Abstract
We are presenting a long-time bias stress stability of C60-based n-type organic field effect transistors (OFETs), in bottom gate, top contacts configuration, with aluminium (Al), silver (Ag) and gold (Au) source–drain contacts. The results clearly shows that the bias stress effects in C60-based n-type OFETs is similar to p-type OFETs and it can be reduced by using an appropriate metal for the source–drain contacts. During the bias stress time, the threshold voltage shift and an increase in the contacts resistance have also been measured. On the basis of the stability of the device parameters, it is proposed that the Al source–drain contact-based devices gives better stability as compared to the devices with Ag and Au source–drain contacts. Our results show that the bias stress-induced threshold voltage shift is due to the trapping of charges in the channel region and in the vicinity of the source–drain contacts.
Similar content being viewed by others
References
H.E. Katz, A.J. Lovinger, J. Johnson, C. Kloc, T. Siegrist, W. Li, Y.-Y. Lin, A. Dodabalapur, Nature 404, 478 (2000)
G. Schwabegger, M. Ullah, M. Irimia-Vladu, M. Reisinge, Y. Kanbur, R. Ahmed, P. Stadler, S. Bauer, N.S. Sariciftci, H. Sitter, Synth. Met. 161, 2058 (2011)
H. Yan, Z. Chen, Y. Zheng, C. Newman, J.R. Quinn, F. Dötz, M. Kastler, A. Facchetti, Nature 457, 679 (2009)
T. Sekitani, T. Someya, Mater. Today 14, 398 (2011)
X. Zhao, X. Zhan, Chem. Soc. Rev. 40, 3728 (2011)
H. Bai, G. Shi, Sensors 7, 267 (2007)
R. Ahmed, A. Kadashchuk, C. Simbrunner, G. Schwabegger, M. Havlicek, E. Głowacki, N.S. Sariciftci, M.A. Baig, H. Sitter, Org. Electron. 15, 175 (2014)
G.H. Gelinck, H.E.A. Huitema, E. van Veenendaal, E. Cantatore, L. Schrijnemakers, J.B.P.H. van der Putten, T.C.T. Geuns, M. Beenhakkers, J.B. Giesbers, B.H. Huisman, E.J. Meijer, E.M. Benito, F.J. Touwslager, A.W. Marsman, B.J.E. van Rens, D.M. de Leeuw, Nat. Mater. 3, 106 (2004)
A. Selleo, R.J. Kline, D.M. De Longchamp, M.L. Chabinyc, Adv. Mater. 22, 3812 (2010)
M. Caironi, M. Bird, D. Fazzi, Z. Chen, R. Di Pietro, C. Newman, A. Facchetti, H. Sirringhaus, Adv. Funct. Mater. 21, 3371 (2011)
T. Sakanoue, H. Sirringhaus, Nat. Mater. 9, 3371 (2011)
S. Kobayshi, T. Nishikawa, T. Takenobu, S. Mori, T. Shimoda, T. Mitani, H. Shimotani, N. Yoshimoto, S. Ogawa, Y. Iwasa, Nat. Mater. 3, 317 (2004)
C.D. Dimitrakopoulos, P.R.L. Malenfant, Adv. Mater. 14, 100 (2002)
R. Ahmed, C. Simbrunner, G. Schwabegger, M.A. Baig, H. Sitter, Synth. Met. 188, 136 (2014)
H. Sirringhaus, Adv. Mater. 21, 3859 (2009)
H. Jung, T. Lim, Y. Choi, M. Yi, J. Won, S. Pyo, Appl. Phys. Lett. 90, 163504 (2008)
S.H. Han, J.H. Kim, J. Jang, S.M. Cho, M.H. Oh, S.H. Lee, D.J. Choo, Appl. Phys. Lett. 88, 07519 (2006)
R.A. Street, Phys. Rev. B 77, 165311 (2008)
A. Nigam, G. Schwabegger, M. Ullah, R. Ahmed, I.I. Fishchuk, A. Kadashchuk, C. Simbrunner, H. Sitter, M. Premaratne, V.R. Rao, Appl. Phys. Lett. 101, 083305 (2012)
D. Natali, M. Caironi, Adv. Mater. 24, 1357 (2012)
M.G. Helander, Z.B. Wang, Z.H. Lu, Appl. Phys. Lett. 93, 083311 (2008)
S. Braun, W.R. Salaneck, M. Fahlman, Adv. Mater. 21, 1450 (2009)
S. Schols, L. van Willigenburg, R. Müller, D. Bode, M. Debucquoy, S. De Jonge, J. Genoe, P. Heremans, S. Lu, A. Facchetti, Appl. Phys. Lett. 93, 263303 (2008)
S.Y. Kim, J.L. Lee, K.B. Kim, Y.H. Tak, Appl. Phys. Lett. 86, 133504 (2005)
Q. Xu, J. Ouyang, Y. Yang, T. Ito, J. Kido, Appl. Phys. Lett. 83, 4695 (2003)
S.A. Choulis, V.E. Choong, A. Patwardhan, M.K. Mathai, F. So, Adv. Funct. Mater. 16, 1075 (2006)
A. Wan, J. Hwang, F. Amy, A. Kahn, Org. Electron. 6, 47 (2005)
L. Lindell, M. Unge, W. Osikowiez, S. Stafström, W.R. Salaneck, X. Crispin, M.P. De Jong, Appl. Phys. Lett. 92, 163302 (2008)
T. Richards, H. Sirringhaus, Appl. Phys. Lett. 92, 023512 (2008)
S.D. Wang, T. Minari, T. Miyadera, Y. Aoyagi, K. Tsukagoshi, Appl. Phys. Lett. 92, 063305 (2008)
Y. Yan, X.J. She, H. Zhu, S.D. Wang, Org. Electron. 12, 823 (2011)
R. Ahmed, M. Sams, C. Simbrunner, M. Ullah, K. Rehman, G. Schwabegger, H. Sitter, T. Ostermann, Synth. Met. 161, 2562 (2012)
A. Nagata, T. Oku, T. Akiyama, A. Suzuki, Y. Yamasaki, T. Mori, J. Nanotechnol 2011, 869596 (2011)
S.G.J. Mathijssen, M. Kemerink, A. Sharma, M. Cölle, P.A. Bobbert, R.A.J. Janssen, D.M. de Leeuw, Adv. Mater. 20, 975 (2008)
S.D. Wang, Y. Yan, K. Tsukagoshi, IEEE Electron. Dev. Lett. 31, 509 (2010)
S.D. Wang, T. Miyadera, T. Minari, Y. Aoyagi, K. Tsukagoshi, Appl. Phys. Lett. 91, 203508 (2007)
R. Ahmed, C. Simbrunner, G. Schwabegger, M. A. Baig, H. Sitter, Stability of low voltage n-type organic field effect transistors. Synth. Met. (submitted 2014)
A. Salleo, R.A. Street, J. Appl. Phys. 94, 471 (2003)
T. Matsushima, M. Yahiro, C. Adachi, Appl. Phys. Lett. 91, 103505 (2007)
L. Tsetseris, S.T. Pantelides, Phys. Rev. B 82, 045201 (2010)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Ahmed, R., Simbrunner, C., Schwabegger, G. et al. The role of metal contacts in the stability of n-type organic field effect transistors. Appl. Phys. A 117, 2235–2240 (2014). https://doi.org/10.1007/s00339-014-8652-4
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-014-8652-4