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Physics of Ferroelectrics pp 219–304Cite as

Growth and Novel Applications of Epitaxial Oxide Thin Films

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Part of the book series: Topics in Applied Physics ((TAP,volume 105))

Abstract

This chapter addresses key developments in the ability to grow epitaxial oxide films and provides examples of possible applications of these structures.

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Authors and Affiliations

  1. Department of Applied Physics, Yale University, CT 06520-8284, New Haven, USA

    Agham-Bayan Posadas, Fred J. Walker & Charles H. Ahn

  2. Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, 277-8581, Chiba, Japan

    Mikk Lippmaa

  3. Condensed Matter Physics Department, University of Geneva, 24 Quai Ernest Ansermet, CH-1211, Geneva 4, Switzerland

    Matthew Dawber & Jean-Marc Triscone

  4. Department of Physics, Yale University, CT 06520-8120, New Haven, USA

    Charles H. Ahn

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  1. Agham-Bayan Posadas
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  2. Mikk Lippmaa
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  3. Fred J. Walker
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Posadas, AB., Lippmaa, M., Walker, F.J., Dawber, M., Ahn, C.H., Triscone, JM. (2007). Growth and Novel Applications of Epitaxial Oxide Thin Films. In: Physics of Ferroelectrics. Topics in Applied Physics, vol 105. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-34591-6_6

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