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Strong water repellency effect on SiO2 films processed at a nanometric scale

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Abstract.

The present study deals with the creation of nano-rough surfaces with stable and controlled high hydrophobicity. These surfaces were obtained by combining the ion track etching technique with a simple functionalization by grafting perfluoroctyltrichlorosilane (PFOTS) molecules. Surface morphology was investigated by AFM observations which evidenced a self-affine fractal structure with a fractal dimension Df ~ 2.6. The study of the wetting properties of these surfaces allowed to elucidate the conditions for observing a high hydrophobicity phenomenon and to predict the contact angle values for surfaces designed at a nanometric scale.

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Authors and Affiliations

  1. Laboratoire PMCN, Université Lyon 1, UMR CNRS 5586, 69622, Villeurbanne Cedex, France

    S. M.M. Ramos

  2. Centre Interdisciplinaire de Recherche Ions Laser, CIRIL-GANIL, BP 5133, 14070, Caen Cedex 5, France

    A. Benyagoub

  3. Institut de Nanotechnologie de Lyon, Université Lyon 1, CNRS, UMR 5270, 69622, Villeurbanne Cedex, France

    B. Canut

  4. Institut des Sciences et Techniques de l'Ingénieur de Lyon, Université Lyon1, 69622, Villeurbanne Cedex, France

    P. De Dieuleveult & G. Messin

Authors
  1. S. M.M. Ramos
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  2. A. Benyagoub
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  3. B. Canut
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  4. P. De Dieuleveult
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  5. G. Messin
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Correspondence to S. M.M. Ramos.

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Ramos, S., Benyagoub, A., Canut, B. et al. Strong water repellency effect on SiO2 films processed at a nanometric scale. Eur. Phys. J. B 62, 405–410 (2008). https://doi.org/10.1140/epjb/e2008-00182-1

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  • DOI: https://doi.org/10.1140/epjb/e2008-00182-1

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