1. Forthcoming papers

   Legacy Pages: A5 - A5

2. Editorial

   • Wolfhard Möller

   Plasma-Enhanced Chemical Vapor Deposition Pages: 469 - 469

3. Multivariate analysis of PECVD data

   • V. Dose

   Plasma-Enhanced Chemical Vapor Deposition Pages: 471 - 477

4. In-situ diagnostics for plasma surface processing

   • G. M. W. Kroesen
   • F. J. de Hoog

   Plasma-Enhanced Chemical Vapor Deposition Pages: 479 - 492

5. Plasma deposition of hydrogenated amorphous silicon: Studies of the growth surface

   • J. R. Abelson

   Plasma-Enhanced Chemical Vapor Deposition Pages: 493 - 512

6. Chemical vapor deposition of diamond

   • C.-P. Klages

   Plasma-Enhanced Chemical Vapor Deposition Pages: 513 - 526

7. Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas

   • W. Möller

   Plasma-Enhanced Chemical Vapor Deposition Pages: 527 - 546

8. Electrical characterization of defects introduced in n-GaAs by alpha and beta irradiation from radionuclides

   • F. D. Auret
   • S. A. Goodman
   • W. E. Meyer

   Solids And Materials Pages: 547 - 553

9. Radiation-enhanced diffusion in ion-implanted glass

   • D.-E. Arafah
   • Y. Al-Ramadin

   Solids And Materials Pages: 555 - 559

10. Monte-Carlo study of reactive ion-beam assisted film growth

    • X. Wang
    • Y. Chen
    • S. Zou

    Surfaces And Multilayers Pages: 561 - 565

11. Auger recombination with traps in quantum-well semiconductors

    • A. Haug

    Surfaces And Multilayers Pages: 567 - 569

12. Raman spectroscopy of macroscopic defects of GaAs grown by molecular beam epitaxy

    • H. S. Jang
    • H. Y. Cho
    • J. Yang

    Surfaces And Multilayers Pages: 571 - 574

13. Computer simulation of the small-signal admittance and negative resistance of double avalanche region IMPATT diodes

    • J. P. Banerjee
    • S. K. Roy

    Surfaces And Multilayers Pages: 575 - 580