Abstract
Recently substantial enhancement of high ion charge states was clearly observed in both the HCEI and ITEP E-MEVVA ion sources. These experimental setups have two different methods of measuring the ion charge state distributions. The results can be considered as a proof of the E-MEVVA principle. These results sparked discussions regarding which physics effects are dominant. Basic physics seems straightforward, an ion charge state in E-MEVVA is determined by the number of collisions with fast electrons versus the number of encounters with neutrals and lower charge state ions during an ion dwell time in the drift channel. However, the fluxes of fast electrons, lower charge state ions, and neutrals encountered by an ion may be a consequence of numerous effects. Factors determining neutral fluxes might be poor vacuum conditions, desorption of adsorbed gas by the electron beam directly or indirectly due to stacking (E-beam reflection) and/or instabilities that cause heating and desorption. Flux and energy of the fast electrons is primarily determined by the electron gun output. But significant contributions from electron beam stacking, instabilities, as well as plasma electron heating, are possible. The various contributions are evaluated to account for past results and to guide future progress.
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References
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W. Lötz, Z. Physik 216, 241 (1968); and, 220, 466 (1969).
H. D. Betz and A.B. Wittkower, Phys. Rev. A 6, 1485 (1972).
A. Hershcovitch, Rev. Sci. Instrum. 65, 1075 (1994).
S. Martin, A. Devis, Y. Querdane, A. Salmoun, A. El Motassadeq, J. Desequelles, M. Druetta, D. Church, and T. Lang, Phys. Rev. Lett. 64, 2633 (1990).
Vacuum Arcs Science and Technology, R.L. Boxman, P.J. Martin, and D.M. Sanders, Editors, Noys, New York (1995).
I. Brown, H. Shiraishi, IEEE Transactions of Plasma Science 18, 170 (1990).
C. Stöckl, H. Wetzler, W. Seelig, J. Jacoby, P. Spiller, and D. Hoffmann, GSI Sci. Report 1994 941, 169 (March 1995).
Burgess and Chidichimo, Mon. Not. R. Astr. Soc. 203, 1269 (1983).
McGuire and Richard, Phys. Rev. A 3, 1374 (1973).
A. Hershcovitch, B. Johnson, F. Patton, N. Rostoker, A. VanDrie, and F. Wessel, Electron Beams and Z-Pinches As Plasma Strippers and Lenses for Low Energy Heavy Ions, BNL Internal Report: AGS/AD/Technical Note No. 484 (1999).
A. Hershcovitch, B. Johnson, F. Patton, N. Rostoker, A. VanDrie, and F. Wessel, Rev. Sci. Instrum. 73, 744 (2002).
A. Anders private communication 2001.
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Hershcovitch, A. et al. (2002). Underlying Physics of E-MEVVA Operation. In: Oks, E., Brown, I. (eds) Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. NATO Science Series, vol 88. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0277-6_5
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DOI: https://doi.org/10.1007/978-94-010-0277-6_5
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