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Toward Ultrafast In Situ X-ray Studies of Interfacial Photoelectrochemistry

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Book cover Ultrafast Phenomena XIX

Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 162))

Abstract

Picosecond time-resolved in situ X-ray absorption and X-ray photoelectron spectroscopy techniques for atomic site-specific real-time studies of interfacial photoelectrochemistry are developed at the Advanced Light Source (ALS). First experiments monitor electronic dynamics in films of dye-sensitized nanocrystals and at hematite-electrolyte interfaces.

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References

  1. A. Shavorskiy et al., “Time-resolved x-ray photoelectron spectroscopy techniques for real-time studies of interfacial charge transfer dynamics,” AIP Conf. Proc. 1525, 475 (2013).

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  2. S. Neppl et al., “Capturing interfacial photoelectrochemical dynamics with picosecond time-resolved X-ray photoelectron spectroscopy,” Faraday Discuss. 171, 219 (2014).

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  3. K. Siefermann et al., “Atomic Scale Perspective of Ultrafast Charge Transfer at a Dye-Semiconductor Interface”, J. Phys. Chem. Lett., submitted 5, 2753 (2014).

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  4. A. Braun, et al., “Direct Observation of Two Electron Holes in a Hematite Photoanode during Photoelectrochemical Water Splitting”, J. Phys. Chem. C 116, 16870 (2012).

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Acknowledgment

This work was supported by the U.S. Department of Energy, Office of Basic Energy Sciences, Chemical Sciences, Geosciences and Biosciences Division, through Contract No. DE-AC02-05CH11231. O.G. was supported by the Department of Energy Office of Science Early Career Research Program.

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Authors and Affiliations

  1. Ultrafast X-Ray Science Laboratory, University of California, Berkeley, CA, 94720, USA

    S. Neppl & O. Gessner

  2. Chemical Sciences Division, Lawrence Berkeley National Laboratory, University of California, One Cyclotron Road, M/S 2-300, Berkeley, CA, 94720, USA

    S. Neppl, A. Shavorskiy, I. Zegkinoglou, T. Troy, D. S. Slaughter, M. Ahmed, H. Bluhm & O. Gessner

  3. Advanced Light Source, University of California, Berkeley, CA, 94720, USA

    Y.-S. Liu, J.-H. Guo & P.-A. Glans

  4. Materials Sciences Division, Lawrence Berkeley National Laboratory, University of California, Berkeley, CA, 94720, USA

    C.-H. Wu & M. Salmeron

  5. Department of Chemistry, University of California, Berkeley, CA, 94720, USA

    C.-H. Wu

  6. Space Sciences Laboratory, University of California, Berkeley, CA, 94720, USA

    A. S. Tremsin

Authors
  1. S. Neppl
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  2. Y.-S. Liu
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  3. C.-H. Wu
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  4. A. Shavorskiy
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  5. I. Zegkinoglou
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  6. T. Troy
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  7. D. S. Slaughter
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  8. M. Ahmed
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  9. A. S. Tremsin
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  10. J.-H. Guo
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  11. P.-A. Glans
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  12. M. Salmeron
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  13. H. Bluhm
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  14. O. Gessner
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Corresponding author

Correspondence to S. Neppl .

Editor information

Editors and Affiliations

  1. Department of Chemistry, The University of Tokyo, Tokyo, Japan

    Kaoru Yamanouchi

  2. JILA, University of Colorado, Boulder, Colorado, USA

    Steven Cundiff

  3. Department of Chemistry, Ludwig-Maximilians-University, München, Germany

    Regina de Vivie-Riedle

  4. Department of Physics, The University of Tokyo, Tokyo, Japan

    Makoto Kuwata-Gonokami

  5. Department of Physics, The Ohio State University, Columbus, Ohio, USA

    Louis DiMauro

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© 2015 Springer International Publishing Switzerland

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Neppl, S. et al. (2015). Toward Ultrafast In Situ X-ray Studies of Interfacial Photoelectrochemistry. In: Yamanouchi, K., Cundiff, S., de Vivie-Riedle, R., Kuwata-Gonokami, M., DiMauro, L. (eds) Ultrafast Phenomena XIX. Springer Proceedings in Physics, vol 162. Springer, Cham. https://doi.org/10.1007/978-3-319-13242-6_79

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