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Study of Emission Pattern of ICs Using Photon Emission Microscopy

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Reliability and Risk Assessment in Engineering

Part of the book series: Lecture Notes in Mechanical Engineering ((LNME))

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Abstract

Photon emission microscopy (PEM) acts as a useful tool for defect localization in integrated circuits (ICs). It detects very low-level photon emissions generated as a result of an electroluminescence process. The emission pattern of a faulty IC can be compared to that of a healthy one to get an idea about fault location. This requires a database of emission patterns corresponding to healthy ICs. The objective of the current work is to generate a database of emission patterns of healthy ICs that can further be used to compare and study the emission patterns obtained from faulty IC. The database is generated for four ICs that include NPN transistors IC, quad 2-input NOR gate, digital-to-analog convertor and non-inverting buffer. Photon emission microscope is used to obtain the emission image which is then overlaid on the optical image to obtain a realistic image of emission patterns. The image obtained in this manner acts as the signature for comparing faulty IC with healthy one. This paper presents the emission pattern of various ICs.

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Correspondence to Arihant Jain .

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Lalwani, R., Jain, A., Tapas, V.K., Joshi, N.S., Varde, P.V. (2020). Study of Emission Pattern of ICs Using Photon Emission Microscopy. In: Gupta, V., Varde, P., Kankar, P., Joshi, N. (eds) Reliability and Risk Assessment in Engineering. Lecture Notes in Mechanical Engineering. Springer, Singapore. https://doi.org/10.1007/978-981-15-3746-2_16

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  • DOI: https://doi.org/10.1007/978-981-15-3746-2_16

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-15-3745-5

  • Online ISBN: 978-981-15-3746-2

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