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Study of Temperature Effect on MOS-HEMT Small-Signal Parameters

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Micro and Nanoelectronics Devices, Circuits and Systems

Part of the book series: Lecture Notes in Electrical Engineering ((LNEE,volume 781))

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Abstract

This paper presents an effect of temperature on small-signal equivalent circuit parameters that have been analyzed for AlInN/AlN/GaN metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT). The analysis has been performed with the temperature range from −50 to 100 °C by S-parameter calculations at 100 GHz frequency. The thermal analysis of equivalent circuit parameters was investigated for the first-time with the proposed device. The equivalent circuit parameters such as intrinsic delay time (τ), gate–source capacitance (Cgs), extrinsic resistances (Rg, Rs, Rd), and intrinsic resistances (Rds, Rgd, Rin) show a positive shift with increasing temperature. On the other hand, intrinsic transconductance (gm), drain–source capacitance (Cds), and gate–drain capacitance (Cgd) show a negative shift with temperature. Obtained results will give some valuable information for design optimizations of GaN-based Monolithic microwave integrated circuits (MMICs) and other high power/frequency applications.

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References

  1. Zhang D, Cheng X, Ng WT, Shen L, Zheng L, Wang Q, Qian R, Gu Z, Wu D, Zhou W, Zhu H, Yu Y (2018) Reliability improvement of GaN devices on free-standing GaN substrates. IEEE Trans Electron Dev 65(8):3379–3387

    Google Scholar 

  2. Gao Z, Romero MF, Calle F (2018) Thermal and electrical stability assessment of AlGaN/GaN metal–oxide-semiconductor high-electron mobility transistors (MOS-HEMTs) With HfO2 gate dielectric. IEEE Trans Electron Dev 65(8):3142–3148

    Article  Google Scholar 

  3. Wang PF, Li X, Zhang EX, Jiang R, McCurdy MW, Poling BS, Heller ER, Schrimpf RD, Fleetwood DM (2020) Worst-case bias for high voltage elevated-temperature stress of AlGaN/GaN HEMTs. IEEE Trans Dev Mater Reliab 20(2):420–428

    Article  Google Scholar 

  4. Muhtadi S, Hwang S, Coleman A, Asif F, Lunev A, Chandrashekhar MVS, Khan A (2017)High temperature operation of n-AlGaN channel metal semiconductor field effect transistors on low-defect AlN templates. Appl Phys Lett 110:193501

    Google Scholar 

  5. Amarnath G, Panda DK, Lenka TR (2019)Modeling and simulation of DC and microwave characteristics of AlInN(AlGaN)/AlN/GaN MOSHEMTs with different gate lengths. Int J Num Model Electron Netw Dev Fields 32(1):e2456

    Google Scholar 

  6. Lee C-S, Yao X-C, Huang Y-P, Hsu W-C (2019) Improved ultraviolet detection and device performance of Al2O3-dielectric In0.17Al0.83N/AlN/GaN MOS-HFETs. IEEE J Electron Dev Soc 7:430–434

    Article  Google Scholar 

  7. Mondal A, Roy A, Mitra R, Kundu A (2019) Comparative study of variations in gate oxide material of a novel underlap DG MOS-HEMT for analog/RF and high power applications. Silicon

    Google Scholar 

  8. Alim MA, Rezazadeh AA, Gaquiere C (2015) Thermal characterization of DC and small-signal parameters of 150 and 250 nm gate-length AlGaN/GaN HEMTs grown on a SiC substrate. Semiconduc Sci Technol 30:125005

    Google Scholar 

  9. Amarnath G, Panda DK, Lenka TR (2017) Microwave frequency small-signal equivalent circuit parameter extraction for AlInN/GaN MOSHEMT. Int J RF Microwave Comput Aided Eng e21179

    Google Scholar 

  10. Panda DK, Amarnath G, Lenka TR (2018) Small-signal model parameter extraction of E-mode N-polar GaN MOS-HEMT using optimization algorithms and its comparison. J Semiconduc 39(7)

    Google Scholar 

  11. Amarnath G, Swain R, Lenka TR (2017) Modeling and simulation of 2DEG density and intrinsic capacitances in AlInN/GaN MOSHEMT. Int J Num Model Electronic Netw Dev Fields 31(1):e2268-1-8

    Google Scholar 

  12. Greco G, Fiorenza P, Iucolano F, Severino A, Giannazzo F, Roccaforte F (2017) Conduction mechanisms at interface of AlN/SiN dielectric stacks with AlGaN/GaN heterostructures for normally-off high electron mobility transistors: correlating device behavior with nanoscale interfaces properties. ACS Appl Mater Interfaces 9:35383

    Article  Google Scholar 

  13. Xing W, Liu Z, Ng GI, Palacios T (2016) Temperature dependent characteristics of InAlN/GaN HEMTs for mm-Wave applications. Procedia Eng 141:103

    Google Scholar 

  14. Yu K-H et al (2002) Improved temperature-dependent performances of a novel InGaP–InGaAs–GaAs double channel pseudomorphic high electron mobility transistor (DC-PHEMT). IEEE Trans Electron Dev 49(10):1687–1693

    Article  Google Scholar 

  15. Lin J, Liu H, Wang S, Liu C, Li M, Lei Wu (2019) Effect of the high-temperature off-state stresses on the degradation of AlGaN/GaN HEMTs. Electronics 8:1339

    Article  Google Scholar 

  16. Cui P, Zhang J, Jia M, Lin G, Wei L, Zhao H, Gundlach L, Zeng Y (2020) In AlN/GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer-deposited ZrO2 as gate dielectric. Jpn J Appl Phys 59:020901

    Google Scholar 

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Amarnath, G., Guduri, M., Vinod, A., Kavicharan, M. (2022). Study of Temperature Effect on MOS-HEMT Small-Signal Parameters. In: Lenka, T.R., Misra, D., Biswas, A. (eds) Micro and Nanoelectronics Devices, Circuits and Systems. Lecture Notes in Electrical Engineering, vol 781. Springer, Singapore. https://doi.org/10.1007/978-981-16-3767-4_24

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  • DOI: https://doi.org/10.1007/978-981-16-3767-4_24

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-16-3766-7

  • Online ISBN: 978-981-16-3767-4

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