Abstract
Pentacene thin films with thicknesses ranging from 10 nm to 180 nm are investigated by specular X-ray diffraction in the reflectivity regime and in the wide angular regime. The results of the reflectivity measurements show a clear shift of the 001 reflection of the thin film phase depending on the layer thickness. It is shown that this shift can be explained by the dynamical scattering theory. The wide angular regime measurements show the 00L of the thin film phase. Williams-Hall plots are used to extract information on the crystallite size and mean micro strain of the thin film phase. The crystallite size is in good agreement with the results obtained by the reflectivity measurements. From this it can be concluded that the thin film phase crystallites are extended over the entire film thickness down to the substrate. Additionally an increase of the micro strain with increasing film thickness is observed.
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References
C.C. Mattheus, A.B. Dros, J. Baas, G.T. Oostergetel, A. Meetsma, J.L. de Boer, T.M.T. Palstra, Synth. Metals 138, 475 (2003)
T. Minakata, I. Nagoya, M. Ozaki, J. Appl. Phys. 69, 7354 (1991)
T. Minakata, M. Ozaki, H. Imai, J. Appl. Phys. 74, 1079 (1993)
R.B. Cambell, R.B. Monteath-Robertson, J. Trotter, Acta Cryst. 14, 705 (1961)
D. Holmes, S. Kumaraswamy, A.J. Matzger, K.P.C. Vollhardt, Chem. Eur. J. 5, 3399 (1999)
T. Siegriest, C. Kloc, J.H. Schön, B. Batlogg, R.C. Haddon, S. Berg, G.A. Thomas, Angew. Chem. 40, 1732 (2001)
T. Kakudate, N. Yoshimoto, Y. Saito, J. Appl. Phys. Lett. 90, 081903 (2007)
R. Ruiz, A.C. Mayer, G.G. Malliaras, B. Nickel, G. Scoles, A. Kazimirov, H. Kim, R.L. Headrick, Z. Islam, J. Appl. Phys. Lett. 85, 4926 (2004)
H. Yoshida, N. Sato, J. Appl. Phys. Lett. 89, 101919 (2006)
D.J. Gundlach, T.N. Jackson, D.G. Schlom, S.F. Nelson, J. Appl. Phys. Lett. 74, 3302 (1999)
H. Kiessig, Annalen der Physik 10, 769 (1931)
F. Rieutord, J.J. Benattar, L. Basio, P. Robin, C. Blot, R. de Kouchkovsky, J. Phys. 48, 679 (1987)
B. Cull, Y. Shi, S. Kumar, R. Shih, J. Mann, Phys. Rev. E 51, 526 (1995)
E.E. Fullerton, I.K. Schuller, H. Vanderstraeten, Y. Bruynseraede, Phys. Rev. B 45, 9292 (1992)
L.G. Parratt, Phys. Rev. 95, 359 (1954)
U. Pietsch, V. Holy, T. Baumbach, High Resolution X-ray Scattering, 2nd edn. (Springer Verlag, New York, 2004)
T.P. Russell, Physica B 221, 267 (1996)
D. Nabok, P. Puschnig, O. Werzer, R. Resel, D.-M. Smilgies, C. Amborsch-Draxl, Phys. Rev. B 76, 235322 (2007)
S. Zorba, Y. Shapir, Y. Gao, Phys. Rev. B 74, 245410 (2006)
B. Stadlober, U. Haas, H. Maresch, A. Haase, Phys. Rev. B 74, 165302 (2006)
M. Birkholz, Thin Film Analysis by X-ray Scattering (Wiley-VCH, 2006)
F. Williamson, W. Hall, Acta Metall. 1, 22 (1953)
M. Oehzelt, C. Suess, R. Friedlein, W.R. Salaneck, R. Resel, J. Chem. Phys. 124, 054711 (2006)
M. Oehzelt, G. Koller, J. Ivanco, S. Berkebile, T. Haber, R. Resel, F.P. Netzer, M.G. Ramsey, Adv. Mat. 18, 2466 (2006)
H.J. Brandt, R. Resel, J. Kecks, B. Koppelhuber-Bitschnau, N. Koch, G. Leising, Mat. Res. Soc. Symp. Proc. 561, 161 (1999)
K. Puntambekar, K. Dong, G. Haugstad, C.D. Frisbie, Adv. Funct. Mat. 16, 879 (2006)
B. Nickel, R. Barabash, R. Ruiz, N. Koch, A. Kahn, L.C. Feldman, R.F. Halund, G. Scoles, Phys. Rev. B 70, 125401 (2004)
K. Sato, J. Phys. D: Appl. Phys. 26, 77 (1993)
S. Kowarik, A. Gerlach, W. Leitenberger, J. Hu, G. Witte, C. Wöll, U. Pietsch, F. Schreiber, Thin Solid Films 515, 5606 (2007)
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Werzer, O., Stadlober, B., Haase, A. et al. Full X-ray pattern analysis of vacuum deposited pentacene thin films. Eur. Phys. J. B 66, 455–459 (2008). https://doi.org/10.1140/epjb/e2008-00452-x
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DOI: https://doi.org/10.1140/epjb/e2008-00452-x