Plasma Chemistry and Plasma Processing

ISSN: 0272-4324 (Print) 1572-8986 (Online)

Description

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.

33 Volumes 149 Issues 1,272 Articles available from 1981 - 2013

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Incorporating Plasmas and Polymers (as of 2004)

Latest Articles

  1. No Access

    Original Paper

    Tungsten Carbide and Vanadium Carbide Nanopowders Synthesis in DC Plasma Reactor

    A. V. Samokhin, N. V. Alekseev, S. A. Kornev… (June 2013)

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  2. No Access

    Original Paper

    Ammonia Decomposition Using Electron Beam

    Youn-Suk Son, Ki-Hyung Kim, Ki-Joon Kim… (June 2013)

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  3. No Access

    Original Paper

    Argon Versus Helium Dielectric Barrier Discharge for Surface Modification of Polypropylene and Poly(methyl methacrylate) Films

    A. Chiper, G. Borcia (June 2013)

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