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High-Performance Atomistic Modeling of Evaporation of Thin Films Under Intense Laser Irradiation

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Supercomputing (RuSCDays 2021)

Part of the book series: Communications in Computer and Information Science ((CCIS,volume 1510))

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Abstract

This paper presents the results of high-performance atomistic modeling of heating and the initial stage of evaporation of thin silicon dioxide films under the action of high-power laser radiation. Both dense isotropic films obtained by normal deposition and highly porous anisotropic silicon dioxide films obtained by deposition at a large angle to the substrate are investigated. The dependence of the initial stage of film evaporation on its structural properties is analyzed.

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Authors and Affiliations

  1. Research Computing Center, M.V. Lomonosov Moscow State University, Leninskie Gory, Moscow, 119234, Russia

    Fedor Grigoriev, Vladimir Sulimov & Alexander Tikhonravov

Authors
  1. Fedor Grigoriev
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  2. Vladimir Sulimov
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  3. Alexander Tikhonravov
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Editor information

Editors and Affiliations

  1. RCC MSU, Moscow, Russia

    Vladimir Voevodin

  2. RCC MSU, Moscow, Russia

    Sergey Sobolev

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Grigoriev, F., Sulimov, V., Tikhonravov, A. (2021). High-Performance Atomistic Modeling of Evaporation of Thin Films Under Intense Laser Irradiation. In: Voevodin, V., Sobolev, S. (eds) Supercomputing. RuSCDays 2021. Communications in Computer and Information Science, vol 1510. Springer, Cham. https://doi.org/10.1007/978-3-030-92864-3_9

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  • DOI: https://doi.org/10.1007/978-3-030-92864-3_9

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-030-92863-6

  • Online ISBN: 978-3-030-92864-3

  • eBook Packages: Computer ScienceComputer Science (R0)

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