Abstract
Mining deviances from expected behaviors in process logs is a relevant problem in modern organizations, owing to their negative impact in terms of monetary/reputation losses. Most proposals to deviance mining combine the extraction of behavioral features from log traces with the induction of standard classifiers. Difficulties in capturing the multi-faceted nature of deviances with a single pattern family led to explore the possibility to mix up heterogeneous data views, obtained each with a different pattern family. Unfortunately, combining many pattern families tends to produce sparse and redundant representations that likely lead to the discovery of poor deviance-oriented classifiers. Using a multi-view ensemble learning approach to combine alternative trace representations was recently proven effective for this induction task. On the other hand, Deep Learning methods have been gaining momentum in prediction/classification tasks on process log data, owing to their flexibility and expressiveness. We here propose a novel multi-view ensemble-based framework for the discovery of deviance-oriented classifiers that profitably combines different single-view deep classifiers, sharing an ad hoc residual-like architecture (simulating fine-grain ensemble-like capabilities over each single data view). The approach, tested over real-life process log data, significantly improves previous solutions.
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Notes
- 1.
Despite such patters can explain more effectively deviances of processes with a high degree of parallelism, it was shown in [12] that they do not improve significantly the accuracy of deviance predictions, which is the main objective of our work. Thus, we here only focus on classical sequential patterns, for the sake of comparison with previous deviance-mining work.
- 2.
Notice that \(y^{(i)}=1\) iff the i-th instance in the training set is deviant, and \(y^{(i)}=0\) otherwise.
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Folino, F., Folino, G., Guarascio, M., Pontieri, L. (2020). A Multi-view Ensemble of Deep Models for the Detection of Deviant Process Instances. In: Koprinska, I., et al. ECML PKDD 2020 Workshops. ECML PKDD 2020. Communications in Computer and Information Science, vol 1323. Springer, Cham. https://doi.org/10.1007/978-3-030-65965-3_16
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