Abstract
As the semiconductor industry continues to push to smaller device geometries, lithography becomes more and more a crucial process step. Traditionally, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-beam) lithography and nanoimprint lithography (NIL).
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Ahopelto, J., Haatainen, T. (2003). Step and Stamp Imprint Lithography. In: Sotomayor Torres, C.M. (eds) Alternative Lithography. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-9204-8_6
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DOI: https://doi.org/10.1007/978-1-4419-9204-8_6
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