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EUV Optics

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Tailored Light 2

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Abstract

Future applications based on extreme ultraviolet radiation in nano-patterning and surface analysis benefit from the recent progress in the development of suitable optical elements for beam shaping and imaging.

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References

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Author information

Authors and Affiliations

  1. Fraunhofer ILT, Aachen, Germany

    Klaus Bergmann & Jochen Vieker

Authors
  1. Klaus Bergmann
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  2. Jochen Vieker
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Corresponding author

Correspondence to Jochen Vieker .

Editor information

Editors and Affiliations

  1. Chair for Laser Technology RWTH Aachen University, Aachen, Germany

    Reinhart Poprawe

  2. Fraunhofer Institute for Laser Technology, RWTH Aachen University Chair for Laser Technology, Aachen, Germany

    Constantin Häfner

  3. Fraunhofer Institute for Laser Technology, Aachen, Germany

    Rolf Wester

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Bergmann, K., Vieker, J. (2024). EUV Optics. In: Poprawe, R., Häfner, C., Wester, R. (eds) Tailored Light 2. RWTHedition. Springer, Cham. https://doi.org/10.1007/978-3-030-98323-9_43

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  • DOI: https://doi.org/10.1007/978-3-030-98323-9_43

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-030-98322-2

  • Online ISBN: 978-3-030-98323-9

  • eBook Packages: EngineeringEngineering (R0)

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