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Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching

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Abstract

Recently, micro-lenses have attracted more attention among optoelectronics device application developers. This paper presents the micro-array of Si-Fresnel rings fabricated by the electron beam lithography and reactive ion etching. Fresnel rings units containing 11 concentric rings were created on the PMMA layer with the outermost Fresnel ring, having an external diameter of 45.24 μm, and are located ≈200 μm away from each other. These structures can be copied as the micro-array of Fresnel lenses for optoelectronics device applications.

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Acknowledgments

This work was performed at the Nano-Optoelectronics Research and Technology (NOR) Laboratory of the School of Physics, Universiti Sains Malaysia (USM). Therefore, the authors wish to acknowledge the financial support from the USM and Malaysian Ministry of Higher Education (MOHE) via their Fundamental Research Grant Scheme (FRGS) at the Grant (203/PSF/6721001) and Umaru Musa Yar’adua University, Katsina (UMYUK) via the Tertiary Education Trust Fund (TETFund) Scheme for the financial sponsorship of my PhD research work.

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Authors and Affiliations

  1. Institute of Nano-Optoelectronics Research and Technology (INOR), Universiti Sains Malaysia, 11800, Gelugor, Penang, Malaysia

    Nura Liman Chiromawa & Kamarulazizi Ibrahim

  2. Department of Physics, Umaru Musa Yar’adua University, P. M. B. 2218, Katsina, Nigeria

    Nura Liman Chiromawa

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  1. Nura Liman Chiromawa
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  2. Kamarulazizi Ibrahim
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Correspondence to Nura Liman Chiromawa.

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Chiromawa, N.L., Ibrahim, K. Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching. Appl. Phys. A 122, 129 (2016). https://doi.org/10.1007/s00339-016-9649-y

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  • DOI: https://doi.org/10.1007/s00339-016-9649-y

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