Skip to main content
SpringerLink
Log in

Investigation of the SiC thin films synthetized by Thermionic Vacuum Arc method (TVA)

  • Regular Article
  • Published:
The European Physical Journal D Aims and scope Submit manuscript

Abstract

Thermionic Vacuum Arc method (TVA) was used for the first time to prepare SiC thin films. This method is very suitable for deposition of high purity thin films with compact structure and extremely smooth in vacuum conditions. The nanocomposites were investigated using Transmission Electron Microscopy (TEM) analyses provided with HR-TEM and SAED facilities. The structure of the films can be indexed as following three forms: cubic structure of SiC (F4-3m) a = 0.4348 nm, cubic Si (Fd3m) a = 0.54307 nm and graphite (P63/mmc) a = 0.2456 nm; c = 0.6696 nm. The morphology, topography, wettability and wear properties were also performed by SEE system and by Raman Spectroscopy, increasing the interest for emerging applications.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. D.M. Brown, J.B. Fedison, J.R. Hibshman, J.W. Kretchmer, L. Lombardo, K.S. Matocha, P.M. Sandvik, IEEE Sens. J. 5, 983 (2005)

    Article  Google Scholar 

  2. X. Guo, A.L. Beck, Z. Huang, N. Duan, J.C. Campbell, D. Emerson, J.J. Sumakeris, IEEE Trans. Electron Devices 53, 2259 (2006)

    Article  ADS  Google Scholar 

  3. S. Nakagomi, A.L. Spetz, I. Lundström, P. Tobias, IEEE Sens. J. 2, 379 (2002)

    Article  Google Scholar 

  4. P.M. Sarro, Sens. Actuat. A82, 210 (2000)

  5. M. Mehregany, C.A. Zorman, Thin Solid Films 355, 518 (1999)

    Article  ADS  Google Scholar 

  6. W.M. Zhou, F. Fang, Z.Y. Hou, L.J. Yan, Y.F. Zhang, IEEE Electron Devices Lett. 27, 463 (2006)

    Article  ADS  Google Scholar 

  7. M. Mahmoodi, L. Ghazanfari, Properties and Applications of Silicon Carbide, edited by R. Gerhardt (InTech, 2011)

  8. C.S. Roper, V. Radmilovic, R.T. Howe, R. Maboudian, J. Electrochem. Soc. 153, C562 (2006)

    Article  Google Scholar 

  9. C.H. Hsu, Y.F. Huang, L.C. Chen, S. Chattopadhyay, K.H. Chen, H.C. Lo, C.F. Chen, J. Vac. Sci. Technol. B 24, 308 (2006)

    Article  Google Scholar 

  10. R. Vladoiu, A. Mandes, V. Dinca, M. Contulov, V. Ciupina, C.P. Lungu, G. Musa, New Industrial Plasma Technology (Wiley-VCH, 2009), pp. 357−365

  11. R. Vladoiu, V. Ciupina, A. Mandes, V. Dinca, M. Prodan, G. Musa, J. Appl. Phys. 108, 093301 (2010)

    Article  ADS  Google Scholar 

  12. R. Vladoiu, V. Ciupina, M. Contulov, A. Mandes, V. Dinca, G. Prodan, C.P. Lungu, J. Optoelectron. Adv. Mater. 12, 553 (2010)

    Google Scholar 

  13. V. Ciupina, R. Vladoiu, A. Mandes, G. Musa, C.P. Lungu, J. Optoelectron. Adv. Mater. 10, 2958 (2008)

    Google Scholar 

  14. V. Bursikova, P. St’ahel, Z. Navratil, J. Bursik, J. Janca, Surface energy evaluation of plasma treated materials by contact angle measurement, 1st edn. (Masaryk University Press, Brno, 2004)

  15. S. Nakashima, H. Harima, Phys. Stat. Sol. 162, 39 (1997)

    Article  ADS  Google Scholar 

  16. S. Wu, Polymer Interface and Adhesion (CRC Press, Boca Raton, 1982), Chap. 2

  17. R. Vladoiu, V. Dinca, G. Musa, Eur. Phys. J. D 54, 433 (2009)

    Article  ADS  Google Scholar 

  18. N. Nurdin, P. François, Y. Mugnier, J. Krumeich, M. Moret, B.O. Aronsson, P. Descouts, Eur. Cell. Mater. 5, 17 (2003)

    Google Scholar 

  19. V.S. Teodorescu, M.G. Blanchin, Microsc. Microanal. 15, 15 (2009)

    Article  ADS  Google Scholar 

  20. R.W.G. Wyckoff, Crystal Structures, 2nd edn. (Wiley-Interscience, New York, 1963)

Download references

Author information

Authors and Affiliations

  1. Department of Physics, Ovidius University, 900527, Constanta, Romania

    V. Ciupina, R. Vladoiu, V. Dinca, M. Contulov, A. Mandes, P. Popov & G. Prodan

  2. National Institute for Lasers, Plasma and Radiation Physics, P.O. Box MG-36, 077125, Bucharest, Romania

    C. P. Lungu

Authors
  1. V. Ciupina
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. R. Vladoiu
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. C. P. Lungu
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. V. Dinca
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. M. Contulov
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. A. Mandes
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. P. Popov
    View author publications

    You can also search for this author in PubMed Google Scholar

  8. G. Prodan
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to R. Vladoiu.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Ciupina, V., Vladoiu, R., Lungu, C.P. et al. Investigation of the SiC thin films synthetized by Thermionic Vacuum Arc method (TVA). Eur. Phys. J. D 66, 99 (2012). https://doi.org/10.1140/epjd/e2012-20470-5

Download citation

  • Received:

  • Revised:

  • Published:

  • DOI: https://doi.org/10.1140/epjd/e2012-20470-5

Keywords

Search

Navigation