Skip to main content
SpringerLink
Log in

Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition

  • Special Section: Regular Paper
  • The Fourteenth Japan-Finland Joint Symposium on Optics in Engineering (OIE’23), Hamamatsu, Japan
  • Published:
Optical Review Aims and scope Submit manuscript

Abstract

Magnesium fluoride (MgF2) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10

Similar content being viewed by others

Data availability

All data generated or analyzed during this study are included in this published article.

References

  1. Bridou, F., Cuniot-Ponsard, M., Desvignes, J.M., Richter, M., Kroth, U., Gottwald, A.: Experimental determination of optical constants of MgF2 and AlF3 thin films in the vacuum ultra-violet wavelength region (60–124nm), and its application to optical designs. Opt. Commun. 283, 1351–1358 (2010)

    Article  ADS  CAS  Google Scholar 

  2. Larruquert, J.I., Keski-Kuha, R.A.M.: Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al. Opt. Commun. 215, 93–96 (2003)

    Article  ADS  CAS  Google Scholar 

  3. Kennemore, C.M., Gibson, U.J.: Ion beam processing for coating MgF2 onto ambient temperature substrates. Appl. Opt. 23, 3608–3611 (1984)

    Article  ADS  CAS  PubMed  Google Scholar 

  4. Wilbrandt, S., Stenzel, O., Bischoff, M., Kaiser, N.: Combined in situ and ex situ optical data analysis of magnesium fluoride coatings deposited by plasma ion assisted deposition. Appl. Opt. 50, C5–C10 (2011)

    Article  PubMed  Google Scholar 

  5. Fragalà, M.E., Toro, R.G., Privitera, S., Malandrino, G.: MOCVD fabrication of magnesium fluoride films: effects of deposition parameters on structure and morphology. Chem. Vapor Deposit. 17, 80–87 (2011)

    Article  Google Scholar 

  6. Fragalà, M.E., Toro, R.G., Rossi, P., Dapporto, P., Malandrino, G.: Synthesis, characterization, and mass transport properties of a self-generating single-source magnesium precursor for MOCVD of MgF2 Films. Chem. Mater. 21(10), 2062–2069 (2009)

    Article  Google Scholar 

  7. Xu, H., Akbari, M.K., Zhuiykov, S.: “2D semiconductor nanomaterials and heterostructures: controlled synthesis and functional applications. Nonoscale Res. Lett. 16(1), 94 (2021)

    Article  ADS  CAS  Google Scholar 

  8. Oke, J.A., Jen, T.C.: Atomic layer deposition and other thin film deposition techniques: from principles to film properties. J. Mater. Res. Technol. 21, 2481–2514 (2022)

    Article  CAS  Google Scholar 

  9. Colburn, S., Zhan, A., Bayati, E., Whitehead, J., Ryou, A., Huang, L., Mujumdar, A.: Broadband transparent and CMOS-compatible flat optics with silicon nitride metasurface. Opt. Mater. Express 8, 2330–2344 (2018)

    Article  ADS  CAS  Google Scholar 

  10. Sugai, Y., Sato, T., Sugata, H., Sakano, Y., Okuyama, S., Sugawara, T., Safdar, M., Hämäläinen, J., Suni, T.: Atomic layer deposition of magnesium fluoride for optical application. In: Optical Interference Coatings Conference 2022, TC5 (2022)

  11. Pilvi, T., Hatanpää, T., Puukilainen, E., Arstila, K., Bischoff, M., Kaiser, U., Kaiser, N., Leskelaü, M., Ritala, M.: Study of a novel ALD process for depositing MgF2 thin films. J. Mater. Chem. 17, 5077–5083 (2007)

    Article  CAS  Google Scholar 

  12. Putkonen, M., Szeghalmi, A., Pippel, E., Knez, M.: Atomic layer deposition of metal fluorides through oxide chemistry. J. Mater. Chem. 21, 14461–14465 (2011)

    Article  CAS  Google Scholar 

  13. Hennessy, J., Jewell, A.D., Greer, F., Lee, M.C., Nikzad, S.: Atomic layer deposition of magnesium fluoride via bis (ethyl-cyclopentadienyl) magnesium and anhydrous hydrogen fluo-ride. J. Vac. Sci. Technol. A33, 01A125 (2015)

    Article  Google Scholar 

  14. Lee, Y., Sun, H., Young, M.J., George, M.: Atomic layer deposition of metal fluorides using HF-pyridine as the fluorine Precursor. Chem. Mater. 28, 2022–2032 (2016)

    Article  CAS  Google Scholar 

  15. Celler, G.K., Barr, D.L., Rosamilia, J.M.: Etching of silicon by the RCA standard clean 1. Electrochem. Solid-State Lett. 3(1), 47–49 (2000)

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Shincron Co., Ltd., Yokohama, Japan

    Yuma Sugai, Hironori Sugata & Takuya Sugawara

  2. Picosun Oy., Masala, Finland

    Safdar Muhammad, Jani Hämäläinen, Nina Lamminmäki & Juhana Kostamo

Authors
  1. Yuma Sugai
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Hironori Sugata
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Takuya Sugawara
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Safdar Muhammad
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Jani Hämäläinen
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Nina Lamminmäki
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. Juhana Kostamo
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Yuma Sugai.

Additional information

Publisher's Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Sugai, Y., Sugata, H., Sugawara, T. et al. Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition. Opt Rev (2024). https://doi.org/10.1007/s10043-024-00867-7

Download citation

  • Received:

  • Accepted:

  • Published:

  • DOI: https://doi.org/10.1007/s10043-024-00867-7

Keywords

Search

Navigation