Abstract.
The hydroxyl radical (OH) plays an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The present work reports the determination of the hydroxyl radicals in atmospheric dielectric barrier discharge plasmas via near infrared continuous wave cavity ring-down spectroscopy. The P-branches of OH X2Πi (ν' = 2 ←ν′′ = 0) bands were used for its number density measurements. The minimum measurable absorption coefficient is about 3 × 10-8 cm-1 in DBD plasmas. At certain experimental conditions (a.c. frequency of 70 kHz, 6700 ppm H2O in He, 1 atm), when the peak-to-peak discharge voltage varied from 6 kV to 10.4 kV, the determined OH radical concentration increased from (2.1 ± 0.1) × 1013 molecules cm-3 to (3.7 ± 0.1) × 1013 molecules cm-3. The plasma gas temperature, derived from the Boltzmann plots of OH rotational population distributions, ranged from 312 ± 10 K to 363 ± 10 K when the discharge voltage was raised in the above range. The influences of O2 and N2 addition on the production of OH radicals have been also investigated.
Similar content being viewed by others
References
L. Newman, in Measurement challenges in atmospheric chemistry (American Chemical Society, Washington, DC, 1993)
T. Aizawa, Appl. Opt. 40, 4894 (2001)
G. Meijer, M.G.H. Boogaarts, R.T. Jongma, D.H. Parker, Chem. Phys. Lett. 217, 112 (1994)
X. Mercier, E. Therssen, J.F. Pauwels, P. Desgroux, Chem. Phys. Lett. 299, 75 (1999)
C.O. Laux, T.G. Spence, C.H. Kruger, R.N. Zare, Plasma Sources Sci. Technol. 12, 125 (2003)
Z.Z. Su, K. Ito, K. Takashima, S. Katsuta, K. Onda, A. Mizuno, J. Phys. D: Appl. Phys. 35, 3192 (2002)
M. Sun, Y. Wu, J. Li, N.H. Wang, J. Wu, K.F. Shang, J.L. Zhang, Plasma Chem. Plasma Proc. 25, 31 (2005)
Z. Falkenstein, J. Appl. Phys. 81, 7158 (1997)
A. Ershov, J. Borysow, J. Phys. D: Appl. Phys. 28, 68 (1995)
R. Sankaranarayanan, B. Pashaie, S.K. Dhali, Appl. Phys. Lett. 77, 2970 (2000)
D.K. Killinger, C.C. Wang, Chem. Phys. Lett. 52, 374 (1977)
G.H. Mount, F.L. Eisele, Science 256, 1187 (1992)
D.M. Bakalyar, J.V. James, C.C. Wang, Appl. Opt. 21, 2901 (1982)
A.O. Keefe, D.A.G. Deacon, Rev. Sci. Instrum. 59, 2544 (1988)
D. Romanini, A.A. Kachanov, N. Sadeghi, Chem. Phys. Lett. 264, 316 (1997)
V.A. Lozovsky, I. Derzy, S. Cheskis, Chem. Phys. Lett. 287, 407 (1998)
S. Cheskis, I. Derzy, V.A. Lozovsky, A. Kachanov, D. Romanini, Appl. Phys. B 66, 377 (1998)
M.C. Beek, J.J. Meulen, Chem. Phys. Lett. 337, 237 (2001)
C. Wang, F.J. Mazzotti, S.P. Koirala, C.B. Winstead, G.P. Miller, Appl. Spectrosc. 58, 734 (2004)
J.J. Scherer, D. Voelkel, D.J. Rakestraw, Appl. Phys. B 64, 699 (1997)
R. Peeters, G. Berden, G. Meijer, Appl. Phys. B 73, 65 (2001)
A. Khacef, J.M. Cormier, J.M. Pouvesle, J. Phys. D: Appl. Phys. 35, 1491 (2002)
D.G. Storch, M.J. Kushner, J. Appl. Phys. 73, 51 (1993)
M.K. Boudam, M. Moisan, B. Saoudi, C. Popovici, N. Gherardi, F. Massines, J. Phys. D: Appl. Phys. 39, 3494 (2006)
R. Dorai, M.J. Kushner, J. Phys. D: Appl. Phys. 36, 666 (2003)
M.B. Chang, S.C. Yang, AICHE J. 47, 1226 (2001)
T. Akitsu, H. Ohkawa, M. Tsuji, H. Kimura, M. Kogoma, Surf. Coat. Technol. 193, 29 (2005)
S.H. Wu, P. Dupré, T.A. Miller, Phys. Chem. Chem. Phys. 8, 1682 (2006)
http://www.hitran.com
L.S. Rothman, C.P. Rinsland, A. Goldman, S.T. Massie, D.P. Edwards, J.M. Flaud, A. Perrin, C. Camy-Peyret, V. Dana, J.Y. Mandin, J. Schroeder, A. Mccann, R.R. Gamache, R.B. Wattson, K. Yoshino, K.V. Chance, K.W. Jucks, L.R. Brown, V. Nemtchinov, P. Varanasi, J. Quant. Spetr. Rad. Trans. 60, 665 (1996)
S.S. Brown, H. Stark, A.R. Ravishankara, Appl. Phys. B 75, 173 (2002)
J.M. Brown, J.T. Hougen, K.P. Huber, J.W.C. Johns, I. Kopp, H. Lefebvre-Brion, A.J. Merer, D.A. Ramsay, J. Rastas, R.N. Zare, J. Mol. Spectrosc. 55, 500 (1975)
K.H. Becher, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, in Non-Equilibrium Air Plasmas at Atmospheric Pressure (Institute of Physics Publishing, Dirac House, Temple Back, Bristol, 2005)
O. Motret, C. Hibert, S. Pellerin, J.M. Pouvesle, J. Phys. D: Appl. Phys. 33, 1493 (2000)
T. Gerber, W. Lüthy, J. Chem. Phys. 79, 5445 (1983)
C. Hibert, I. Gaurand, O. Motret, J.M. Pouvesle, J. Appl. Phys. 85, 7070 (1999)
J.D. Gorfinkiel, L.A. Morgan, J. Tennyson, J. Phys. B: At. Mol. Opt. Phys. 35, 543 (2002)
T. Harb, W. Kedzierski, J.W. McConkey, J. Chem. Phys. 115, 5507 (2001)
Y. Itikawa, N. Masson, J. Phys. Chem. Ref. Data 34, 1 (2005)
K. Behringer, U. Fantz, J. Phys. D: Appl. Phys. 27, 2128 (1994)
A. Bultel, C. Letellier, A. Bourdon, Phys. Lett. 323, 267 (2004)
O. Eichwald, M.A. Yousfi, M.D. Benabdessadok, J. Appl. Phys. 82, 4781 (1997)
R. Atkinson1, D.L. Baulch, R.A. Cox, J.N. Crowley, R.F. Hampson, R.G. Hynes, M.E. Jenkin, M.J. Rossi, J. Troe, Atmos. Chem. Phys. 4, 1461 (2004)
J.T. Herron, J. Phys. Chem. Ref. Data 28, 1453 (1999)
W.R. Binns, J.L. Ahl, J. Chem. Phys. 68, 538 (1978)
C.B. Collins, F.W. Lee, J. Chem. Phys. 70, 1275 (1979)
N.K. Bibinov, A.A. Fateev, K. Wiesemann, J. Phys. D: Appl. Phys. 34, 1819 (2001)
K.R. German, J. Chem. Phys. 62, 2584 (1975)
A.E. Bailey, D.E. Heard, D.A. Henderson, P.H. Paul, Chem. Phys. Lett. 302, 132 (1999)
A.E. Bailey, D.E. Heard, P.H. Paul, M.J. Philling, J. Chem. Soc. Faraday Trans. 93, 2915 (1997)
K.H. Becher, D. Haaks, Z. Naturforsch. A 28, 249 (1973)
B.M. Penetrante, M.C. Hsiao, B.T. Merritt, G.E. Vogtlin, P.H. Wallman, Appl. Phys. Lett. 68, 3719 (1996)
N.K. Bibinov, A.A. Fateev, K. Wiesemann, Plasma Sources Sci. 10, 579 (2001)
A.S. Chiper, V. Anita, C. Agheorghiesei, V. Pohoata, M. Anita, G. Popa, Plasma Process. Polym. 1, 57 (2004)
V. Poenariu, M.R. Wertheimer, R. Bartnikas, Plasma Process. Polym. 3, 17 (2006)
J.M. Pouvesle , A. Bouchoule, J. Stevefelt, J. Chem. Phys. 77, 817 (1982)
G.H. Dieke, H.M. Crosswhite, J. Quant. Spectr. Rad. Trans. 2, 97 (1962)
J. Loureiro, C.M. Ferreira, J. Phys. D: Appl. Phys. 19, 17 (1986)
V. Guerra, P.A. Sa, J.L. Loureiro, J. Phys. D: Appl. Phys. 34, 1745 (2001)
E. Stoffels, W.W. Stoffels, K. Tachibana, Rev. Sci. Instrum. 69, 116 (1998)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Liu, Z., Yang, X., Zhu, A. et al. Determination of the OH radical in atmospheric pressure dielectric barrier discharge plasmas using near infrared cavity ring-down spectroscopy. Eur. Phys. J. D 48, 365–373 (2008). https://doi.org/10.1140/epjd/e2008-00110-7
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1140/epjd/e2008-00110-7