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Concerns and Solutions

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Book cover Copper Wire Bonding

Abstract

This chapter provides an overview of the concerns with Cu wire bonding and the industry’s solutions to these concerns. Although Cu wire bonding is gaining widespread acceptance in the industry, there are a few challenges associated with it that need to be overcome. Cu wire bonding poses concerns related to Cu’s hardness, propensity to oxidize, and sensitivity to corrosion, as well as the wire bonding process, bonding in specialized packages, and low yield. The industry solutions to these problems, such as the use of thicker Al pads than are used in Au wire bonding, Ni-based pad finishes, specialized capillaries, palladium-coated Cu wires, and bonding in an inert gas atmosphere, are also discussed.

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References

  1. M. Deley and L. Levine, “The emergence of high volume copper ball bonding,” in Electronics Manufacturing Technology Symposium, 2004. IEEE/CPMT/SEMI 29th International, 2004, pp. 186–190.

    Google Scholar 

  2. S. Zhang, C. Chen, R. Lee, A. K. M. Lau, P. P. H. Tsang, L. Mohamed, C. Y. Chan, and M. Dirkzwager, “Characterization of intermetallic compound formation and copper diffusion of copper wire bonding,” in Electronic Components and Technology Conference, 2006. Proceedings. 56th, 2006, p. 6.

    Google Scholar 

  3. C. T. h. Lu, “The challenges of copper wire bonding,” in Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International, 2010, pp. 1–4.

    Google Scholar 

  4. H. Clauberg, P. Backus, and B. Chylak, “Nickel-palladium bond pads for copper wire bonding,” Microelectronics Reliability, vol. 51, pp. 75–80, Jan 2011.

    Article  Google Scholar 

  5. A. Shah, M. Mayer, Y. Zhou, S. J. Hong, and J. T. Moon, “Reduction of underpad stress in thermosonic copper ball bonding,” in Electronic Components and Technology Conference, 2008. ECTC 2008. 58th, 2008, pp. 2123-2130.

    Google Scholar 

  6. L. England and T. Jiang, “Reliability of Cu wire bonding to Al metallization,” in Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th, 2007, pp. 1604–1613.

    Google Scholar 

  7. B. K. Appelt, L. Huang, Y. Lai, and S. Chen, “Three years of fine Cu wire bonding in high volume manufacturing,” in Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on, 2011, pp. 1–3.

    Google Scholar 

  8. S. L. Khoury, D. J. Burkhard, D. P. Galloway, and T. A. Scharr, “A comparison of copper and gold wire bonding on integrated circuit devices,” in Electronic Components and Technology Conference, 1990. 40th, 1990, pp. 768–776 vol.1.

    Google Scholar 

  9. S. Inderjit, J. Y. On, and L. Levine, “Enhancing fine pitch, high I/O devices with copper ball bonding,” in Electronic Components and Technology Conference, 2005. Proceedings. 55th, 2005, pp. 843–847 Vol. 1.

    Google Scholar 

  10. K. Toyozawa, K. Fujita, S. Minamide, and T. Maeda, “Development of copper wire bonding application technology,” in Electronic Components and Technology Conference, 1990. 40th, 1990, pp. 762–767 vol.1.

    Google Scholar 

  11. N. Srikanth, J. Premkumar, M. Sivakumar, Y. M. Wong, and C. J. Vath, “Effect of wire purity on copper wire bonding,” in Electronics Packaging Technology Conference, 2007. EPTC 2007. 9th, 2007, pp. 755–759.

    Google Scholar 

  12. R. Dohle, M. Petzold, R. Klengel, H. Schulze, and F. Rudolf, “Room temperature wedge–wedge ultrasonic bonding using aluminum coated copper wire,” Microelectronics Reliability, vol. 51, pp. 97–106, 2011.

    Article  Google Scholar 

  13. S. Kaimori, T. Nonaka, and A. Mizoguchi, “The development of Cu bonding wire with oxidation-resistant metal coating,” IEEE Transactions on Advanced Packaging, vol. 29, pp. 227–231, May 2006.

    Article  Google Scholar 

  14. T. Uno, “Bond reliability under humid environment for coated copper wire and bare copper wire,” Microelectronics Reliability, vol. 51, pp. 148–156, Jan 2011.

    Article  Google Scholar 

  15. I. Qin, X. Hui, H. Clauberg, R. Cathcart, V. L. Acoff, B. Chylak, and H. Cuong, “Wire bonding of Cu and Pd coated Cu wire: bondability, reliability, and IMC formation,” in Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st, 2011, pp. 1489–1495.

    Google Scholar 

  16. O. Yauw, H. Clauberg, L. Kuan Fang, S. Liming, and B. Chylak, “Wire bonding optimization with fine copper wire for volume production,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 467–472.

    Google Scholar 

  17. N. SeokHo, H. TaeKyeong, P. JungSoo, K. JinYoung, Y. HeeYeoul, and L. ChoonHeung, “Characterization of intermetallic compound (IMC) growth in Cu wire ball bonding on Al pad metallization,” in Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st, 2011, pp. 1740–1745.

    Google Scholar 

  18. K. Soffa, in Presentation, ed, 2012.

    Google Scholar 

  19. Z. W. Zhong, H. M. Ho, Y. C. Tan, W. C. Tan, H. M. Goh, B. H. Toh, and J. Tan, “Study of factors affecting the hardness of ball bonds in copper wire bonding,” Microelectronic Engineering, vol. 84, pp. 368–374, 2007.

    Article  Google Scholar 

  20. H.-C. Hsu, W.-Y. Chang, C.-L. Yeh, and Y.-S. Lai, “Characteristic of copper wire and transient analysis on wirebonding process,” Microelectronics Reliability, vol. 51, pp. 179–186, 2011.

    Article  Google Scholar 

  21. T. Tu Anh, L. Chu-Chung, V. Mathew, and L. Higgins, “Copper wire bonding on low-k/copper wafers with bond over active (BOA) structures for automotive customers,” in Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st, 2011, pp. 1508–1515.

    Google Scholar 

  22. D. Stephan, F. W. Wulff, and E. Milke, “Reliability of palladium coated copper wire,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 343–348.

    Google Scholar 

  23. J. Foley, H. Clauberg, and B. Chylak, “Enabling high volume fine pitch copper wire bonding: enhancements to process and equipment capability,” in Electronic System-Integration Technology Conference (ESTC), 2010 3rd, 2010, pp. 1–4.

    Google Scholar 

  24. P. Liu, L. Tong, J. Wang, L. Shi, and H. Tang, “Challenges and developments of copper wire bonding technology,” Microelectronics Reliability, vol. 52, pp. 1092–1098, 2012.

    Article  Google Scholar 

  25. M. H. Hong, J. Tan, C. T. Yee, H. T. Boon, and P. Xavier, “Modeling energy transfer to copper wire for bonding in an inert environment,” in Electronic Packaging Technology Conference, 2005. EPTC 2005. Proceedings of 7th, 2005, pp. 292–297.

    Google Scholar 

  26. C. Hua, S. W. R. Lee, and D. Yutian, “Evaluation of bondability and reliability of single crystal copper wire bonding,” in High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on, 2005, pp. 1–7.

    Google Scholar 

  27. S.-D. Lee, Kwon, Y.-S., Shin, J.-J., “Semiconductor package having oxidation-free copper wire,” 2003.

    Google Scholar 

  28. X. Fan, T. Wang, Y. Cong, B. Zhang, and J. Wang, “Oxidation study of copper wire bonding,” in Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on, 2010, pp. 246–249.

    Google Scholar 

  29. B. K. Appelt, A. Tseng, and L. Yi-Shao, “Fine pitch copper wire bonding introduction to high volume production,” in Electronic System-Integration Technology Conference (ESTC), 2010 3rd, 2010, pp. 1–5.

    Google Scholar 

  30. B. K. Appelt, W. T. Chen, A. Tseng, and L. Yi-Shao, “Fine pitch Cu wire bonding- as good as gold,” in CPMT Symposium Japan, 2010 IEEE, 2010, pp. 1–4.

    Google Scholar 

  31. A. Bing, D. Lan, W. Techun, L. Tailieh, and W. Yiping, “Annealing effect and crystallization characteristics of copper wire bonding on pre-plated leadframe,” in Advanced Packaging Materials (APM), 2011 International Symposium on, 2011, pp. 141–144.

    Google Scholar 

  32. A. Shah, A. Rezvani, M. Mayer, Y. Zhou, J. Persic, and J. T. Moon, “Reduction of ultrasonic pad stress and aluminum splash in copper ball bonding,” Microelectronics Reliability, vol. 51, pp. 67–74, Jan 2011.

    Article  Google Scholar 

  33. S. Hong, C. Hang, and C. Wang, “Experimental research of copper wire ball bonding,” in Electronic Packaging Technology, 2005 6th International Conference on, 2005, pp. 1–5.

    Google Scholar 

  34. H. Clauberg, P. Backus, and B. Chylak, “Nickel–palladium bond pads for copper wire bonding,” Microelectronics Reliability, vol. 51, pp. 75–80, 2011.

    Article  Google Scholar 

  35. L. L. Jeng, L. K. Hwa, and N. W. Chang, “Impacts to fine pitch copper wire bonding quality by external airflow,” in Electronic Manufacturing Technology Symposium (IEMT), 2010 34th IEEE/CPMT International, 2010, pp. 1–5.

    Google Scholar 

  36. Y. Jiang, R. Sun, S. Wang, D. Min, and W. Chen, “Study of a practicable wire bonding method for applying copper wire bond to large-scale integrated circuits,” in Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th, 2010, pp. 1169–1165.

    Google Scholar 

  37. H. Clauberg, B. Chylak, N. Wong, J. Yeung, and E. Milke, “Wire bonding with Pd-coated copper wire,” in CPMT Symposium Japan, 2010 IEEE, 2010, pp. 1–4.

    Google Scholar 

  38. J. Lee, M. Mayer, Y. Zhou, S. J. Hong, and J. T. Moon, “Concurrent optimization of crescent bond pull force and tail breaking force in a thermosonic Cu wire bonding process,” Electronics Packaging Manufacturing, IEEE Transactions on, vol. 32, pp. 157–163, 2009.

    Google Scholar 

  39. Y. H. Tian, C. J. Hang, C. Q. Wang, G. Q. Ouyang, D. S. Yang, and J. P. Zhao, “Reliability and failure analysis of fine copper wire bonds encapsulated with commercial epoxy molding compound,” Microelectronics Reliability, vol. 51, pp. 157–165, Jan 2011.

    Article  Google Scholar 

  40. E. Spaan, E. Ooms, W. D. van Driel, C. A. Yuan, D. G. Yang, and G. Q. Zhang, “Wire bonding the future: a combined experimental and numerical approach to improve the Cu-wire bonding quality,” in Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE), 2010 11th International Conference on, 2010, pp. 1-4.

    Google Scholar 

  41. B. T. Ng, V. P. Ganesh, and C. Lee, “Optimization of gold wire bonding on electroless nickel immersion gold for high temperature applications,” in Electronics Packaging Technology Conference, 2006. EPTC '06. 8th, 2006, pp. 277–282.

    Google Scholar 

  42. C.-T. Su and C.-J. Yeh, “Optimization of the Cu wire bonding process for IC assembly using taguchi methods,” Microelectronics Reliability, vol. 51, pp. 53–59, 2011.

    Article  Google Scholar 

  43. N. Lin, C. E. Tan, and Y. J. Pan, “Copper wire bonding challenges and solutions of small outline packages,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 603–607.

    Google Scholar 

  44. C. C. Lim, Y. C. Soh, C. C. Lee, and O. S. Lim, “Challenges of 43 um Cu bonding on very thin & softest Al bond pad structure,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 37–43.

    Google Scholar 

  45. B. K. Wong, C. C. Yong, P. L. Eu, and B. K. Yap, “Process optimization approach in fine pitch Cu wire bonding,” in Electronic Devices, Systems and Applications (ICEDSA), 2011 International Conference on, 2011, pp. 147–151.

    Google Scholar 

  46. S. C. Teck, J. L. L. Tin, L. S. Khoon, and N. K. O. Kalandar, “Ultra fine pitch bare Cu wire bonding manufacturability control for plastic ball grid array device,” in Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th, 2011, pp. 304–312.

    Google Scholar 

  47. Y. K. Yun and E. P. Leng, “Cu wire bond reliability improvement through focused heat treatment after bonding,” in Electronic Manufacturing Technology Symposium (IEMT), 2008 33rd IEEE/CPMT International, 2008, pp. 1–7.

    Google Scholar 

  48. B. S. Kumar, M. S. R. Malliah, M. Li, Y. Song Keng, and J. James, “Process characterization of Cu & Pd coated Cu wire bonding on overhang die: challenges and solution,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 859–867.

    Google Scholar 

  49. J. Li, L. Liu, L. Deng, B. Ma, F. Wang, and L. Han, “Interfacial microstructures and thermodynamics of thermosonic Cu-wire bonding,” Electron Device Letters, IEEE, vol. 32, pp. 1433–1435, 2011.

    Google Scholar 

  50. J. Li, L. Liu, B. Ma, L. Deng, and L. Han, “Dynamics features of Cu-wire bonding during overhang bonding process,” Electron Device Letters, IEEE, vol. 32, pp. 1731–1733, 2011.

    Google Scholar 

  51. K. S. Goh and Z. W. Zhong, “A new bonding-tool solution to improve stitch bondability,” Microelectronic Engineering, vol. 84, pp. 173–179, Jan 2007.

    Article  Google Scholar 

  52. M. Sivakumar, V. Kripesh, L. Loon Aik, and M. Kumar, “Fine pitch copper wire bond process development for dual damascene Cu metallized chips,” in Electronics Packaging Technology Conference, 2002. 4th, 2002, pp. 350–355.

    Google Scholar 

  53. C. W. Leong, N. B. Jaafar, M. Chew, S. Sivakumar, G. Gunasekaran, K. Kanchet, D. Witarsa, J. B. Tan, V. R. Srinivasa, T. C. Chai, A. Alastair, and J. Woo, “Fine pitch copper wire bonding on 45 nm tech Cu/low-k chip with different bond pad metallurgy,” in Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th, 2011, pp. 752–757.

    Google Scholar 

  54. K. S. Goh and Z. W. Zhong, “Two capillary solutions for ultra-fine-pitch wire bonding and insulated wire bonding,” Microelectronic Engineering, vol. 84, pp. 362–367, Feb 2007.

    Article  Google Scholar 

  55. K. S. Goh and Z. W. Zhong, “Development of capillaries for wire bonding of low-k ultra-fine-pitch devices,” Microelectronic Engineering, vol. 83, pp. 2009–2014, Oct 2006.

    Article  Google Scholar 

  56. H.-J. Kim, J. Y. Lee, K.-W. Paik, K.-W. Koh, J. Won, S. Choe, J. Lee, J.-T. Moon, and Y.-J. Park, “Effects of Cu/Al intermetallic compound (IMC) on copper wire and aluminum pad bondability,” Components and Packaging Technologies, IEEE Transactions on, vol. 26, pp. 367–374, 2003.

    Google Scholar 

  57. J. Premkumar, B. S. Kumar, M. Madhu, M. Sivakumar, K. Y. J. Song, and Y. M. Wong, “Key factors in Cu wire bonding reliability: remnant aluminum and Cu/Al IMC thickness,” in Electronics Packaging Technology Conference, 2008. EPTC 2008. 10th, 2008, pp. 971–975.

    Google Scholar 

  58. Y. H. Tian, I. Lum, S. J. Won, S. H. Park, J. P. Jung, M. Mayer, and Y. Zhou, “Experimental study of ultrasonic wedge bonding with copper wire,” in Electronic Packaging Technology, 2005 6th International Conference on, 2005, pp. 389–393.

    Google Scholar 

  59. D. Degryse, B. Vandevelde, and E. Beyne, “FEM study of deformation and stresses in copper wire bonds on Cu low-k structures during processing,” in Electronic Components and Technology Conference, 2004. Proceedings. 54th, 2004, pp. 906–912 Vol.1.

    Google Scholar 

  60. M. Sivakumar, V. Kripesh, C. Ser Choong, C. Tai Chong, and L. Aik Lim, “Reliability of wire bonding on low-k dielectric material in damascene copper integrated circuits PBGA assembly,” Microelectronics Reliability, vol. 42, pp. 1535–1540, 2002.

    Article  Google Scholar 

  61. V. Kripesh, M. Sivakumar, L. Loon Aik, R. Kumar, and M. K. Iyer, “Wire bonding process impact on low-k dielectric material in damascene copper integrated circuits,” in Electronic Components and Technology Conference, 2002. Proceedings. 52nd, 2002, pp. 873–880.

    Google Scholar 

  62. W. Huang, “Computational modeling and optimization for wire bonding process on Cu/low-k wafers,” in Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on, 2009, pp. 344–352.

    Google Scholar 

  63. X. Fan, K. Qian, T. Wang, Y. Cong, M. Zhao, B. Zhang, and J. Wang, “Nanoindentation investigation of copper bonding wire and ball,” in Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on, 2009, pp. 790–794.

    Google Scholar 

  64. S. Murali, N. Srikanth, and C. J. Vath III, “An analysis of intermetallics formation of gold and copper ball bonding on thermal aging,” Materials Research Bulletin, vol. 38, pp. 637–646, 2003.

    Article  Google Scholar 

  65. P. Ratchev, S. Stoukatch, and B. Swinnen, “Mechanical reliability of Au and Cu wire bonds to Al, Ni/Au and Ni/Pd/Au capped Cu bond pads,” Microelectronics Reliability, vol. 46, pp. 1315–1325, 2006.

    Article  Google Scholar 

  66. S. Lee, T. Uehling, and H. L. III., “Freescale copper wire - analysis, results and implementation,” 2012.

    Google Scholar 

  67. C. J. Vath, M. Gunasekaran, and R. Malliah, “Factors affecting the long term stability of Cu / Al ball bonds subjected to standard and extended HTS,” in Electronics Packaging Technology Conference, 2009. EPTC '09. 11th, 2009, pp. 374–380.

    Google Scholar 

  68. C. E. Tan, “Copper wire bonding process in leaded packages with zero loss in quality, capacity, scrap & machine efficiency,” in Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th, 2011, pp. 324–328.

    Google Scholar 

  69. H. Liu, Z. Zhao, Q. Chen, J. Zhou, M. Du, S. Kim, J. Chae, and M. Chung, “Reliability of copper wire bonding in humidity environment,” in Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th, 2011, pp. 53–58.

    Google Scholar 

  70. C. D. Breach and R. Holliday, “Factors affecting reliability of gold and copper in ball bonding,” in Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on, 2010, pp. 446–451.

    Google Scholar 

  71. A. Shah, M. Mayer, Y. N. Zhou, S. J. Hong, and J. T. Moon, “Low-stress thermosonic copper ball bonding,” Electronics Packaging Manufacturing, IEEE Transactions on, vol. 32, pp. 176–184, 2009.

    Google Scholar 

  72. M. C. Han, B. Y. Yan, H. Y. Zhang, J. Z. Yao, and J. Li, “Low K CMOS65 ball grid array 40 μm pitch wire bonding process development,” in Electronics Packaging Technology Conference, 2008. EPTC 2008. 10th, 2008, pp. 457–462.

    Google Scholar 

  73. D. Degryse, B. Vandevelde, and E. Beyne, “Mechanical FEM simulation of bonding process on Cu low-k wafers,” Components and Packaging Technologies, IEEE Transactions on, vol. 27, pp. 643–650, 2004.

    Google Scholar 

  74. C. C. Lee, T. A. Tran, and Y. K. Au, “Metal lift failure modes during fine pitch wire bonding low-k devices with bond over active (BOA) design,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 31–36.

    Google Scholar 

  75. C.-F. Yu, C.-M. Chan, L.-C. Chan, and K.-C. Hsieh, “Cu wire bond microstructure analysis and failure mechanism,” Microelectronics Reliability, vol. 51, pp. 119–124, 2011.

    Article  Google Scholar 

  76. X. Zhang, X. Lin, and Y. Chen, “The reliability evaluation of Cu wire bonding by using focus ion beam system,” in Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on, 2010, pp. 1049–1052.

    Google Scholar 

  77. C. K. J. Teo, “17.5um thin Cu wire bonding for fragile low-k wafer technology,” in Electronics Packaging Technology Conference (EPTC), 2010 12th, 2010, pp. 355–358.

    Google Scholar 

  78. L. C. Chian, N. K. Chai, L. C. Chia, C. M. King, L. O. Seng, and C. K. Yau, “Copper wire reliability and bonding integrity robustness on cratering sensitive bond pad structure,” in Electronics Manufacturing and Technology, 31st International Conference on, 2006, pp. 354–364.

    Google Scholar 

  79. B. Chylak, J. Ling, H. Clauberg, and T. Thieme, “Next generation nickel-based bond pads enable copper wire bonding,” ECS Transactions, vol. 18, pp. 775–785, 2009.

    Google Scholar 

  80. A. Shah, M. Mayer, Y. Zhou, J. Persic, and J. T. Moon, “Optimization of ultrasound and bond force to reduce pad stress in thermosonic Cu ball bonding,” in Electronics Packaging Technology Conference, 2009. EPTC '09. 11th, 2009, pp. 10–15.

    Google Scholar 

  81. L. England, S. T. Eng, C. Liew, and H. H. Lim, “Cu wire bond parameter optimization on various bond pad metallization and barrier layer material schemes,” Microelectronics Reliability, vol. 51, pp. 81–87, 2011.

    Article  Google Scholar 

  82. Q. Chen, Z. Zhao, H. Liu, J. Chae, S. Kim, and M. Chung, “Investigation of various pad structure influence for copper wire bondability,“ in Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on, 2011, pp. 419–422.

    Google Scholar 

  83. G. G. Harman and C. E. Johnson, “Wire bonding to advanced copper, low-k integrated circuits, the metal/dielectric stacks, and materials considerations, “Components and Packaging Technologies, IEEE Transactions on, vol. 25, pp. 677–683, 2002.

    Google Scholar 

  84. G. V. Periasamy, V. Kripesh, C.-H. Tung, and L. Loon Aik, “Wire bonding on a novel immersion gold capped copper metallized integrated circuit,“ in Electronic Components and Technology Conference, 2004. Proceedings. 54th, 2004, pp. 358–364 Vol.1.

    Google Scholar 

  85. H. C. Hsu, H.-S. Chang, S.-C. Tsao, and S. L. Fu, “Advanced finite element model on copper wire ball bonding,“ in Electronic Manufacturing Technology Symposium (IEMT), 2010 34th IEEE/CPMT International, 2010, pp. 1–6.

    Google Scholar 

  86. M. Sekihara and T. Okita, “Ultrasonic wire bonding method for a semiconductor device,” 2012.

    Google Scholar 

  87. M. Özkök, M. Gensicke, G. Heinz, H. Roberts, and J. McGurran, “Resistance of common PWB Surface Finishes against Corrosion in Harsh Environments,” in SMTA International Conference, p. 9, 2010.

    Google Scholar 

  88. K. W. Lam, H.-M. Ho, S. Stoukatch, M. Van De Peer, P. Ratchev, C. J. Vath, A. Schervan, and E. Beyne, “Fine pitch copper wire bonding on copper bond pad process optimization,” in Electronic Materials and Packaging, 2002. Proceedings of the 4th International Symposium on, 2002, pp. 63–68.

    Google Scholar 

  89. P. Banda, H.-M. Ho, C. Whelan, W. Lam, C. J. Vath, and E. Beyne, “Direct Au and Cu wire bonding on Cu/low-k BEOL,” in Electronics Packaging Technology Conference, 2002. 4th, 2002, pp. 344–349.

    Google Scholar 

  90. Y. H. Chan, J. K. Kim, D. Liu, P. C. K. Liu, Y. M. Cheung, and M. W. Ng, “Effect of plasma treatment of Au-Ni-Cu bond pads on process windows of Au wire bonding,” Advanced Packaging, IEEE Transactions on, vol. 28, pp. 674–684, 2005.

    Google Scholar 

  91. B. Chylak, “Developments in fine pitch copper wire bonding production,” in Electronics Packaging Technology Conference, 2009. EPTC '09. 11th, 2009, pp. 1-6.

    Google Scholar 

  92. T. P. Chai, J. Tan, M. Sivakumar, J. Premkumar, J. Song, and Y. M. Wong, “Super heavy 6.0 mils Cu wire ball bonding,” in Electronic Manufacturing Technology Symposium (IEMT), 2008 33rd IEEE/CPMT International, 2008, pp. 1–5.

    Google Scholar 

  93. S. Schindler, M. Wohnig, and K. J. Wolter, “Fine pitch Cu wire bond process for integrated circuit devices for high volume production,” in Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd, 2008, pp. 767–770.

    Google Scholar 

  94. C. Yi Heang, H. Meiying, and C. E. Tseng, “The properties comparison between Au and Cu wires bond in DRAM component,” in Physical and Failure Analysis of Integrated Circuits (IPFA), 2011 18th IEEE International Symposium on the, 2011, pp. 1–4.

    Google Scholar 

  95. B. S. Kumar, M. Sivakumar, W. Chua Choon, M. Li, Y. Keng, and J. Song, “Cu wire bonding with Cu BSOB for SiP & stacked die application: challenges & solutions,” in Electronics Packaging Technology Conference, 2009. EPTC '09. 11th, 2009, pp. 16–20.

    Google Scholar 

  96. C. L. Yen, Y. C. Lee, and Y. S. Lai, “Vibration and bondability analysis of fine-pitch Cu wire bonding,” in Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on, 2011, pp. 1–7.

    Google Scholar 

  97. H. Liu, Z. Zhao, Q. Chen, J. Zhou, M. Du, S. Kim, J. Chae, and M. Chung, “Reliability of copper wire bonding in humidity environment,” in Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th, 2011, pp. 53–58.

    Google Scholar 

  98. H. Seki, P. Chen, H. Nakatake, S. i. Zenbutsu, and S. Itoh, “Study of EMC for Cu bonding wire application,” in CPMT Symposium Japan, 2010 IEEE, 2010, pp. 1–3.

    Google Scholar 

  99. C. L. Gan, T. T. Toong, C. P. Lim, and C. Y. Ng, “Environmental friendly package development by using copper wirebonding,” in Electronic Manufacturing Technology Symposium (IEMT), 2010 34th IEEE/CPMT International, 2010, pp. 1–5.

    Google Scholar 

  100. J. Brunner, I. Wei Qin, and B. Chylak, “Advanced wire bond looping technology for emerging packages,” in Electronics Manufacturing Technology Symposium, 2004. IEEE/CPMT/SEMI 29th International, 2004, pp. 85–90.

    Google Scholar 

  101. F. Lee Kuan, O. Kwon, O. Yauw, D. Capistrano, and B. Milton, “Ultra low loop conversion from gold to copper wire,” in Electronic Manufacturing Technology Symposium (IEMT), 2010 34th IEEE/CPMT International, 2010, pp. 1–5.

    Google Scholar 

  102. G. O'Malley, P. Su, H. Fu, M. Bayes, and M. Tsuriya, “Current industry adoption of fine-pitch Cu wire bonding and investigation focus at iNEMI,” in Microelectronics and Packaging Conference (EMPC), 2011 18th European, 2011, pp. 1–4.

    Google Scholar 

  103. H. Abe, D. C. Kang, T. Yamamoto, T. Yagihashi, Y. Endo, H. Saito, T. Horie, H. Tamate, Y. Ejiri, N. Watanabe, and T. Iwasaki, “Cu wire and Pd-Cu wire package reliability and molding compounds,” in Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd, 2012, pp. 1117–1123.

    Google Scholar 

  104. S. Murali and N. Srikanth, “Acid decapsulation of epoxy molded IC packages with copper wire bonds,” Electronics Packaging Manufacturing, IEEE Transactions on, vol. 29, pp. 179–183, 2006.

    Google Scholar 

  105. J. Tang, J. Schelen, and C. Beenakker, “Flexible system for real-time plasma decapsulation of copper wire bonded IC packages,” in Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd, 2012, pp. 1764–1769.

    Google Scholar 

  106. J. Tang, E. Reinders, C. Revenberg, J. Schelen, and C. Beenakker, “Decapsulation of high pin count IC packages with palladium coated copper wire bonds using an atmospheric pressure plasma,” in Electronic Packaging Technology Conference, Singapore, 2012.

    Google Scholar 

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Chauhan, P.S., Choubey, A., Zhong, Z., Pecht, M.G. (2014). Concerns and Solutions. In: Copper Wire Bonding. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-5761-9_8

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  • DOI: https://doi.org/10.1007/978-1-4614-5761-9_8

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