1. Waveguide nanoelectronics

   • A. A. Gorbatsevich
   • V. V. Kapaev

   Nanoelectronics Pages: 1 - 13

2. New method for the Langmuir probe diagnostics of polymerizing plasmas

   • K. V. Rudenko
   • A. V. Myakon’kikh
   • A. N. Pustovit

   Plasma Diagnostics Pages: 14 - 26

3. Nitrogen concentration in ZnO films grown by magnetron sputtering in an Ar-NO plasma

   • O. V. Kononenko
   • Y. S. Noh
   • W. K. Choi

   Process Technologies Pages: 27 - 32

4. Dopant diffusion dynamics and optimal diffusion time as influenced by diffusion-coefficient nonuniformity

   • E. L. Pankratov

   Process Technologies Pages: 33 - 39

5. Enhancing the dry-etch durability of photoresist masks: A review of the main approaches

   • S. V. Zelentsov
   • N. V. Zelentsova
   • I. A. Mashtakov

   Process Technologies Pages: 40 - 48

6. Void transformation and dopant distribution in porous silicon

   • A. A. Kovalevskii
   • A. V. Dolbik
   • M. V. Tarasikov

   Process Technologies Pages: 49 - 52

7. Radiation-enhanced thermal oxidation of silicon

   • A. B. Simakov
   • A. Yu. Bashin

   Process Technologies Pages: 53 - 55

8. Linear and nonlinear modeling of switched-capacitor ΔΣ modulators

   • A. S. Korotkov
   • M. V. Telenkov

   Circuit Analysis and Synthesis Pages: 56 - 66