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Surface Science Techniques pp 461–497Cite as

Helium Ion Microscopy

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Part of the book series: Springer Series in Surface Sciences ((SSSUR,volume 51))

Abstract

The realization of a practical helium gas field ionization source (GFIS) enabled helium ion microscopy (HIM) as a new technique to image and modify materials and microstructures. After a brief overview of most common ultra-microscopy techniques (TEM, SEM, Gallium FIB) and HIM, we introduce the interaction fundamentals of helium ions with matter. A key element of that interaction is that the resulting signals for imaging, nanofabrication and analysis, i.e. the secondary electrons and backscattered ions, are to a very high degree localized around the incidence point of the helium beam. This simple fact allows the helium ion microscope to enable a new and unique view of surfaces and provide a new method for material modification. We highlight several applications for imaging and nanofabrication using the sub-nanometer sized helium probe of the HIM.

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Notes

  1. 1.

    We attribute the large variation in measured SE yields for a major part to differences in the surface cleanliness, sputtering and roughening in these experiments.

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Acknowledgements

The significant investment by the Dutch NanoNed program and the Dutch Foundation for Technical Sciences (STW) is to be acknowledged for the HIM facilities at TNO and the University of Twente, respectively. ASML has financially supported the CD metrology benchmark of SEM with HIM. The HREM application is supported by NIMIC. Carl Zeiss NTS has financially and scientifically (Larry Scipioni, Bill Thompson, Colin Sanford, Louise Barriss, Lewis Stern and David Ferranti) supported the UHV instrument development program and the He-IBID experiments. Diederik Maas is grateful to Susan Ketelaars for her patience and wisdom, and acknowledges Emile van Veldhoven, Hans van der Veer, David Nijkerk, Pieter van Beek, Larry Scipioni, John Notte IV, Bill Thompson, Lewis Stern, Sybren Sijbrandij, Emile van der Drift, Vadim Sidorkin, Ping Chen, Anja van Langen-Suurling, Hozan Miro, Emma Koster, Maria Rudneva, Henny Zandbergen and, last but certainly not least, Paul Alkemade for their pleasant and close collaboration in exploring HIM applications and instrumentation. Raoul van Gastel acknowledges Gregor Hlawacek, Vasilisa Veligura, Al Lysse, Clarke Fenner, and in particular Bene Poelsema for his scientific guidance and never-ending enthusiasm in sharing his long-standing experience in ion scattering.

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Authors and Affiliations

  1. TNO Nano-instrumentation, P.O. Box 155, 2600AD, Delft, The Netherlands

    Diederik J. Maas

  2. Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500AE, Enschede, The Netherlands

    Raoul van Gastel

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  1. Diederik J. Maas
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  2. Raoul van Gastel
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Correspondence to Diederik J. Maas .

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  1. , Department of Physics, University of Genoa, Via Dodecaneso 33, Genoa, 16146, Italy

    Gianangelo Bracco

  2. , Department of Physics and Technology, University of Bergen, Allegaten 55, Bergen, 5007, Svalbard

    Bodil Holst

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Maas, D.J., van Gastel, R. (2013). Helium Ion Microscopy. In: Bracco, G., Holst, B. (eds) Surface Science Techniques. Springer Series in Surface Sciences, vol 51. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-34243-1_16

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