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Poly(ferrocenylsilanes) with Controlled Macromolecular Architecture by Anionic Polymerization: Applications in Patterning and Lithography

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Anionic Polymerization

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Abstract

In this chapter, the versatility of poly(ferrocenylsilanes) (PFSs) as resists in reactive ion etching (RIE) for nanofabrication is presented. PFSs, belonging to the class of organometallic polymers, possess skeletal ferrocene and alkylsilane units which provide these solution-processable materials with a very high RIE resistance. First, it is shown that among the different paths for synthesizing PFS, anionic polymerization creates an opportunity to produce well-defined PFSs with a targeted molar mass and low polydispersity. Block copolymers and more complex structures can also be realized, which leads to exciting openings in maskless self-assembly lithography for nanopatterning. Then, optimization of the etching process, aimed at maximizing aspect ratios for PFS-based resists, is discussed. Next, several micro- and nanofabrication processes, using PFS homopolymers to fabricate nanoscale structures, are demonstrated. Finally, phase separation of PFS block copolymers and their use as self-assembled resists with long-range guided order in nanolithography is discussed. With this technique, various nanopatterns useful for CMOS design could be obtained.

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Acknowledgments

The authors would like to thank the Netherlands Organization for Scientific Research (NWO-CW), the Technology Foundation of the Netherlands (STW) in the NanoNed program, the University of Twente, and the MESA+ Institute for Nanotechnology of the University of Twente for financial support of this research over many years.

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Authors and Affiliations

  1. Materials Science and Technology of Polymers, MESA+ Institute for Nanotechnology, University of Twente, Enschede, 7500 AE, The Netherlands

    Lionel Dos Ramos, Mark A. Hempenius & G. Julius Vancso

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  1. Lionel Dos Ramos
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  2. Mark A. Hempenius
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  3. G. Julius Vancso
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Correspondence to G. Julius Vancso .

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Editors and Affiliations

  1. King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia

    Nikos Hadjichristidis

  2. Tokyo Institute of Technology, Tokyo, Japan

    Akira Hirao

Abbreviations

Abbreviations

3 μ-ISF:

PI-arm-PS-arm-PFS

AES:

Auger electron spectroscopy

ATRP:

Atom transfer radical polymerization

bcc:

Body-centered cubic

BCP:

Block copolymer

CMOS:

Complementary metal oxide semiconductor

fcc:

Face-centered cubic

HSQ:

Hydrogen silsesquioxane

ISF:

PI-b-PS-b-PFS

NCA:

ROP α-amino acid N-carboxyanhydride ring-opening polymerization

NIL:

Nanoimprint lithography

ODT:

Order-disorder transition

PB:

Poly(butadiene)

PDI:

Polydispersity index

PDMS:

Poly(dimethylsiloxane)

PEO:

Poly(ethylene oxide)

PES:

Poly(ethersulfone)

PFiPMS:

Poly(ferrocenylisopropylmethylsilane)

PFMPS:

Poly(ferrocenylmethylphenylsilane)

PFS:

Poly(ferrocenylsilanes)

PI:

Poly(isoprene)

PMMA:

Poly(methyl methacrylate)

PROP:

Photocontrolled living anionic ring-opening polymerization

PS:

Poly(styrene)

RIE:

Reactive ion etching

ROP:

Ring-opening polymerization

SAM:

Self-assembled monolayer

SANS:

Small-angle neutron scattering

SPPS:

Solid-phase peptide synthesis

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Dos Ramos, L., Hempenius, M.A., Vancso, G.J. (2015). Poly(ferrocenylsilanes) with Controlled Macromolecular Architecture by Anionic Polymerization: Applications in Patterning and Lithography. In: Hadjichristidis, N., Hirao, A. (eds) Anionic Polymerization. Springer, Tokyo. https://doi.org/10.1007/978-4-431-54186-8_8

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