Nanotechnology in Dental Implantology

Abstract

Nanotechnology can be employed in changing the implant surface chemistry and topography which can in turn affect osteointegration, the most crucial aspect for implant success. Currently, implants are primarily fabricated from titanium, titanium alloys, and ceramic based materials such as zirconia. After fabrication with these primary materials, the topography of the implant surfaces can then be effectively modified using various physical and chemical methods. Physical methods commonly employed include plasma spraying, sputtering, ion implantation, and titanium dioxide coatings. Lasers and UV photofunctionalisation have also been employed to physically alter the surface characteristics and augment the biological activity at the implant interface. In addition to these physical methods, chemical methods such as anodisation, acid treatment with sulfuric acid or nitric acid, alkali treatment with sodium or potassium hydroxide, sol–gel method, chemical vapor deposition or a combination of these methods can also be successfully used. The quality of osseointegration of such nanomodified implants has to be assessed using in vivo models. While more research is definitely required, nanotechnology offers exciting new frontiers in developing better dental implants and combining nanotechnology with other cutting-edge fields such as tissue engineering that can prove to be exciting and in the long run provide optimum clinical results.