Abstract
This chapter provides a short overview on the basics of CMOS transistor modeling with respect to deep submicron requirements and mathematical approaches to analyze variations in the design process. Technical terms are going to be defined and explained; physical processes and mathematical theories will be illustrated.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsNotes
- 1.
Whether the symbol y refers to the value or to the function should be evident from the context.
- 2.
\(\frac{1} {{\sigma }^{2}} \sim {\Sigma }^{-1}\) and erf\(\left ( \frac{c} {\sqrt{2}}\right ) = \mathcal{P}\left (\frac{1} {2}, \frac{{c}^{2}} {2} \right ).\)
- 3.
PCA can be applied in the same manner.
References
Shichman, H., Hodges, D.A.: Modeling and simulation of insulated-gate field-effect transistor switching circuits. IEEE J. Solid-State Circuits 3(5), 285–289 (1968)
Meyer, J.E.: MOS models and circuit simulation. RCA Review 32, 42–63 (1971)
Ward, D.E., Dutton, R.W.: A charge-oriented model for MOS transistor capacitances. IEEE J. Solid-State Circuits 13(5), 703–708 (1978)
Foty, D.P.: MOSFET Modeling with SPICE - Principles and Practice. Prentice Hall, Upper Saddle River, NJ (1997)
Sheu, B.J., Scharfetter, D.L., Ko, P.K., Jen, M.C.: BSIM Berkeley short-channel IGFET model for MOS transistors. IEEE J. Solid-State Circuits 22(4), 558–566 (1987)
Synopsys: HSPICE MOSFET Models Manual, version z-2006.03 edn. (2007). Chapter 6
Liu, W.: MOSFET Models for SPICE Simulation, Including BSIM3v3 and BSIM4. John Wiley & Sons, New York (2001)
Enz, C.C., Krummenacher, F., Vittoz, E.A.: An analytical MOS transistor model valid in all regions of operation and dedicated to low-voltage and low current applications. J. Analog Integr. Circuits Signal Process 8, 83–114 (1995)
Compact Model Council. http://www.geia.org/index.asp?bid=597
BSIM3, BSIM4 homepage. http://www-device.eecs.berkeley.edu/~bsim3/
Miura-Mattausch, M., Feldmann, U., Rahm, A., Bollu, M., Savignac, D.: Unified complete MOSFET model for analysis of digital and analog circuits. IEEE Trans. CAD/ICAS 15(1), 1–7 (1996)
Gildenblat, G., Li, X., W.Wu, Wang, H., Jha, A., van Langevelde, R., Smit, G., Scholten, A., Klaassen, D.: PSP: An advanced surface-potential-based MOSFET model for circuit simulation. Electron Devices, IEEE Transactions on 53(9), 1979–1993 (2006)
PSP homepage. http://pspmodel.asu.edu/
HISIM homepage. http://home.hiroshima-u.ac.jp/usdl/HiSIM.html
Tsividis, Y.: Operation and Modeling of the MOS Transistor, 2nd Edn. McGraw-Hill, New York (1999)
Taur, Y., Ning, T.: Fundamentals of modern VLSI devices. Cambridge University Press (1998)
Wang, A., Calhoun, B.H., Chandrakasan, A.P.: Sub-threshold Design for Ultra Low-Power Systems. Springer (2006)
Moore, G.E.: Cramming more components onto integrated circuits. Electronics 38, 114 ff. (1965)
Dennard, R., Gaensslen, F., Rideout, V., Bassous, E., LeBlanc, A.: Design of ion-implanted MOSFET’s with very small physical dimensions. IEEE Journal of Solid-State Circuits 9(5), 256–268 (1974)
Rabaey, J.: Low Power Design Essentials. Springer, Boston, MA (2009). DOI 10. 1007/978-0-387-71713-5
Kenyon, C., Kornfeld, A., Kuhn, K., Liu, M., Maheshwari, A., Shih, W., Sivakumar, S., Taylor, G., VanDerVoorn, P., Zawadzki, K.: Managing process variation in Intel’s 45nm CMOS technology. Intel Technology Journal 12(2) (2008). URL http://www.intel.com/technology/itj/2008/v12i2/3-managing/1-abstract.htm
Asenov, A.: Random dopant induced threshold voltage lowering and fluctuations in sub-0.1 um MOSFET’s: A 3-D “atomistic” simulation study. IEEE Transactions on Electron Devices 45(12), 2505–2513 (1998). DOI 10.1109/16.735728
Diaz, C.H., Tao, H.J., Ku, Y.C., Yen, A., Young, K.: An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling. IEEE Electron Device Letters 22(6), 287–289 (2001). DOI 10.1109/55.924844
Asenov, A., Kaya, S., Davies, J.H.: Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations. IEEE Transactions on Electron Devices 49(1), 112–119 (2002). DOI 10.1109/16.974757
Kaushik, V.S., O’Sullivan, B.J., Pourtois, G., Van Hoornick, N., Delabie, A., Van Elshocht, S., Deweerd, W., Schram, T., Pantisano, L., Rohr, E., Ragnarsson, L.A., De Gendt, S., Heyns, M.: Estimation of fixed charge densities in hafnium-silicate gate dielectrics. IEEE Transactions on Electron Devices 53(10), 2627–2633 (2006). DOI 10.1109/TED.2006.882412
Lucovsky, G.: Intrinsic limitations on the performance and reliability of high-k gate dielectrics for advanced silicon devices. In: Proc. IEEE Int. Integrated Reliability Workshop Final Report (2005). DOI 10.1109/IRWS.2005.1609592
Capodieci, L.: From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the roadmap enablers for the next decade. In: Proceedings of SPIE, vol. 6154 (3) (2006)
Nag, S., Chatterjee, A., Taylor, K., Ali, I., O’Brien, S., Aur, S., Luttmer, J.D., Chen, I.C.: Comparative evaluation of gap-fill dielectrics in shallow trench isolation for sub-0.25 /spl mu/m technologies. In: Proc. Int. Electron Devices Meeting IEDM ’96, pp. 841–845 (1996). DOI 10.1109/IEDM.1996.554111
Tsang, Y.L., Chattopadhyay, S., Uppal, S., Escobedo-Cousin, E., Ramakrishnan, H.K., Olsen, S.H., O’Neill, A.G.: Modeling of the threshold voltage in strained si/si1-x gex/si1-ygey(x-y) cmos architectures. IEEE Transactions on Electron Devices 54(11), 3040–3048 (2007). DOI 10.1109/TED.2007.907190
Al-Bayati, A., Graoui, H., Spear, J., Ito, H., Matsunaga, Y., Ohuchi, K., Adachi, K., Miyashita, K., Nakayama, T., Oowada, M., Toyoshima, Y.: Advanced CMOS device sensitivity to USJ processes and the required accuracy of doping and activation. In: Proc. 14th Int. Conf. Ion Implantation Technology 2002, pp. 185–188 (2002). DOI 10.1109/IIT.2002.1257969
Lorenz, J., Bär, E., Clees, T., Jancke, R., Salzig, C., S., S.: Hierarchical simulation of process variations and their impact on circuits and systems: Methodology. IEEE Trans. on Electron Devices, Special Issue Vol. 58(8) (2011), pp. 2218–2226
Lorenz, J., Bär, E., Clees, T., Jancke, R., Salzig, C., S., S.: Hierarchical simulation of process variations and their impact on circuits and systems: Results. IEEE Trans. on Electron Devices, Special Issue Vol. 58(8) (2011), pp. 2218–2226
Jancke, R., Kampen, C., Kilic, O., Lorenz, J.: Hierarchischer ansatz für die monte-carlo-simulation komplexer mixed-signal-schaltungen. In: 11. ITG/GMM-Fachtagung ANALOG. Erfurt (2010)
Yamaoka, M., Onodera, H.: A detailed vth-variation analysis for sub-100-nm embedded SRAM design. In: Proc. IEEE Int. SOC Conf, pp. 315–318 (2006). DOI 10.1109/SOCC.2006.283905
Pelgrom, M.J.M., Duinmaijer, A.C.J., Welbers, A.P.G.: Matching properties of mos transistors. IEEE Journal of Solid-State Circuits 24(5), 1433–1439 (1989). DOI10.1109/JSSC.1989.572629
Petzold, L., Li, S., Cao, Y., Serban, R.: Sensitivity analysis of differential-algebraic equations and partial differential equations. Computers & Chemical Engineering 30(10-12), 1553 – 1559 (2006). DOI 10.1016/j.compchemeng.2006.05.015
Özyurt, D.B., Barton, P.I.: Cheap second order directional derivatives of stiff ODE embedded functionals. SIAM J. Sci. Comput. 26, 1725–1743 (2005). DOI 10.1137/030601582
Cao, Y., Li, S.T., Petzold, L., Serban, R.: Adjoint sensitivity analysis or differential-algebraic equations: The adjoint DAE system and its numerical solution. Siam Journal on Scientific Computing 24(1), 1076–1089 (2003). DOI 10.1137/ S1064827501380630
Sakurai, T., Newton, A.R.: Alpha-power law MOSFET model and its applications to CMOS inverter delay and other formulas. IEEE Journal of Solid-State Circuits SC 25(2), 584–594 (1990)
Bowman, K.A., Austin, B.L., Eble, J.C., Tang, X., Meindl, J.D.: A physical alpha-power law mosfet model. IEEE Journal of Solid-State Circuits 34(10), 1410–1414 (1999). DOI 10.1109/4.792617
Rabaey, J.M., Chandrakasan, A., Nikolic, B.: Digital Integrated Circuits: A Design Perspective. Prentice Hall (2003)
Stolk, P.A., Widdershoven, F.P., Klaassen, D.B.M.: Modeling statistical dopant fluctuations in MOS transistors. IEEE Transactions on Electron Devices 45(9), 1960–1971 (1998). DOI 10.1109/16.711362
Narendra, S.G.: Effect of MOSFET threshold voltage variation on high-performance circuits. Ph.D. thesis, Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science (2002)
Roy, K., Mukhopadhyay, S., Mahmoodi-Meimand, H.: Leakage current mechanisms and leakage reduction techniques in deep-submicrometer CMOS circuits. In: Proceedings of the IEEE, pp. 305–327 (2003)
Veendrick, J.M.H.: Nanometer CMOS ICs: From basics to ASICs, 1st Edn. Springer, Heidelberg (2008)
Srivastava, A., Blaauw, D., Sylvester, D.: Statistical Analysis and Optimization for VLSI: Timing and Power. Springer Science+Business Media Inc, Boston, MA (2005). DOI 10.1007/b137645
Chan, T.Y., Chen, J., Ko, P.K., Hu, C.: The impact of gate-induced drain leakage current on mosfet scaling. In: Proc. Int. Electron Devices Meeting, vol. 33, pp. 718–721 (1987). DOI 10.1109/IEDM.1987.191531
Bouhdada, A., Bakkali, S., Touhami, A.: Modelling of gate-induced drain leakage in relation to technological parameters and temperature. Microelectronics and Reliability 37(4), 649–652 (1997). DOI 10.1016/S0026-2714(96)00062-5
Mulaik, S.A.: Foundations of factor analysis, 2nd Edn. Chapman & Hall/CRC statistics in the social and behavioral sciences series. CRC Press, Boca Raton, FL (2010)
Johnson, R.A., Wichern, D.W.: Applied multivariate statistical analysis, 6th Edn. Pearson Prentice Hall, Upper Saddle River N.J. (2007)
Weisstein, E.W.: Regularized gamma function. http://mathworld.wolfram.com/RegularizedGammaFunction.html. From MathWorld – A Wolfram Web Resource
Rencher, A.C.: Methods of multivariate analysis (2002). DOI 10.1002/0471271357
Johnson, N., Kotz, S.: Distribution in Statistics I. Continuous univarite distributions. Wiley (1970)
Karian, Z.A., Dudewicz, E.J.: Fitting statistical distributions: The Generalized Lambda Distribution and Generalized Bootstrap methods. CRC Press, Boca Raton (2000)
Shlens, J.: Tutorial on Principal Component Analysis. Tech. Rep. Version 2, Systems Neurobiology Laboratory, Salk Insitute for Biological Studies and Institute for Nonlinear Science, University of California, San Diego (2005). CiteSeerX 10.1.1.115.3503
Jolliffe, I.T.: Principal Component Analysis, 2nd Edn. Springer (2002)
Jackson, J.E.: A User’s Guide to Principal Components. Wiley Series in Probability and Statistics. Wiley (2003)
Skillicorn, D.B.: Understanding complex datasets: Data mining with matrix decompositions. Chapman & Hall/CRC data mining and knowledge discovery series. Chapman & Hall/CRC Press, Boca Raton (2007)
Kalman, D.: A singulary valuable decomposition : The SVD of a matrix. The College Mathematical Journal 27(1), 1–23 (1996). URL http://www1.math.american.edu/People/kalman/pdffiles/svd.pdf
Shamsi, D., Boufounos, P., Koushanfar, F.: Noninvasive leakage power tomography of integrated circuits by compressive sensing. In: ISLPED ’08: Proceedings of the 2003 international symposium on Low power electronics and design, pp. 341–346. ACM, NY, USA, Bangalore (2008)
Box, G.E.P., Draper, N.R.: Empirical model-building and response surfaces. Wiley series in probability and mathematical statistics. Wiley, New York (1987)
Poggio, T.: On optimal nonlinear associative recall. Biol. Cybernetics 19, 201–209 (1975)
Lauridsen, S., Vitali, R., van Keulen, F., Haftka, R.T., Madsen, J.: Response surface approximation using gradient information. In: World Congress of Structural and Multidisciplinary Optimization WCSMO-4. Dalian, China (2001). CiteSeerX 10.1.1.16.2135 URL http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.16.2135
Park, S., H.J., K., Cho, J.I.: Recent advances in linear models and related areas. In: Optimal Central Composite Designs for Fitting Second Order Response Surface Linear Regression Models, pp. 323–339. Physica-Verlag HD (2008). DOI 10.1007/978-3-7908-2064-5_17
Cheng, L., Xiong, J., He, L.: Non-Gaussian statistical timing analysis using second-order polynomial fitting. Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on 28(1), 130–140 (2009). DOI 10.1109/TCAD.2008.2009143
Sohrmann, C., Muche, L., Haase, J.: Accurate approximation to the probability of critical performance. In: 2. GMM/GI/ITG-Fachtagung Zuverlässigkeit und Entwurf, pp. 93–97 (2008)
Zhang, M., Olbrich, M., Seider, D., Frerichs, M., Kinzelbach, H., Barke, E.: CMCal: An accurate analytical approach for the analysis of process variations with non-Gaussian parameters and nonlinear functions. In: Design, Automation & Test in Europe Conference & Exhibition, 2007. DATE ’07, pp. 1–6 (2007). DOI 10.1109/DATE.2007.364598
Saucier, R.: Computer generation of statistical distributions. Tech. rep., Army Research Laboratory (2000). URL http://ftp.arl.mil/random/
Cheng, R.C.: Boostrap methods in computer simulation experiments. In: Proceedings of the 1995 Winter Simulation Conference, pp. 171–177 (1995)
Liu, J.S.: Monte Carlo Strategies in Scientific Computing. Springer Publishing Company, Incorporated (2008)
Rao, R., Srivastava, A., Blaauw, D., Sylvester, D.: Statistical estimation of leakage current considering inter- and intra-die process variation. In: Proceedings of the 2003 International Symposium on Low Power Electronics and Design ISLPED ’03, pp. 84–89 (2003), DOI 10.1109/LPE.2003.1231840
Denny, M.: Introduction to importance sampling in rare-event simulations. EUROPEAN JOURNAL OF PHYSICS 22(4), 403–411 (2001)
Robert, C.P., Casella, G.: Monte Carlo statistical methods, 2nd Edn. Springer texts in statistics. Springer, New York, NY (2004). ISBN 978-0-387-21239-5
Hesterberg, T.: Advances in importance sampling. Statistics Department, Stanford University (1998)
Hein, A.: Parameter- und Quantilschätzung in der Extremwerttheorie. Uni Kaiserslautern (2001)
Reiss, R., M., T.: Statistical Analysis of Extreme Values. Birkhäuser (2007)
de Haan, L., Ferreira, A.: Extreme value theory. An Introduction. Springer series in operations research and financial engineering. Springer (2000)
Li, X., Le, J., Pileggi, L.T.: Projection-based statistical analysis of full-chip leakage power with non-log-normal distributions. In: Proc. DAC 2006, pp. 103–108 (2006)
GSA & IET International Semiconductor Forum, London UK, 18-19 May 2010 “Better Analog Modeling and Integration with iPDKs”
Hu, C.: Future CMOS scaling and reliability. Proceedings of the IEEE, 81(5) (1993)
Wong, B.P., Mittal, A., Cao, Y., Starr, G.: NANO-CMOS Circuit and physical design, John Wiley & Sons, New York (2005)
Robertson, J.: High dielectric constant gate oxides for metal oxide Si transistors. Rep. Prog. Phys. 69, 327–396 (2006) Institute physics publishing
Ge precursors for strained Si and compound semiconductors, semiconductor international, (2006)
Risch, L.: Pushing CMOS beyond the roadmap, Proceedings of ESSCIRC, p. 63 (2005)
Subramanian, V.: Multiple gate field-effect transistors for future CMOS technologies. IETE Technical review 27, 446–454 (2010)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2012 Springer Science+Business Media, LLC
About this chapter
Cite this chapter
Lemaitre, B., Sohrmann, C., Muche, L., Haase, J. (2012). Physical and Mathematical Fundamentals. In: Dietrich, M., Haase, J. (eds) Process Variations and Probabilistic Integrated Circuit Design. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-6621-6_2
Download citation
DOI: https://doi.org/10.1007/978-1-4419-6621-6_2
Published:
Publisher Name: Springer, New York, NY
Print ISBN: 978-1-4419-6620-9
Online ISBN: 978-1-4419-6621-6
eBook Packages: EngineeringEngineering (R0)