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Oxide Coatings: Porous and Dense Films

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Book cover Optical Coatings

Part of the book series: Springer Series in Surface Sciences ((SSSUR,volume 54))

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Abstract

Main correlations between optical constants, mass density, shift, and mechanical stress of coatings with a different degree of porosity are highlighted. Practical examples focus on oxide coatings; comprehensive experimental material is presented for titanium dioxide, niobium pentoxide, tantalum pentoxide, zirconium dioxide, hafnium dioxide, aluminum oxide, and silicon dioxide films produced by means of different PVD techniques.

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References

  1. A. Hallbauer, D. Huber, G.N. Strauss, S. Schlichtherle, A. Kunz, H.K. Pulker, Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating. Thin Solid Films 516, 4587–4592 (2008)

    Article  ADS  Google Scholar 

  2. R. Thielsch, A. Gatto, J. Heber, N. Kaiser, A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition, and plasma ion-assisted deposition. Thin Solid Films 410, 86–93 (2002)

    Article  ADS  Google Scholar 

  3. O. Stenzel, S. Wilbrandt, N. Kaiser, M. Vinnichenko, F. Munnik, A. Kolitsch, A. Chuvilin, U. Kaiser, J. Ebert, S. Jakobs, A. Kaless, S. Wüthrich, O. Treichel, B. Wunderlich, M. Bitzer, M. Grössl, The correlation between mechanical stress, thermal shift and refractive index in HfO2, Nb2O5, Ta2O5 and SiO2 layers and its relation to the layer porosity. Thin Solid Films 517, 6058–6068 (2009)

    Article  ADS  Google Scholar 

  4. O. Stenzel, A model for calculating the effect of nanosized pores on refractive index, thermal shift and mechanical stress in optical coatings. J. Phys. D 42, 055312 (2009)

    Article  ADS  Google Scholar 

  5. M.M.M. Bilek, D.R. McKenzie, A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions. Surf. Coat. Technol. 200, 4345–4354 (2006)

    Article  Google Scholar 

  6. E.C. Freeman, W. Paul, Optical constants of rf sputtered hydrogenated amorphous Si. Phys. Rev. B 20, 716–728 (1979)

    Article  ADS  Google Scholar 

  7. E.D. Palik (ed.), Handbook of Optical Constants of Solids (Academic Press, Orlando, 1998)

    Google Scholar 

  8. D. Mergel, Keimbildung und Wachstum von TiO2 in dünnen Schichten. Vak. Forsch. Prax. 23(1), 20–23 (2011)

    Article  MathSciNet  Google Scholar 

  9. F. Jenkner, Präparation von TiO2-, ZrO2- und HfO2-Schichten mittels Elektronenstrahlverdampfen, Fachhochschule Jena/Fraunhofer IOF, Bachelor thesis (2011)

    Google Scholar 

  10. D. Liu, Characterization of Single Layer Oxide Thin Films Prepared by Piad and Sputter Deposition on Different Substrates (Report on practical studies, Fraunhofer IOF, 2012)

    Google Scholar 

  11. O. Stenzel, S. Wilbrandt, N. Kaiser, C. Schmitz, M. Turowski, D. Ristau, P. Awakowicz, R.P. Brinkmann, T. Musch, I. Rolfes, H. Steffen, R. Foest, A. Ohl, T. Köhler, G. Dolgonos, T. Frauenheim, Plasma and optical thin film technologies. Proc. SPIE 8168(81680L), 1–10 (2011)

    Google Scholar 

  12. M. Landmann, T. Köhler, S. Köppen, E. Rauls, T. Frauenheim, W.G. Schmidt, Fingerprints of order and disorder in the electronic and optical properties of crystalline and amorphous TiO2. Phys. Rev. B 86, 064201 (2012)

    Article  ADS  Google Scholar 

  13. M. Held, Ph.D. thesis, In preparation

    Google Scholar 

  14. H. Ehlers, K. Becker, R. Beckmann, N. Beermann, U. Brauneck, P. Fuhrberg, D. Gäbler, S. Jakobs, N. Kaiser, M. Kennedy, F. König, S. Laux, J.C. Müller, B. Rau, W. Riggers, D. Ristau, D. Schäfer, O. Stenzel, Ion Assisted Deposition Processes: Industrial Network IntIon. SPIE Proc. 5250, 646–655 (2004)

    Article  ADS  Google Scholar 

  15. C.C. Lee, C.L. Tien, J.C. Hsu, Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering. Appl. Opt. 41, 2043–2047 (2002)

    Article  ADS  Google Scholar 

  16. M.G. Krishna, A.K. Bhattacharya, Processing and size effects on the optical properties of sputtered oxide thin films. Mat. Sci. Eng. B 86, 41–47 (2001)

    Article  Google Scholar 

  17. M. Vinnichenko, A. Rogozin, D. Grambole, F. Munnik, A. Kolitsch, W. Möller, O. Stenzel, S. Wilbrandt, A. Chuvilin, U. Kaiser, Highly dense amorphous Nb2O5 films with closed nanosized pores. Appl. Phys. Lett. 95(081904), 1–3 (2009)

    Google Scholar 

  18. S. Jakobs, M. Lappschies, U. Schallenberg, O. Stenzel, S. Wilbrandt, Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering. Chin. Opt. Lett. 8, 73–77 (2010)

    Article  Google Scholar 

  19. J. Edlinger, J. Ramm, H.K. Pulker, Properties of ion plated Nb2O5 films. Thin Solid Films 175, 207–212 (1989)

    Article  ADS  Google Scholar 

  20. R. Schlegel, Untersuchung des Einflusses des Arbeitsgases auf die Eigenschaften von mittels PIAD hergestellten Tantalpentoxidschichten, Ernst-Abbe-Fachhochschule Jena, Fachbereich SciTec, Master thesis (2012)

    Google Scholar 

  21. O. Stenzel, S. Wilbrandt, M. Schürmann, N. Kaiser, H. Ehlers, M. Mende, D. Ristau, S. Bruns, M. Vergöhl, M. Stolze, M. Held, H. Niederwald, T. Koch, W. Riggers, P. Burdack, G. Mark, R. Schäfer, S. Mewes, M. Bischoff, M. Arntzen, F. Eisenkrämer, M. Lappschies, S. Jakobs, S. Koch, B. Baumgarten, A. Tünnermann, Mixed oxide coatings for optics. Appl. Opt. 50, C69–C74 (2011)

    Article  Google Scholar 

  22. W.T. Tang, Z.F. Ying, Z.G. Hu, W.W. Li, J. Sun, N. Xu, J.D. Wu, Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature. Thin Solid Films 518, 5442–5446 (2010)

    Article  ADS  Google Scholar 

  23. J.M. Khoshman, A. Khan, M.E. Kordesch, Amorphous hafnium oxide thin films for antireflection optical coatings. Surf. Coat. Technol. 202, 2500–2502 (2008)

    Article  Google Scholar 

  24. J.M. Khoshman, M.E. Kordesch, Optical properties of a-HfO2 thin films. Surf. Coat. Tech 201, 3530–3535 (2006)

    Article  Google Scholar 

  25. T. Nishide, S. Honda, M. Matsuura, M. Ide, Surface, structural and optical properties of sol-gel derived HfO2 films. Thin Solid Films 371, 61–65 (2000)

    Article  ADS  Google Scholar 

  26. N. Selvakumar, H.C. Barshilia, K.S. Rajam, A. Biswas, Structure, optical properties and thermal stability of pulsed sputter deposited high temperature HfOx/Mo/HfO2 solar selective absorbers. Sol. Energy Mater. Sol. Cells 94, 1412–1420 (2010)

    Article  Google Scholar 

  27. L. Gallais, J. Capoulade, J.-Y. Natoli, M. Commandré, M. Cathelinaud, C. Koc, M. Lequime, Laser damage resistance of hafnium dioxide thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering. Appl. Opt. 47, C107–C113 (2008)

    Article  ADS  Google Scholar 

  28. B. Andre, L. Poupinet, G. Ravel, Evaporation and ion assisted deposition of HfO2 coatings: Some key points for high power laser applications. J. Vac. Sci. Technol. 18, 2372–2377 (2000)

    Article  ADS  Google Scholar 

  29. D. Zhang, S. Fan, Y. Zhao, W. Gao, J. Shao, R. Fan, Y. Wang, Z. Fan, High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation. Appl. Surf. Sci. 243, 232–237 (2005)

    Article  ADS  Google Scholar 

  30. M. Jerman, Z. Qiao, D. Mergel, Refractive index of thin films of SiO2, ZrO2, und HfO2 as a function of the films’ mass density. Appl. Opt. 44, 3006–3012 (2005)

    Article  ADS  Google Scholar 

  31. A. Kunz, A. Hallbauer, D. Huber, H.K. Pulker, Optische und mechanische Eigenschaften von RLVIP HfO2-Schichten. Vak. Forsch. Prax. 18(5), 12–16 (2006). (engl.: Optical and mechanical properties of RLVIP HfO2 films)

    Article  Google Scholar 

  32. E.E. Hoppe, R.S. Sorbello, C.R. Aita, Near-edge optical absorption behavior of sputter deposited hafnium dioxide. J. Appl. Phys. 101, 123534 (2007)

    Article  ADS  Google Scholar 

  33. J. Aarik, H. Mändar, M. Kirm, L. Pung, Optical characterization of HfO2 thin films grown by atomic layer deposition. Thin Solid Films 466, 41–47 (2004)

    Article  ADS  Google Scholar 

  34. M. Alvisi, F. De Tomasi, M.R. Perrone, M.L. Protopapa, A. Rizzo, F. Sarto, S. Scaglione, Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films. Thin Solid Films 396, 44–52 (2001)

    Article  ADS  Google Scholar 

  35. A. Gatto, R. Thielsch, J. Heber, N. Kaiser, D. Ristau, S. Günster, J. Kohlhaas, M. Marsi, M. Trovo, R. Walker, D. Garzella, M.E. Couprie, P. Torchio, M. Alvisi, C. Amra, High-performance deep-ultraviolet optics for free-electron lasers. Appl. Opt. 41, 3236–3241 (2002)

    Article  ADS  Google Scholar 

  36. J. Bellum, D. Kletecka, P. Rambo, I. Smith, J. Schwarz, B. Atherton, Comparison between laser damage and optical electric field behaviors for hafnium dioxide/silicon dioxide antireflection coatings. Appl. Opt. 50, C340–C348 (2011)

    Article  Google Scholar 

  37. X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, Z. Wang, Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors. Appl. Opt. 50, C357–C363 (2011)

    Article  ADS  Google Scholar 

  38. Z. Jinlong, C. Xinbin, W. Zhanshan, J. Hongfei, D. Tao, HfO2/SiO2 chirped mirrors manufactured by electron beam evaporation. Appl. Opt. 50, C388–C391 (2011)

    Article  Google Scholar 

  39. S. Scaglione, F. Sarto, M. Alvisi, A. Rizzo, M.R. Perrone, M.L. Protopapa, Correlation between the structural and optical properties of ion-assisted hafnia thin films. Proc. SPIE 3902, 194–203 (2000)

    Article  ADS  Google Scholar 

  40. A.V. Tikhonravov, M.K. Trubetskov, T.V. Amotchkina, G. DeBell, V. Pervak, A.K. Sytchkova, M.L. Grilli, D. Ristau, Optical parameters of oxide films typically used in optical coating production. Appl. Opt. 50, C75–C85 (2011)

    Article  Google Scholar 

  41. O. Stenzel, S. Wilbrandt, S. Yulin, N. Kaiser, M. Held, A. Tünnermann, J. Biskupek, U. Kaiser, Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases. Opt. Mater. Express 1, 278–292 (2011)

    Article  Google Scholar 

  42. M. Friz, F. Waibel, in Optical Interference Coatings, eds by N. Kaiser, H. K. Pulker (Springer, Berlin Heidelberg New York, 2003) p. 105

    Google Scholar 

  43. R. Thielsch, in Optical Interference Coatings, eds by N. Kaiser, H. K. Pulker (Springer, Berlin Heidelberg New York, 2003) p. 257

    Google Scholar 

  44. C. Zaczek, A. Pazidis, H. Feldermann, in Optical Interference Coatings Topical Meeting, OSA Technical Digest Series (Optical Society of America, 2007), FA1

    Google Scholar 

  45. M. Zukic, D.G. Torr, J.F. Spann, M.R. Torr, Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films. Appl. Opt. 29, 4284–4292 (1990)

    Article  ADS  Google Scholar 

  46. C. Mühlig, W. Triebel, S. Kufert, S. Bublitz, Characterization of low losses in optical thin films and materials. Appl. Opt. 47, C135–C142 (2008)

    Article  ADS  Google Scholar 

  47. J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, N. Kaiser, 193 nm laser induced luminescence in oxide thin films. Appl. Phys. 75, 637–640 (2002)

    Article  Google Scholar 

  48. G.L. Harding, Production and properties of high rate sputtered low index transparent dielectric materials based on aluminium-oxy-fluorine. Sol. Energy Mater. 12, 169–186 (1985)

    Article  ADS  Google Scholar 

  49. R. Lewin, R.P. Howson, C.A. Bishop, Optical coatings for large area interference filters. Vacuum 37, 257–260 (1987)

    Article  Google Scholar 

  50. C.E. Anderson, J.P. Rousseau, Transparent substrate provided with a thin-film coating, U.S. Patent 5,952,084 (1999)

    Google Scholar 

  51. J.S. McCloy, R. Korenstein, P.E. Cremin, R.W. Rustison, Durable antireflective multispectral infrared coatings. Patent 20100035036, A1 (2010)

    Google Scholar 

  52. A. Petzold, J. Ulbricht, Tonerde und Tonerdewerkstoffe (VEB Deutscher Verlag für Grundstoffindustrie, Leipzig, 1983)

    Google Scholar 

  53. O. Stenzel, D. Gäbler, S. Wilbrandt, N. Kaiser, H. Steffen, A. Ohl, Plasma ion assisted deposition of aluminium oxide and aluminium oxifluoride layers for applications in the ultraviolet spectral range. Opt. Mater. 33, 1681–1687 (2011)

    Article  ADS  Google Scholar 

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Stenzel, O. (2014). Oxide Coatings: Porous and Dense Films. In: Optical Coatings. Springer Series in Surface Sciences, vol 54. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-54063-9_7

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  • DOI: https://doi.org/10.1007/978-3-642-54063-9_7

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