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Atom probe field-ion microscopy: A technique for microstructural characterization of irradiated materials on the atomic scale

  • Symposium on Irradiation-Enhanced Materials Science and Engineering
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Abstract

Atom probe field-ion microscopy (APFIM) is well suited to the microstructural characterization of the ultrafine-scale features that are formed in materials during irradiation. The atomic spatial resolution of this technique permits a complete microstructural and chemical description of the ultrafine features that control the mechanical properties to be made. A description of the technique and the types of analyses that may be performed are presented.

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Authors and Affiliations

  1. Metals and Ceramics Division, Oak Ridge National Laboratory, 37831, Oak Ridge, TN

    M. K. Miller (Research Staff Member)

  2. Department of Metallurgy and Science of Materials, University of Oxford, Parks Road, OX1 3PH, Oxford, UK

    M. G. Hetherington (Research Fellow)

  3. Westinghouse Research and Development Center, 1310 Beulah Road, Pittsburgh, PA, 15235

    M. G. Burke (Senior Research Scientist)

Authors
  1. M. K. Miller
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  2. M. G. Hetherington
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Additional information

This paper is based on a presentation made in the symposium “Irradiation-Enhanced Materials Science and Engineering” presented as part of the ASM INTERNATIONAL 75th Anniversary celebration at the 1988 World Materials Congress in Chicago, IL, September 25-29, 1988, under the auspices of the Nuclear Materials Committee of TMS-AIME and ASM-MSD.

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Miller, M.K., Hetherington, M.G. & Burke, M.G. Atom probe field-ion microscopy: A technique for microstructural characterization of irradiated materials on the atomic scale. Metall Trans A 20, 2651–2661 (1989). https://doi.org/10.1007/BF02670158

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