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Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

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Abstract

A novel innovative catalytic abrasive cluster prepared in the laboratory was used for tribochemical mechanical polishing of silicon carbide wafers, and the polishing performance of catalytic abrasive cluster was characterized. Comparison of tribochemical mechanical polishing using Al2O3 abrasive, iron-based white corundum mixed abrasive and catalytic abrasive cluster to study the material removal mechanism of catalytic abrasive cluster on silicon carbide workpieces. Quanta 200 scanning electron microscope (SEM) and Oxford INCA 250 energy-dispersive spectrometer (EDS) and x-ray diffraction (XRD) diffractometer were used to observe the surface, analyze the elements, and determine the composition of silicon carbide workpiece after tribochemical mechanical polishing. The experimental result shows that oxygen is produced in the tribochemical mechanical polishing of silicon carbide by catalytic abrasive cluster, which makes the silicon carbide surface generates SiO2 shear film that is easy to be removed. Comparing with iron-based white corundum mixed abrasive and Al2O3 abrasive, the catalytic abrasive cluster has better processability for 6H-SiC, and the material removal rate can reach to 42.928 nm/min.

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Funding

This study was supported by the National Natural Science Foundation of China (U1804142). The project was funded by China Postdoctoral Science Foundation (2020M672220) and Science and Technology Plan projects of Henan province (212102210062).

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Authors and Affiliations

  1. School of Mechanical and Electrical Engineering, Henan Institute of Science and Technology, Xinxiang, 453003, Henan, China

    Zhankui Wang, Yangyang Ding, Pengzhan Wang, Minghua Pang, Hongyuan Zhao, Lijie Ma, Fuquan Nie & Jianxiu Su

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  1. Zhankui Wang
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Correspondence to Zhankui Wang.

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Wang, Z., Ding, Y., Wang, P. et al. Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster. Int J Adv Manuf Technol 131, 2365–2376 (2024). https://doi.org/10.1007/s00170-023-11613-9

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