Abstract
Chemical Vapor Deposition (CVD) of silica is applied to achieve the fine shape selectivity on mordenite, ZSM-5, and A-zeolite is mentioned. Selective para-dialkylbenzene formation due to the alkylation and the disproportionation is the most important and interesting reaction achieved on the silica-deposited H-ZSM-5. Various industrial applications of the CVD of silica are reviewed.
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Niwa, M., Katada, N., Okumura, K. (2010). Application of the CVD of Silica to the Shape Selective Reaction. In: Characterization and Design of Zeolite Catalysts. Springer Series in Materials Science, vol 141. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-12620-8_7
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DOI: https://doi.org/10.1007/978-3-642-12620-8_7
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