Abstract
The paper investigates the characteristics of GZO/Ti/GZO multilayer films deposited on polyimide flexible substrates by using DC sputtering temperature and under different annealing temperatures of 300, 350 and 400 °C. The results of the XRD analysis show that all the films were found to exhibit a strong (002) GZO preferential orientation. Furthermore, these results show that the optical transmittance of the GZO/Ti/GZO thin films exhibited an excellent transparency under high annealing temperature. Moreover, the resistivity of GZO/Ti/GZO decreased with increasing annealing temperature. Finally, it can be observed that the crystal structures of the GZO/Ti/GZO thin films are improved with increasing annealing temperature. Finally, the nanomechanical properties of the GZO/Ti/GZO multilayer films are found to improve when the annealing temperature is increased.
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The author gratefully acknowledges the financial support provided for this study by the National Science Council (NSC) of Taiwan under contract No. NSC 102-2212-E-151-006-MY3.
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Chen, TH., Chiang, CC. & Chen, TY. The characteristics of GZO/Ti/GZO multilayer films deposited on flexible substrates under different annealing temperatures. Microsyst Technol 23, 1687–1693 (2017). https://doi.org/10.1007/s00542-015-2689-y
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DOI: https://doi.org/10.1007/s00542-015-2689-y