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Plasma Channel Undulator for Narrow-Bandwidth X-Ray Generation

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X-Ray Lasers 2016 (ICXRL 2016)

Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 202))

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Abstract

A new plasma channel undulator concept based on the wakefields generated by short intense laser pulse undergoing centroid oscillations inside parabolic plasma channel is presented. The period of such an undulator is proportional to the Rayleigh length of the laser pulse and can be in the submillimeter range, while its strength can reach unity. Two-dimensional particle-in-cell simulations of the laser pulse propagation and wakefields are presented. Spontaneous radiation produced by the electron beam inside the plasma undulator is calculated.

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Author information

Authors and Affiliations

  1. Helmholtz Institute Jena, Fröbelstieg 3, 07743, Jena, Germany

    S. G. Rykovanov, J. W. Wang, V. Yu. Kharin & B. Lei

  2. Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA

    C. B. Schroeder, C. G. R. Geddes, E. Esarey & W. P. Leemans

Authors
  1. S. G. Rykovanov
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  2. J. W. Wang
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  3. V. Yu. Kharin
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  4. B. Lei
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  5. C. B. Schroeder
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  6. C. G. R. Geddes
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  7. E. Esarey
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  8. W. P. Leemans
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Corresponding author

Correspondence to S. G. Rykovanov .

Editor information

Editors and Affiliations

  1. Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology, Kyoto, Japan

    Tetsuya Kawachi

  2. Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology, Kyoto, Japan

    Sergei V. Bulanov

  3. Naraha Remote Technology Development Center, Japan Atomic Energy Agency, Fukushima, Japan

    Hiroyuki Daido

  4. Graduate School for Creation of New Photonics Industries, Shizuoka, Japan

    Yoshiaki Kato

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Rykovanov, S.G. et al. (2018). Plasma Channel Undulator for Narrow-Bandwidth X-Ray Generation. In: Kawachi, T., Bulanov, S., Daido, H., Kato, Y. (eds) X-Ray Lasers 2016. ICXRL 2016. Springer Proceedings in Physics, vol 202. Springer, Cham. https://doi.org/10.1007/978-3-319-73025-7_25

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