Abstract
A survey of the analysis of surfaces, interfaces, and thin films in typical fields of materials science is shown in Table 1.1 (Chap. 1). In practice, the analytical task and strategy (Sect. 8.1) decide about sample preparation and handling (Sect. 8.3) [8.1,8.11,8.12,9.1,9.2]. Sample preparation can be performed either outside the UHV environment of the analysis system (ex situ preparation, Sect. 8.3.1) or inside the UHV system (in situ, Sect. 8.3.2). Summarized under these two categories, a survey of the main phenomena that are studied with surface analysis methods is given in Table 9.1.
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Hofmann, S. (2013). Typical Applications of AES and XPS. In: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science. Springer Series in Surface Sciences, vol 49. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-27381-0_9
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