Abstract
Silicon photonics is destined to revolutionize technological areas, such as short-distance data transfer and sensing applications by combining the benefits of integrated optics with the assertiveness of silicon-based microelectronics. However, the lack of practical and low-cost silicon-based monolithic light sources such as light-emitting diodes and, in particular, lasers remains the main bottleneck for silicon photonics to become the key technology of the twenty-first century. After briefly reviewing the state of the art regarding silicon-based light-emitters, we discuss the challenges and benefits of a highly flexible approach: The epitaxial incorporation of group-IV nanostructures into crystalline silicon. We argue that a paradigm change for group-IV quantum dots (QDs) can be achieved by the intentional incorporation of extended point defects inside the QDs upon low-energy ion implantation. The superior light-emission properties from such defect-enhanced quantum dots (DEQDs), our present understanding of their structural formation and light-emission mechanisms will be discussed. We will show that useful electrically driven devices, such as light-emitting diodes (LEDs), can be fabricated employing optically active DEQD material. These LEDs exhibit exceptional temperature stability of their light-emission properties even up to 100 °C, unprecedented for purely group-IV-based optoelectronic devices. Thereafter, we will assess the superior temperature stability of the structural properties of DEQDs upon thermal annealing, the scalability of the light-emission with the DEQD density and passivation schemes to further improve the optical properties. The chapter ends with a discussion of future research directions that will spark the development of this exciting field even further.
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References
D.J. Paul, Semicond. Sci. Technol. 19, R75 (2004)
G. Capellini, M. De Seta, F. Evangelisti, Appl. Phys. Lett. 78, 303 (2001)
G. Capellini, M. De Seta, F. Evangelisti, J. Appl. Phys. 93, 291 (2003)
J.L. Gray, S. Atha, R. Hull, J.A. Floro, Nano Lett. 4, 2447 (2004)
I. Berbezier, A. Ronda, Surf. Sci. Rep. 64, 47 (2009)
J.N. Aqua, I. Berbezier, L. Favre, T. Frisch, A. Ronda, Phys. Rep. 522, 59 (2013)
D. Grützmacher et al., Nano Lett. 7, 3150 (2007)
T. Tayagaki, S. Fukatsu, Y. Kanemitsu, Phys. Rev. B 79, 041301 (2009)
J.M. Amatya, J.A. Floro, Appl. Phys. Lett. 109, 193112 (2016)
S. Wirths et al., Nat. Photonics 9, 88 (2015)
V. Schlykow et al., Nanotechnology 29, 415702 (2018)
V. Reboud et al., Appl. Phys. Lett. 111, 092101 (2017)
W. Dou et al., Opt. Lett. 43, 4558–4561 (2018)
A.D. Lee, J. Qi, T. Mingchu, Z. Yunyan, A.J. Seeds, H. Liu, IEEE J. Sel. Top. Quantum Electron. 19, 1701510 (2013)
S. Chen et al., Nat. Photonics 10, 307 (2016)
G. Pellegrini et al., ACS Photonics 5, 3601–3607 (2018)
R.W. Millar et al., Opt. Exp. 25, 25374 (2017)
M. Brehm, M. Grydlik, Nanotechnology 28, 392001 (2017)
M. Grydlik et al., ACS Photonics 3, 298 (2016)
M. Grydlik et al., Nano Lett. 16, 6802 (2016)
P. Rauter et al., ACS Photonics 5, 431 (2018)
H. Groiss et al., Semicond. Sci. Technol. 32, 02LT01 (2017)
R.A. Soref, J. Schmidtchen, K. Petermann, IEEE J. Quantum Electron. 27, 1971 (1991)
L. Tsybeskov, D.J. Lockwood, Proc. IEEE 97, 1284 (2009)
P. Chaisakul et al., Nat. Photonics 8, 482 (2014)
B. Stern et al., Optica 2, 530 (2015)
L. Zhou, A.W. Poon, Opt. Exp. 15, 9194 (2007)
L.W. Luo et al., Nat. Commun. 5, 3069 (2014)
G.T. Reed, G. Mashanovich, F.Y. Gardes, D.J. Thomson, Nat. Photonics 4, 518 (2010)
D.C.S. Dumas et al., Opt. Exp. 22, 19284 (2014)
J. Michel, J. Liu, L.C. Kimerling, Nat. Photonics 4, 527 (2010)
L. Vivien et al., Opt. Exp. 20, 1096 (2012)
R.A. Soref, J.P. Lorenzo, Quant. Electron. 22, 873 (1986)
M.A. Green, J. Zhao, A. Wang, P.J. Reece, M. Gal, Nature 412, 805 (2001)
E.Ö. Sveinbjörnsson, J. Weber Appl. Phys. Lett. 69, 2686 (1996)
L. Ng, Nature 410, 192 (2001)
L.T. Canham, Appl. Phys. Lett. 57, 1046 (1990)
F. Priolo, T. Gregorkiewicz, M. Galli, T.F. Krauss, Nat. Nanotechn. 9, 19 (2014)
S. Takeoka, M. Fujii, S. Hayashi, Phys. Rev. B 62, 16820 (2000)
L. Pavesi, L. Dal Negro, C. Mazzoleni, G. Franzo, F. Priolo, Nature 408, 440 (2000)
J. Valenta, R. Juhasz, J. Linnros, Appl. Phys. Lett. 80, 1070 (2002)
H. Ennen et al., Appl. Phys. Lett. 46, 381 (1985)
Z. Fang, Q.Y. Chen, C.Z. Zhao, Opt. Laser Techn. 46, 103 (2013)
H. Krzyżanowska, K.S. Ni, Y. Fu, P.M. Fauchet, Mat. Sci. Eng. B 177, 1547 (2012)
A. Tengattini et al., J. Lightwave Techn. 31, 391 (2013)
Y. Takahashi et al., Nature 498, 470 (2013)
H. Rong et al., Nature 433, 292 (2005)
M.J. Süess et al., Nat. Photonics 7, 466 (2013)
J. Liu, X. Sun, R. Camacho-Aguilera, L.C. Kimerling, J. Michel, Opt. Lett. 35, 679 (2010)
F.T. Armand Pilon et al., Nat. Commun. 10, 2724 (2019)
S. Bao et al., Nat. Commun. 8, 1–7 (2017)
D. Stange et al., Optica 4, 185 (2017)
A. Elbaz et al., Nat. Photonics 14, 375–382 (2020)
E.M.T. Fadaly et al., Nature 580, 205–209 (2020)
H.I.T. Hauge et al., Nano Lett. 15, 5855–5860 (2015)
A.W. Fang et al., Opt. Exp. 14, 9203 (2006)
M. Liao et al., IEEE J. Sel. Top. Quantum Electron. 23, 1900910 (2017)
Y. Wan et al., Opt. Lett. 41, 1664 (2016)
C. Cornet, Y. Léger, C. Robert, Integrated Lasers on Silicon (ISTE Press, London, UK, 2016)
V. Kveder et al., Appl. Phys. Lett. 84, 2106 (2004)
A. Nikolskaya et al., Nucl. Instrum. Methods Phys. Res. Sect. B 472, 32–35 (2020)
D.S. Korolev et al., J. Phys. Conf. Ser. 1410, 012152 (2019)
A.A. Shklyaev, Y. Nakamura, F.N. Dultsev, M. Ichikawa, J. Appl. Phys. 105, 063513 (2009)
S.M. Buckley et al., Opt. Exp. 28, 16057–16072 (2020)
A.G. Nassiopoulos et al., Thin Solid Films 255, 329–333 (1995)
O. Bisia, S. Ossicini, L. Pavesi, Surf. Sci. Rep. 38, 1–126 (2000)
J. Valenta et al., Sci. Rep. 9, 11214 (2019)
J. Heitmann, F. Müller, M. Zacharias, U. Gösele, Adv. Mater. 17, 795–803 (2005)
A.J. Kenyon, Semicond. Sci. Technol. 20, R65–R84 (2005)
P.A. Dmitriev et al., Nanoscale 8, 9721–9726 (2016)
M. Virgilio, C.L. Manganelli, G. Grosso, T. Schroeder, G. Capellini, J. Appl. Phys. 114, 243102 (2013)
M. El Kurdi et al., Appl. Phys. Lett. 108, 091103 (2016)
X. Li, Z. Li, S. Li, L. Chrostowski, G. Xia, Semicond. Sci. Technol. 31, 065015 (2016)
C. Xu, J. Kouvetakis, J. Menéndez, J. Appl. Phys. 125, 085704 (2019)
Y. Zhou et al., ACS Photonics 6, 1434–1441 (2019)
Y. Zhou et al., Optica 7, 924–928 (2020)
H. Groiss et al., Sci. Rep. 7, 16114 (2017)
P. Zaumseil et al., APL Mater. 6, 076108 (2018)
J. Nicolas et al., Cryst. Growth Des. 20, 3493 (2020)
U. Gnutzmann, K. Clausecker, Appl. Phys. 3, 9–14 (1974)
Y. Qiu et al., Sci. Rep. 5, 12692 (2015)
D. Liang, G. Roelkens, R. Baets, J. E. Bowers Mater. 3, 1782 (2010)
K. Tanabe, K. Watanabe, Y. Arakawa, Sci. Rep. 2, 349 (2012)
E. Menard, K.J. Lee, D.-Y. Khang, R.G. Nuzzo, J.A. Rogers, Appl. Phys. Lett. 84, 5398–5400 (2004)
Z. Wang et al., Laser Photonics Rev. 11, 1700063 (2017)
J. Zhang et al., APL Photonics 4, 110803 (2020)
S. Pan et al., J. Semiconductors 40, 101302 (2019)
Q. Feng et al., Appl. Sci. 9, 385 (2019)
C. Hantschmann et al., J. Lightwave Technol. 38, 4801 (2020)
R. Chen et al., Nat. Photonics 5, 170 (2011)
G. Koblmüller, B. Mayer, T. Stettner, G. Abstreiter, J.J. Finley, Semicond. Sci. Technol. 32, 053001 (2017)
T. Stettner et al., ACS Photonics 4, 2537–2543 (2017)
J. Bissinger, D. Ruhstorfer, T. Stettner, G. Koblmüller, J.J. Finley, J. Appl. Phys. 125, 243102 (2019)
S. Conesa-Boj et al., Nano Lett. 14, 326–332 (2014)
T. Frost et al., Nano Lett. 14, 4535–4541 (2014)
Z. Wang et al., Nat. Photonics 9, 837 (2015)
J. Van Campenhout et al., Opt. Exp. 15, 6744 (2007)
Y. Shi et al., Optica 4, 1468–1473 (2017)
Y. Han et al., Optica 7, 148 (2020)
Y. Xue et al., Opt. Exp. 28, 18172 (2020)
J.R. Reboul, L. Cerutti, J.B. Rodriguez, P. Grech, E. Tournié, Appl. Phys. Lett. 99, 121113 (2011)
M.R. Calvo et al., Optica 7, 263–266 (2020)
Y. Sun et al., Light Sci. Appl. 7, 13 (2018)
J. Wang et al., Photonics Res. 7, B32–B35 (2019)
P.D. Kanungo et al., Nanotechnology 24, 225304 (2013)
M. Borg et al., Nano Lett. 14, 1914–1920 (2014)
H. Schmid et al., Appl. Phys. Lett. 106, 233101 (2015)
B.F. Mayer et al., IEEE Photonics Technol. Lett. 31, 1021–1024 (2019)
Z.I. Alferov, Rev. Mod. Phys. 73, 767 (2001)
https://www.statista.com/statistics/266973/global-semiconductor-sales-since-1988/
Y.-W. Mo, D.E. Savage, B.S. Swartzentruber, M.G. Lagally, Phys. Rev. Lett. 65, 1020 (1990)
D.J. Eaglesham, M. Cerullo, Phys. Rev. Lett. 64, 1943 (1990)
F. Hackl et al., Nanotechnology 22, 165302 (2011)
L. Vescan et al., Appl. Phys. A 71, 423 (2000)
D. Pachinger et al., Appl. Phys. Lett. 91, 23 (2007)
L. Persichetti et al., Surf. Sci. 683, 31–37 (2019)
A.V. Novikov, M.V. Shaleev, D.V. Yurasov, P.A. Yunin, Semiconductors 50, 1630 (2016)
M. Abbarchi et al., ACS Nano. 8, 11181–11190 (2014)
V. Poborchii et al., Nanotechnology 31, 195602 (2020)
G. Niu et al., Sci. Rep. 6, 22709 (2016)
N. Motta et al., Mater. Sci. Eng. B 88, 264–268 (2002)
C. Ishii, Y. Shigeta, Thin Solid Films 709, 138007 (2020)
D. Rainko et al., Sci. Rep. 8, 15557 (2018)
I.N. Stranski, L. Krastanow, Monatsh. Chem. 71, 351–364 (1937)
B. Voigtländer, Surf. Sci. Rep. 43, 127–254 (2001)
C. Teichert, Phys. Rep. 365, 335–432 (2002)
G. Costantini et al., J. Cryst. Growth 278, 38–45 (2005)
J. Zhang, M. Brehm, M. Grydlik, O.G. Schmidt, Chem. Soc. Rev. 44, 26–39 (2015)
M. Strassburg et al., Appl. Phys. Lett. 76, 685 (2000)
E. Dimakis et al., J. Appl. Phys. 97, 113520 (2005)
S.G. Corcoran, G.S. Chakarova, K. Sieradzki, Phys. Rev. Lett. 71, 1585 (1993)
S. Haq, J. Harnett, A. Hodgson, Surf. Sci. 505, 171 (2002)
G. Medeiros-Ribeiro, A.M. Bratkovski, T.I. Kamins, D.A.A. Ohlberg, R.S. Williams, Science 279, 353 (1998)
E. Sutter, P. Sutter, J.E. Bernard, Appl. Phys. Lett. 84, 2262 (2004)
M. Brehm, H. Lichtenberger, T. Fromherz, G. Springholz, Nanoscale Res. Lett. 6, 70 (2011)
A. Vailionis et al., Phys. Rev. Lett. 85, 3672 (2000)
A. Rastelli, H. von Känel, Surf. Sci. 532–535, 769–773 (2003)
M. Brehm et al., Phys. Rev. B 80, 205321 (2009)
M.R. McKay, J.A. Venables, J. Drucker, Phys. Rev. Lett. 101, 216104 (2008)
M. Brehm et al., J. Appl. Phys. 109, 123505 (2011)
T.U. Schülli et al., Phys. Rev. Lett. 90, 066105 (2003)
A. Rastelli et al., Nano Lett. 8, 1404 (2008)
M. Brehm et al., Nanoscale Res. Lett. 5, 1868 (2010)
F. Hackl et al., Ann. Phys. 531, 1800259 (2019)
C. Georgiou, T. Leontiou, P.C. Kelires, AIP Adv. 4, 077135 (2014)
P. Klenovský et al., Phys. Rev. B 86, 115305 (2012)
G. Capellini, M. De Seta, L. Di Gaspare, F. Evangelisti, F. d’Acapito, J. Appl. Phys. 98, 124901 (2005)
A. Rastelli, E. Müller, H. von Känel, Appl. Phys. Lett. 80, 1438 (2002)
O.G. Schmidt, U. Denker, K. Eberl, O. Kienzle, F. Ernst, Appl. Phys. Lett. 77, 2509 (2000)
M. Brehm et al., Nanotechnology 26, 225202 (2015)
A. Rastelli, M. Kummer, H. von Känel, Phys. Rev. Lett. 87, 256101 (2001)
F. Montalenti et al., Phys. Rev. Lett. 93, 216102 (2004)
J. Stangl, V. Holý, G. Bauer, Rev. Mod. Phys. 76, 725 (2004)
A.F. Zinovieva et al., Sci. Rep. 10, 9308 (2020)
O.G. Schmidt, K. Eberl, Y. Rau, Phys. Rev. B 62, 16715 (2000)
J.M. Baribeau, N.L. Rowell, D.J. Lockwood, Nanoscale Materials (Springer, New York, 2006), pp. 1–52
M. Brehm et al., New J. Phys. 11, 063021 (2009)
R.O. Rezaev, S. Kiravittaya, V.M. Fomin, A. Rastelli, O.G. Schmidt, Phys. Rev. B 82, 153306 (2010)
M. Grydlik, G. Langer, T. Fromherz, F. Schäffler, M. Brehm, Nanotechnology 24, 105601 (2013)
A.V. Dvurechenskii et al., Phys. Stat. Sol. C 14, 1700187 (2017)
M. Grydlik et al., Phys. Rev. B 88, 115311 (2013)
J. Xia, Y. Ikegami, Y. Shiraki, N. Usami, Y. Nakata, Appl. Phys. Lett. 89, 201102 (2006)
X. Xu et al., IEEE J. Sel. Top. Quantum Electron. 18, 1830 (2012)
N. Hauke et al., New J. Phys. 14, 083035 (2012)
T. Tsuboi et al., Appl. Phys. Exp. 5, 052101 (2012)
J.S. Xia, Y. Takeda, N. Usami, T. Maruizumi, Y. Shiraki, Opt. Exp. 18, 13945 (2010)
M. Schatzl et al., ACS Phot. 4, 665 (2017)
A. Simbula et al., APL Photonics 2, 056102 (2017)
A.I. Yakimov, V.V. Kirienko, A.V. Dvurechenskii, Opt. Mat. Exp. 8, 3479 (2018)
V. Schlykow et al., Nanotechnology 31, 345203 (2020)
T.I. Kamins, R.S. Williams, Appl. Phys. Lett. 71, 1201 (1997)
P.D. Szkutnik, A. Sgarlata, S. Nufris, N. Motta, A. Balzarotti, Phys. Rev. B 69, 201309 (2004)
J.K. Murphy et al., J. Vac. Sci. Technol. B 29, 011029 (2011)
A. Karmous et al., Appl. Phys. Lett. 85, 6401–6403 (2004)
Y.J. Ma et al., J. Phys. D Appl. Phys. 47, 485303 (2014)
J.J. Zhang et al., Phys. Rev. Lett. 105, 166102 (2010)
F. Pezzoli, M. Stoffel, T. Merdzhanova, A. Rastelli, O.G. Schmidt, Nanoscale Res. Lett. 4, 1073 (2009)
M. Grydlik et al., Appl. Phys. Lett. 106, 251904 (2015)
J. Ziegler, M. Ziegler, J. Biersack, Nucl. Instrum. Methods Phys. Res. Sect. B 268, 1818 (2010)
G. Davies, Phys. Rep. 176, 83–188 (1989)
L. Ouyang et al., Opt. Exp. 26, 15899 (2018)
A. Shakoor et al., Physica B 407, 4027–4031 (2012)
S. Facsko et al., Science 285, 1551–1553 (1999)
T. Bobek et al., Phys. Rev. B 68, 085324 (2003)
K.J. Kirkby, R.P. Webb, Encyclopedia of Nanoscience and Nanotechnology, edited by H.S. Nalwa, vol. 4. (American Scientific, Valecia, USA, 2004), pp. 283–291
N. Chekurov, K. Grigoras, A. Peltonen, S. Franssila, I. Tittonen, Nanotechnology 20, 065307 (2009)
L. Spindlberger, S. Prucnal, J. Aberl, M. Brehm, Physica Status Solidi (a) 216, 1900307 (2019)
L. Spindlberger et al., Crystals 10, 351 (2020)
R.S. Averback, T.D. de la Rubia, Solid State Phys. 51, 281–402 (1997)
G. Carter, W.A. Grant, Ion Implantation of Semiconductors. (London Edward Arnold Ltd. 1976), pp. 1976 1−214
J.S. Williams, Nucl. Instrum. Methods Phys. Res. 209, 219–228 (1983)
P.E. Blöchl et al., Phys. Rev. Lett. 70, 2435 (1993)
A.J.R. da Silva, A. Janotti, A. Fazzio, R.J. Baierle, R. Mota, Phys. Rev. B 62, 9903 (2000)
M. Dionízio Moreira, R.H. Miwa, P. Venezuela, Phys. Rev. B 70, 115215 (2004)
P. Giannozzi et al., J. Phys. Condens. Matter 21, 395502 (2009)
F. Murphy-Armando et al., Phys. Rev. B 103, 085310 (2021)
E.-K. Lee et al., Phys. Rev. B 80, 049904 (2009)
B. Julsgaard, P. Balling, J.L. Hansen, A. Svane, A.N. Larsen, Nanotechnology 22, 435401 (2011)
E.C. Le Ru, J. Fack, R. Murray, Phys. Rev. B 67, 245318 (2003)
M.W. Dashiell, U. Denker, O.G. Schmidt, Appl. Phys. Lett. 79, 2261 (2001)
T. Brunhes et al., Appl. Phys. Lett. 77, 1822 (2000)
D.N. Lobanov et al., Semiconductors 46, 1418–1422 (2012)
H. Takeuchi, A. Wung, X. Sun, R.T. Howe, T.-J. King, IEEE Trans. Electron. Dev. 52, 2081–2086 (2005)
H. Xiao, Introduction to Semiconductor Manufacturing Technology (Prentice-Hall, Upper Saddle River, NJ, USA, 2001)
E. Cartier, J.H. Stathis, D.A. Buchanan, Appl. Phys. Lett. 63, 1510 (1993)
S. Wang et al., Sol. Energ. Mater. Sol. Cells 193, 403–410 (2019)
S. Fujimori, R. Nagai, M. Ikeda, K. Makihara, S. Miyazaki, Jpn. J. Appl. Phys. 58, SIIA01 (2019)
G. Davies, Phys. Rep. 176, 83–188 (1989)
B. Hallam et al., Phys. Status Solidi A 214, 1700305 (2017)
Acknowledgements
I would like to use this opportunity to gratefully thank the main mentors in my scientific career, Günther Bauer, Friedrich Schäffler, Thomas Fromherz and Armando Rastelli. This work was funded by the Austrian Science Fund (FWF): Y1238-N36, P29137-N36. Funding was also provided by the EU H2020 QuantERA ERA-NET via the Quantum Technologies project CUSPIDOR, which is co-funded by FWF(I3760) and the Linz Institute of Technology (LIT): LIT-2019-7-SEE-114.
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Brehm, M. (2021). Light-Emission from Ion-Implanted Group-IV Nanostructures. In: Lockwood, D.J., Pavesi, L. (eds) Silicon Photonics IV. Topics in Applied Physics, vol 139. Springer, Cham. https://doi.org/10.1007/978-3-030-68222-4_2
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