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Laser-Triggered Electron Source for X-Ray Applications

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Ultrashort Pulse Laser Technology

Part of the book series: Springer Series in Optical Sciences ((SSOS,volume 195))

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Abstract

We report the results of the development of an electron source , based on the emission of electrons from plasma . The plasma electron source delivers emission currents of more than 1 A, based on a laser-induced discharge plasma and grid-controlled electron emission. Circuit times of less than 1 µs and temporal modulation strongly connected to laser burst duration were measured. X-ray imaging verified high brightness and low emittance of the electron beam.

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Author information

Authors and Affiliations

  1. Fraunhofer-Institut für Lasertechnik ILT, Steinbachstraße 15, 52074, Aachen, Germany

    J. Wueppen, M. Strotkamp, D. Hoffmann & P. Russbueldt

  2. Imaging & IT Division, Components and Vacuum Technology, Siemens AG Healthcare Sector, Guenther-Scharowsky-Str, 21, 91058, Erlangen, Germany

    S. Fritzler

  3. Layertec GmbH, Ernst-Abbe-Weg, 1, 99441, Mellingen, Germany

    S. Schippel

  4. Amphos GmbH, 52074, Aachen, Germany

    T. Mans

Authors
  1. J. Wueppen
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  2. M. Strotkamp
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  3. D. Hoffmann
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  4. P. Russbueldt
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  5. T. Mans
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  6. S. Fritzler
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  7. S. Schippel
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Corresponding author

Correspondence to J. Wueppen .

Editor information

Editors and Affiliations

  1. Institute of Applied Physics, Friedrich-Schiller-University Jena, Jena, Germany

    Stefan Nolte

  2. Institute of Applied Physics, Friedrich-Schiller-University Jena, Jena, Germany

    Frank Schrempel

  3. Dausinger + Giesen GmbH, Stuttgart, Germany

    Friedrich Dausinger

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Wueppen, J. et al. (2016). Laser-Triggered Electron Source for X-Ray Applications. In: Nolte, S., Schrempel, F., Dausinger, F. (eds) Ultrashort Pulse Laser Technology. Springer Series in Optical Sciences, vol 195. Springer, Cham. https://doi.org/10.1007/978-3-319-17659-8_15

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