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Raman Spectroscopy, Fourier Transform Infrared Spectroscopy (FTIR) and X-Ray Photoelectron Spectroscopy (XPS)

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Analytical Methods and Instruments for Micro- and Nanomaterials

Part of the book series: Lecture Notes in Nanoscale Science and Technology ((LNNST,volume 23))

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Abstract

This chapter presents the principles and applications of Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy (XPS) techniques. These methods are other important varieties of using incident photons to study electronic and vibrational properties of materials, in addition to photoluminescence, described in Chap. 2. The discussion in this chapter covers the scientific and technical issues while several experimental examples highlight the significance and applications of each characterization technique in the fields of microelectronics engineering and material science.

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Authors and Affiliations

  1. Research and Development Center of Optoelectronic Hybrid IC, Guangdong Greater Bay Area Institute of Integrated Circuit and System, Guangzhou, 510535, China

    Henry H. Radamson

  2. Institute of Microelectronics, University of Chinese Academy of Sciences, Beijing, 100049, China

    Henry H. Radamson

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  1. Henry H. Radamson
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Correspondence to Henry H. Radamson .

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Radamson, H.H. (2023). Raman Spectroscopy, Fourier Transform Infrared Spectroscopy (FTIR) and X-Ray Photoelectron Spectroscopy (XPS). In: Analytical Methods and Instruments for Micro- and Nanomaterials. Lecture Notes in Nanoscale Science and Technology, vol 23. Springer, Cham. https://doi.org/10.1007/978-3-031-26434-4_3

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