Abstract
In this work, the different figures-of-merit for AlN/β-Ga2O3 High Electron Mobility Transistor (HEMT) are computed using TCAD. The first and second-order derivatives of transconductance, output-conductance (gd), intrinsic-gain (dB), gate-source capacitance (Cgs), gate-drain capacitance (Cgd), transconductance-generation factor (TGF), transconductance-frequency product (TFP), 1-dB compression-point, extrapolated input voltages (VIP2 and VIP3), third-order input intercept point (IIP3), third-order intermodulation distortion (IMD3), and gain-transconductance frequency product (GTFP) are computed to predict the linearity performance and minimize intermodulation distortion. The present analysis is beneficial for optimizing the device bias point required for RFIC design.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
H. Sun et al., Valence and conduction band offsets of β-Ga2O3/AlN heterojunction. Appl. Phys. Lett. 111(16), 162105 (2017)
V. Gottschalch et al., Growth of β-Ga2O3 on Al2O3 and GaAs using metal-organic vapor-phase epitaxy. Phys. status solidi 206(2), 243–249 (2009)
Y. Zhang et al., Demonstration of high mobility and quantum transport in modulation-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructures. Appl. Phys. Lett. 112(17), 173502 (2018)
Y.K. Verma, V. Mishra, S.K. Gupta, A physics based analytical model for MgZnO/ZnO HEMT, J. Circuits, Syst. Comput. (2019)
S. Ghosh, A. Dasgupta, S. Khandelwal, S. Agnihotri, Y.S. Chauhan, Surface-potential-based compact modeling of gate current in AlGaN/GaN HEMTs. IEEE Trans. Electron Devices 62(2), 443–448 (2015). https://doi.org/10.1109/TED.2014.2360420
S. Khandelwal, Y.S. Chauhan, T.A. Fjeldly, Analytical modeling of surface-potential and intrinsic charges in AlGaN/GaN HEMT devices. IEEE Trans. Electron Devices 59(10), 2856–2860 (2012). https://doi.org/10.1109/TED.2012.2209654
Y.K. Verma, V. Mishra, P.K. Verma, S.K. Gupta, Analytical modelling and electrical characterisation of ZnO based HEMTs, Int. J. Electron. 106(5), 707–720 (2019)https://doi.org/10.1080/00207217.2018.1545931
S. Krishnamoorthy, Z. Xia, S. Bajaj, M. Brenner, S. Rajan, Delta-doped β-gallium oxide field-effect transistor. Appl. Phys. Express 10(5), 51102 (2017)
J. Zhang, B. Syamal, X. Zhou, S. Arulkumaran, G.I. Ng, A compact model for generic Mis-hemts based on the unified 2deg density expression. IEEE Trans. Electron Devices 61(2), 314–323 (2014). https://doi.org/10.1109/TED.2013.2295400
S. Krishnamoorthy et al., Modulation-doped β-(Al0.2Ga0.8)2O3/Ga2O3 field-effect transistor, Appl. Phys. Lett. 111(2), 23502 (2017)
B.W. Krueger, C.S. Dandeneau, E.M. Nelson, S.T. Dunham, F.S. Ohuchi, M.A. Olmstead, Variation of Band Gap and Lattice Parameters of β-(AlxGa1− x)2O3 powder produced by solution combustion synthesis. J. Am. Ceram. Soc. 99(7), 2467–2473 (2016)
Z. Hu et al., Enhancement-mode Ga2O3 vertical transistors with breakdown voltage >1 kV. IEEE Electron Device Lett. 39(6), 869–872 (2018)
Z. Xia et al., β-Ga2O3 delta-doped field-effect transistors with current gain cutoff frequency of 27 GHz. IEEE Electron Device Lett. 40(7), 1052–1055 (2019)
S.W. Kaun, F. Wu, J.S. Speck, β-(AlxGa1− x)2O3/Ga2O3 (010) heterostructures grown on β-Ga2O3 (010) substrates by plasma-assisted molecular beam epitaxy, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 33(4), 41508 (2015)
S. Kumar, R. Soman, A.S. Pratiyush, R. Muralidharan, D.N. Nath, A performance comparison between beta-Ga2O3 and GaN HEMTs. IEEE Trans. Electron Devices 66(8), 3310–3317 (2019)
Y.K. Verma, S.K. Gupta, Center potential based analysis of Si and III-V gate all around field effect transistors (GAA-FETs), Silicon, 1–17 (2020)
S.K. Gupta, A.S. Rawat, Y.K. Verma, V. Mishra, Linearity distortion analysis of junctionless quadruple gate MOSFETs for analog applications, Silicon, 1–9 (2018). https://doi.org/10.1007/s12633-018-9850-z
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2023 The Author(s), under exclusive license to Springer Nature Singapore Pte Ltd.
About this chapter
Cite this chapter
Verma, Y.K., Mishra, V., Singh, R., Lenka, T.R., Gupta, S.K. (2023). Linearity Analysis of AlN/β-Ga2O3 HEMT for RFIC Design. In: Lenka, T.R., Nguyen, H.P.T. (eds) HEMT Technology and Applications. Springer Tracts in Electrical and Electronics Engineering. Springer, Singapore. https://doi.org/10.1007/978-981-19-2165-0_15
Download citation
DOI: https://doi.org/10.1007/978-981-19-2165-0_15
Published:
Publisher Name: Springer, Singapore
Print ISBN: 978-981-19-2164-3
Online ISBN: 978-981-19-2165-0
eBook Packages: EngineeringEngineering (R0)