Material Temperature Measurement Using Non-contacting Method

Abstract

It is necessary for setting up and controlling the substrate temperature during the plasma process. The temperature of the substrate material during the process will affect the quality of equipment produced. The measurements, using laser interferometry being a non-contacting method , can been carried out to overcome the problems that exist during the material temperature measurement of substrate surface changes and plasma conditions. The result of measurement was average temperature of material. The material, used for this experiment, was LiNbO₃ with a thickness of several millimeters. Average temperature changes over a certain period of time were measured. Temperature change is measured during a plasma process using argon gas and the RF input mounted ~100 W. The temperature equilibrium is affected by the heat transfer coefficient and the input power of plasma Q. From this, it can be determined the relationship between ΔT _max and Q, and from calculations using values h = 28 W/m² °C and Q = 10 W, we obtained the value of the equilibrium temperature is 30 °C.