Abstract
The effects of the spin coating process parameters on the thickness of the SiO x layer of the BOPP/SiO x composite film were investigated. When the concentration of tetraethoxysilane (TEOS) increased from 12.5 vol% to 55% vol%, the SiO x thickness increased from about 80 nm to 470 nm. In the sol time range of 1.5 h to 5 h the SiO x layer thickness reached a maximum at about 4 h and the change of the thickness roughly matched the change of the silica colloidal sphere sizes in sol. When the spin-coating speed of the dispensing stage increased from 450 r/min to 500 r/min, the SiO x layer thickness drastically decreased from about 1.67 μm to 400 nm. While the spin-coating speed of the thinning and drying stage went up to 1200 r/min, the SiO x layer thickness was in the range of 330 nm to 390 nm. It was also found that the SiO x layer thickness was almost increased linearly from about 500 nm to 1.02 μm with the ratio of the commercial silica colloidal to the TEOS from 0.2 to 1.0. The water contact angles decreased to about 23.0° for the BOPP/Si-Sol composite film with 1.67 μm SiO x layer and about 4.0° for the BOPP/mixing Si-Sol composite film with 1.02 μm SiO x layer. Compared to BOPP, the light transparency of the BOPP/Si-Sol composite films decreased by about 5.5% with the SiO x layer from about 80 nm to 1.67 μm and by 7.0% for the BOPP/mixing Si-Sol composite film with the SiO x layer from about 350 nm to 1.02 μm respectively.
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The work was financially supported by the Chinese Universities Scientific Fund (ZD0902).
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Yao, Xl., Ma, Yh., Zhao, Cw. et al. Correlation of SiO x layer thickness and properties of BOPP/SiO x composite films with spin coating process parameters. Chin J Polym Sci 31, 333–345 (2013). https://doi.org/10.1007/s10118-013-1224-9
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DOI: https://doi.org/10.1007/s10118-013-1224-9