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Surface roughness evolution in a solid-on-solid model of epitaxial growth

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Abstract

The paper presents results from kinetic Monte Carlo simulations of kinetic surface roughening using an important and experimentally relevant model of epitaxial growth—the solid-on-solid model with Arrhenius dynamics. A restriction on diffusing adatoms is included allowing hopping down only at steps of height one monolayer in order to avoid possibly unrealistic events of jumping from arbitrarily high steps. Simulation results and precise analytic expressions representing the time evolution of surface roughness do not depend on the substrate size and clearly put forward the conclusion that for any basic set of parameters, the model approaches in asymptotic limit the usual random deposition process with growth exponent \(\beta =1/2\). At high temperatures, it is preceded by a long transient regime characterized by a smooth surface covered with porous pillars and described by a power law with \(\beta =3/4\).

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Acknowledgments

We thank very much the referees for their highly relevant and constructive remarks that have helped us to improve the paper.

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Authors and Affiliations

  1. Faculty of Mathematics and Informatics, Sofia University, 5 James Bourchier blvd., 1164, Sofia, Bulgaria

    Petar Petrov

  2. Leibniz Institute for Crystal Growth, Max-Born-Str. 2, 12489, Berlin, Germany

    Daniela Gogova

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  1. Petar Petrov
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  2. Daniela Gogova
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Correspondence to Petar Petrov.

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Petrov, P., Gogova, D. Surface roughness evolution in a solid-on-solid model of epitaxial growth. Appl. Phys. A 118, 337–343 (2015). https://doi.org/10.1007/s00339-014-8736-1

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  • DOI: https://doi.org/10.1007/s00339-014-8736-1

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