Abstract
A thin and uniform residual layer, especially zero-residual layer, is highly desired in the nanoimprint lithography, because it is critical to the succeeding pattern transfer process. In this study, a partial cavity filling method was applied on UV-curable resins instead of thermal plastic polymer to realize zero-residual layer based on a hybrid nanoimprint technique. The initial thickness of the UV-curable resin on the substrate was precisely quantified less than the cavity volume of the imprint mold by adjusting the resin concentration and spin coating speed. A near-zero-residual layer was successfully achieved under an extremely low imprint pressure by the control of the viscosity, surface tension and thickness of the UV-curable resist.
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Acknowledgments
This work was jointly supported by the National Basic Research Program of China (973 Program) (Grant No. 2013cb632702), the National Nature Science Foundation of China (Grant No. 51473076) and the Priority Academic Program Development of Jiangsu Higher Education Institutions and RFDP.
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Cui, Y., Lu, J., Fu, X. et al. Near-zero-residual layer nanoimprint based on hybrid nanoimprint soft lithography. Appl. Phys. A 121, 371–375 (2015). https://doi.org/10.1007/s00339-015-9195-z
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DOI: https://doi.org/10.1007/s00339-015-9195-z