Abstract
Fabrication and rapid prototyping of nanolines for different nanoelectronics or NEMS applications using FIB is an important science and technology issue. The nanolines due to large surface energy are susceptible to liquid-like instabilities. The process of nanofabrication by FIB leads to modifications of these instabilities. These instabilities arise due to fundamental reasons and can break up nanowires/nanolines when the lateral dimension (diameter/width) typically falls below 40–50 nm. In this chapter the physics concepts that can lead to the instabilities have been discussed. The experimental observations of the instabilities in metal nanowires/nanolines produced using FIB etch on a variety of substrates have been discussed to bring out such effects as the effect of ion-beam-induced roughening, de-wetting, charging and adhesion of the films to the substrates. We show that such instabilities also occur in FIB patterned nanolines of complex oxides. The presentation done in this chapter is a review of the state of art of the activity although not all inclusive or extensive.
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Acknowledgements
The author would like to thank Dr. Kasutuv Das for some of the experimental data that are given here prior to publications and helpful discussions. The author also thanks Prof. P.D. Prewett and Mr. J. Naik, University of Birmingham, for encouraging discussion. The work was initiated as part of UKIERI project. The data in some of the figures were taken at the S.N. Bose National Centre for Basic Sciences by Dr. K. Das and Mr. J. Naik. The work was also supported by DST and sponsored by the Centre of Nanotechnology and Theme Unit of Excellence in Nanodevice Technology.
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Raychaudhuri, A.K. (2013). Instabilities in Focused Ion-Beam-Patterned Nanostructures. In: Wang, Z. (eds) FIB Nanostructures. Lecture Notes in Nanoscale Science and Technology, vol 20. Springer, Cham. https://doi.org/10.1007/978-3-319-02874-3_18
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DOI: https://doi.org/10.1007/978-3-319-02874-3_18
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