Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms

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Abstract

Hyperthermal atoms are deposited upon a substrate in thin film deposition processes. Even when the atoms in the vapor phase are not intentionally accelerated to the substrate, the vapor phase atoms are attracted to the substrate surface with a potential of a few electron volts (eV) because of the interaction between the incoming atom and the substrate. Some deposition processes such as ion beam assisted deposition(IBAD), ion beam deposition (IBD), sputter deposition(S), and plasma enhanced chemical vapor deposition (PECVD)result in ions striking the substrate with energies from 10 to over 100 eV as shown in figure 1 [1].