Abstract
The synthesis of Ge nanocrystals (NCs) by using ion implantation method is reported here along with the results from different spectroscopic and microscopic characterizations such as Rutherford backscattering spectroscopy (RBS), X-ray diffraction (XRD), Raman spectroscopy, photoluminescence (PL), and atomic force microscopy (AFM). Various fluences of 1 MeV Ge ions have been implanted into SiO2, and then, as-implanted samples were annealed using rapid thermal annealing system for the synthesis of Ge NCs. The Ge NCs presence was confirmed from Raman spectroscopy and XRD measurements. The low-fluence implanted sample did not show any signature of Ge NCs, whereas Ge NCs presence has been observed in the high-fluence implanted sample after annealing. The mechanism of Ge NCs formation in the as-implanted samples after annealing has been discussed.
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Acknowledgements
VS acknowledges funding received from UGC and SERB through grants UGC-F.30-456/2018(BSR) and SERB-SRG/2019/001830. APP acknowledges National Academy of Sciences, Prayagraj for award of NASI Senior Scientist Platinum Jubilee Fellowship. We are thankful to UGC NRC Centre of School of Physics at UOHYD for extending Raman and XRD facilities.
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Saikiran, V., Neelima, G., Rao, N.S., Pathak, A.P. (2023). Ion Beam Synthesis of Germanium Nanocrystals—A Fluence Dependence Study. In: Rao, N.M., Lingamallu, G., Agarwal, M. (eds) Advanced Nanomaterials and Their Applications. ICANA 2022. Springer Proceedings in Materials, vol 22. Springer, Singapore. https://doi.org/10.1007/978-981-99-1616-0_1
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