(1\,\upmu \hbox {m}\).

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Acknowledgments

This work was supported by the Serbian Ministry of Education and Science – Project OI171016.

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Correspondence to D. M. Todorovic.

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Todorovic, D.M., Rabasovic, M.D., Markushev, D.D. et al. Photoacoustic Elastic Bending Method: Characterization of Thin Films on Silicon Membranes. Int J Thermophys 36, 1016–1028 (2015). https://doi.org/10.1007/s10765-014-1801-3

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  • DOI: https://doi.org/10.1007/s10765-014-1801-3

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