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Mesopore Diffusion Within Porous Silicon

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Handbook of Porous Silicon

Abstract

In applications such as sensing and drug delivery, the performance of mesoporous silicon (PSi) may be controlled by the rate of diffusive propagation of the confined molecules. The pulsed field gradient technique of nuclear magnetic resonance provides the most direct access to molecular diffusion. The different factors determining the diffusivities in PSi are the focus of this updated review. In particular, diffusivities in liquid state are shown to be most strongly affected by mesoscale disorder. Atomistic disorder is shown to control surface diffusion in applications in which PSi is brought into contact with gas phases at low vapor pressures. Correlations between the compositions of phases coexisting within the pore space, namely, liquid and gaseous, and liquid and solid ones, respectively, are briefly discussed.

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Correspondence to Jörg Kärger .

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Kärger, J., Valiullin, R. (2016). Mesopore Diffusion Within Porous Silicon. In: Canham, L. (eds) Handbook of Porous Silicon. Springer, Cham. https://doi.org/10.1007/978-3-319-04508-5_22-2

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  • DOI: https://doi.org/10.1007/978-3-319-04508-5_22-2

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-04508-5

  • Online ISBN: 978-3-319-04508-5

  • eBook Packages: Springer Reference Chemistry and Mat. ScienceReference Module Physical and Materials ScienceReference Module Chemistry, Materials and Physics

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Chapter history

  1. Latest

    Mesopore Diffusion Within Porous Silicon
    Published:
    11 April 2017

    DOI: https://doi.org/10.1007/978-3-319-04508-5_22-2

  2. Original

    Mesopore Diffusion Within Porous Silicon
    Published:
    24 May 2014

    DOI: https://doi.org/10.1007/978-3-319-04508-5_22-1