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Complex Plasmas pp 235–266Cite as

Fundamental and Applied Studies of Molecular Plasmas Using Infrared Absorption Techniques

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Part of the book series: Springer Series on Atomic, Optical, and Plasma Physics ((SSAOPP,volume 82))

Abstract

Over the past few years mid infrared absorption spectroscopy (MIR-AS) over the region from 3 to 20 ?m has progressed considerably as a powerful diagnostic technique for in situ studies of the fundamental physics and chemistry of molecular plasmas. The increasing interest in processing plasmas containing hydrocarbons, fluorocarbons, nitrogen oxides and organo-silicon compounds has led to further applications of MIR-AS because most of these compounds and their decomposition products are infrared active. MIR-AS provides a means of determining the absolute concentrations of the ground states of stable and transient molecular species at time resolutions below a micro second, which is of particular importance for the investigation of reaction kinetics and dynamics. Information about gas temperature and population densities can also be derived from MIR-AS measurements. Since plasmas with molecular feed gases are used in many applications such as thin film deposition, semiconductor processing, surface activation and cleaning, and materials and waste treatment, this has stimulated the adaptation of MIR-AS techniques to industrial requirements including the development of new diagnostic equipment. The aim of the present chapter is fourfold: (i) to briefly summarize the basic principles of infrared absorption spectroscopy and related instrumentation, (ii) to report on recent achievements in our understanding of molecular phenomena in plasmas using different types of MIR-AS techniques, (iii) to describe examples of industrial process monitoring in the mid infrared and (iv) to discuss the potential of advanced instrumentation based on quantum cascade lasers (QCLs) for plasma diagnostics.

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Acknowledgments

This work was partly supported by (a) the German Research Foundation (DFG) within the framework of the Collaborative Research Centre Transregio 24 “Fundamentals of Complex Plasmas”, (b) the Federal Ministry of Education and Research (BMBF), FKZ 13N7451/8 and by the Federal Ministry of Economics and Technology (BMWi), FKZ KF 0086503FK6, (c) the German Academic Exchange Service (DAAD) and EGIDE as part of the French–German PROCOPE Collaboration Program, and (d) the EPSRC with an award of an Advanced Research Fellowship.

The authors give sincere thanks to all present and former members of the laboratories involved in Greifswald, Palaiseau, Eindhoven, Oxford and Cambridge for permanent support and a stimulating working climate. In particular, the authors are indebted to all co-authors of former papers whose contributions made the present chapter possible.

Finally, the authors acknowledge the support given by Neoplas Control, Alpes Lasers, Nanoplus, Daylight Solutions and MGO Optical Solutions.

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Authors and Affiliations

  1. INP Greifswald, Felix-Hausdorff-Str. 2, 17489, Greifswald, Germany

    J. Röpcke, J. H. van Helden, M. Hübner & N. Lang

  2. Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge, CB2 1EW, UK

    P. B. Davies

  3. Eindhoven University of Technology, 513, 5600 MB, Eindhoven, The Netherlands

    S. Welzel

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  1. J. Röpcke
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Correspondence to J. Röpcke .

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Editors and Affiliations

  1. Astrophysik Lehrstuhl Statistische Physik, Christian-Albrechts-Universität zu Kiel Institut für Theoretische Physik und, Kiel, Germany

    Michael Bonitz

  2. Seton Hall University, South Orange, New Jersey, USA

    Jose Lopez

  3. Polytechnic Institute of New York University, Brooklyn, New York, USA

    Kurt Becker

  4. Institut für Theoretische Physik und Astrophysik, Christian-Albrechts-Universität zu Kiel, Kiel, Germany

    Hauke Thomsen

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Röpcke, J., Davies, P.B., van Helden, J.H., Hübner, M., Lang, N., Welzel, S. (2014). Fundamental and Applied Studies of Molecular Plasmas Using Infrared Absorption Techniques. In: Bonitz, M., Lopez, J., Becker, K., Thomsen, H. (eds) Complex Plasmas. Springer Series on Atomic, Optical, and Plasma Physics, vol 82. Springer, Cham. https://doi.org/10.1007/978-3-319-05437-7_7

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