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Inorganic–Organic Superlattice Thin Films by Atomic/Molecular Layer Deposition

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Oxide Thin Films, Multilayers, and Nanocomposites

Abstract

The combination of atomic and molecular layer deposition enables the fabrication of layered hybrid inorganic–organic structures with a high degree of controllability over the thickness and composition of individual layers. In addition to the increased potential for obtaining novel combinations of properties from the interplay of the inorganic and organic phases, layered hybrid structures offer opportunities for nanostructuring through the creation of superlattice structures where the organic layer thicknesses have been reduced to a single molecule. Even with very low organic content, this superlattice approach can lead to significant improvements in the inorganic host material’s performance by influencing properties such as thermal conductivity or the electronic band structure.

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Acknowledgements

The present work has received funding from the European Research Council under the European Union’s Seventh Framework Programme (FP/2007-2013)/ERC Advanced Grant Agreement (No. 339478) and the Aalto Energy Efficiency Research Programme.

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Correspondence to Maarit Karppinen .

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Tynell, T., Karppinen, M. (2015). Inorganic–Organic Superlattice Thin Films by Atomic/Molecular Layer Deposition. In: Mele, P., Endo, T., Arisawa, S., Li, C., Tsuchiya, T. (eds) Oxide Thin Films, Multilayers, and Nanocomposites. Springer, Cham. https://doi.org/10.1007/978-3-319-14478-8_9

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